Spectral purity filters for use in a lithographic apparatus

1. A spectral purity filter, comprising:

a first aperture having a first diameter,

the first aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation;

wherein the spectral purity filter is also provided with:

a second aperture having a second diameter, the second diameter being smaller than the first diameter,

the second diameter being small enough to prevent diffraction of the first wavelength of radiation, while allowing transmission of at least a portion of the second wavelength of radiation.

2. A lithographic apparatus. comprising:

a layer of material having a first aperture having a first diameter, said first aperture configured to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation;

a second aperture in the layer of material having a second diameter that is smaller than the first diameter, the second aperture being small enough to prevent diffraction of the first wavelength of radiation while allowing transmission of at least a portion of the second wavelength of radiation;

an illumination system configured to condition a radiation beam, the radiation beam comprising at least one of the first wavelength of radiation and the second wavelength of radiation;

a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate; and

a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

3. A lithographic apparatus, comprising:

a spectral purity filter having one or more apertures, the one or more apertures configured to transmit and diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the one or more apertures, the second wavelength of radiation being shorter than the first wavelength of radiation, and wherein material forming the spectral purity filter is substantially transparent to the transmission of the first wavelength of radiation, and the spectral purity filter is configured such that destructive interference of a zero diffraction order of the first wavelength of radiation takes place between radiation of the first wavelength that is arranged to pass through the material and radiation of the first wavelength that is arranged to pass through the one or more apertures;

a structure having a further aperture, the spectral purity filter and the structure being arranged relative to one another such that at least a portion of the second wavelength of radiation is able to pass through the spectral purity filter and the further aperture that is provided in the structure, and wherein a spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 50% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture that is provided in the structure;

an illumination system configured to condition a radiation beam, the radiation beam comprising at least one of the first wavelength of radiation and the second wavelength of radiation;

a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate; and

a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

4. The lithographic apparatus of claim 3 , wherein the spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 10% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture.

5. A radiation source, comprising:

a layer of material having a first aperture having a first diameter, said first aperture configured to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation;

a second aperture in the layer of material having a second diameter that is smaller than the first diameter, the second aperture being small enough to prevent diffraction of the first wavelength of radiation while allowing transmission of at least a portion of the second wavelength of radiation; and

an illumination system configured to condition a radiation beam, the radiation beam comprising at least one of the first wavelength of radiation and the second wavelength of radiation.

6. A radiation source, comprising:

a spectral purity filter having one or more apertures, the one or more apertures configured to transmit and diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the one or more apertures, the second wavelength of radiation being shorter than the first wavelength of radiation, and wherein material forming the spectral purity filter is substantially transparent to the transmission of the first wavelength of radiation, and the spectral purity filter is configured such that destructive interference of a zero diffraction order of the first wavelength of radiation takes place between radiation of the first wavelength that is arranged to pass through the material and radiation of the first wavelength that is arranged to pass through the one or more apertures;

a structure having a further aperture, the spectral purity filter and the structure being arranged relative to one another such that at least a portion of the second wavelength of radiation is able to pass through the spectral purity filter and the further aperture that is provided in the structure, and wherein a spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 50% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture that is provided in the structure; and

an illumination system configured to condition a radiation beam, the radiation beam comprising at least one of the first wavelength of radiation and the second wavelength of radiation.

7. The radiation source of claim 6 , wherein the spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 10% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture.

8. A method of affecting the spectral purity of a radiation beam, the radiation beam comprising a first wavelength of radiation and a second wavelength of radiation, the method comprising:

directing the radiation beam at a spectral purity filter, wherein the spectral purity filter comprises:

a layer of material having a first aperture having a first diameter, said first aperture configured to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation; and

a second aperture in the layer of material having a second diameter that is smaller than the first diameter, the second aperture being small enough to prevent diffraction of the first wavelength of radiation while allowing transmission of at least a portion of the second wavelength of radiation.

9. A method of affecting the spectral purity of a radiation beam, the radiation beam comprising a first wavelength of radiation and a second wavelength of radiation, the method comprising:

directing the radiation beam at a spectral purity arrangement, wherein the spectral purity arrangement comprises:

a spectral purity filter having one or more apertures, the one or more apertures configured to transmit and diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the one or more apertures, the second wavelength of radiation being shorter than the first wavelength of radiation, and wherein material forming the spectral purity filter is substantially transparent to the transmission of the first wavelength of radiation, and the spectral purity filter is configured such that destructive interference of a zero diffraction order of the first wavelength of radiation takes place between radiation of the first wavelength that is arranged to pass through the material and radiation of the first wavelength that is arranged to pass through the one or more apertures; and

a structure having a further aperture, the spectral purity filter and the structure being arranged relative to one another such that at least a portion of the second wavelength of radiation is able to pass through the spectral purity filter and the further aperture that is provided in the structure, and wherein a spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 50% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture that is provided in the structure.

10. The method of claim 9 , wherein the spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 10% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture.

11. A lithographic method, comprising:

directing a radiation beam comprising a first wavelength of radiation and a second wavelength of radiation at a spectral purity filter arrangement comprising:

a filter having a first aperture having a first diameter, said first aperture configured to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation; and

a second aperture in the filter having a second diameter that is smaller than the first diameter, the second aperture being small enough to prevent diffraction of the first wavelength of radiation while allowing transmission of at least a portion of the second wavelength of radiation; and

using radiation transmitted by the spectral purity filter or spectral purity arrangement to apply a pattern to a substrate coated with radiation sensitive material.

12. A lithographic method, comprising:

directing a radiation beam comprising a first wavelength of radiation and a second wavelength of radiation at a spectral purity filter arrangement comprising:

a spectral purity filter having one or more apertures, the one or more apertures configured to transmit and diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the one or more apertures, the second wavelength of radiation being shorter than the first wavelength of radiation, and wherein material forming the spectral purity filter is substantially transparent to the transmission of the first wavelength of radiation, and the spectral purity filter is configured such that destructive interference of a zero diffraction order of the first wavelength of radiation takes place between radiation of the first wavelength that is arranged to pass through the material and radiation of the first wavelength that is arranged to pass through the one or more apertures; and

a structure having a further aperture, the spectral purity filter and the structure being arranged relative to one another such that at least a portion of the second wavelength of radiation is able to pass through the spectral purity filter and the further aperture that is provided in the structure, and wherein a spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 50% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture that is provided in the structure; and

using radiation transmitted by the spectral purity filter or spectral purity arrangement to apply a pattern to a substrate coated with radiation sensitive material.

13. The lithographic method of claim 12 , wherein the spacing or diameter of the one or more apertures of the spectral purity filter is configured to pass less than 10% of radiation of the first wavelength of radiation incident upon the one or more apertures through the further aperture.