Monitoring stage alignment and related stage and calibration target
Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.
1. A method for monitoring a stage alignment in a processing system, the method comprising:
providing a calibration target on a surface of the stage, the calibration target having:
an upper surface including a portion sensitive to a change of an angle of incidence of a light beam striking on the portion;
a lower surface which when interfacing with a surface of an object, translates a shape of the object surface into a relative position of the sensitive portion to the light beam; and
a cut-off portion between the upper surface and the lower surface, the cut-off portion substantially perpendicular to the surface of the stage,
wherein the sensitive portion of the upper surface includes one of a convex portion or a concave portion;
measuring an angle of incidence of the light beam to the calibration target; and
monitoring the stage alignment based on the determined angle of incidence.
2. The method of claim 1 , wherein the providing includes positioning the calibration target at a same location on the surface with different tilts.
3. The method of claim 1 , wherein the providing includes providing the calibration target at different locations of the surface to measure the angle of incidence thereto.
4. The method of claim 3 , wherein the different locations constitute a grid throughout the surface.
5. The method of claim 1 , wherein the providing includes embedding the calibration target in the stage.
6. The method of claim 5 , wherein the embedding includes embedding a substantially ring-shaped calibration target around a center of the surface.
7. The method of claim 5 , wherein the embedded calibration target includes one of a reflective material or a transparent material, and the measuring includes detecting at least one of a direction and an optical property of one of a reflected beam from the embedded calibration target or a pass through beam through the embedded calibration target.
8. The method of claim 1 , wherein the monitoring includes at least one of comparing the measured angle of incidence to a defined angle of incidence and comparing the measured angle of incidence with other angles of incidence measured at different locations on the stage.
9. The method of claim 1 , wherein the monitoring includes eliminating a contribution of the calibration target to the measured angle of incidence.
10. The method of claim 1 , further comprising calibrating the stage based on the measured angle of incidence.
11. The method of claim 1 , wherein the upper surface includes materials of different optical responses at different surface locations thereof, wherein a change in the angle of incidence of the light beam causes the light beam to intersect a different material at a different surface location indicating the change in the angle of incidence.
12. A stage in a processing system, the stage comprising:
a calibration target embedded in the stage, the calibration target including:
an upper surface including a portion sensitive to a change of an angle of incidence of a light beam striking on the portion;
a lower surface which when interfacing with a surface of an object, translates a shape of the object surface into a relative position of the sensitive portion to the light beam and
a cut-off portion between the upper surface and the lower surface, the cut-off portion substantially perpendicular to the surface of the stage.
13. The stage of claim 12 , further including multiple calibration targets embedded at different locations on the surface of the stage.
14. The stage of claim 13 , wherein the calibration target is substantially ring-shaped.
15. The stage of claim 12 , wherein the surface of the embedded calibration target is at least one of lower than the surface of the stage and covered by a protective transparent cover.
16. The stage of claim 12 , wherein the calibration target includes one of a reflective material or a transparent material.
17. A calibration target comprising:
an upper surface including a portion sensitive to a change of an angle of incidence of a light beam striking on the portion;
a lower surface which when interfacing with a surface of an object, translates a shape of the object surface into a relative position of the sensitive portion to the light beam; and
a cut-off portion between the upper surface and the lower surface the cut-off portion substantially perpendicular to the surface of the stage,
wherein the sensitive portion of the upper surface includes one of a convex portion or a concave portion.
18. The calibration target of claim 17 , wherein the upper surface includes materials of different optical responses at different surface locations thereof, wherein a change in the angle of incidence of the light beam causes the light beam to intersect a different material at a different surface location.
19. A system for monitoring a stage alignment in a processing system, the system comprising:
a calibration target capable of being positioned on a surface of the stage, the calibration target having:
an upper surface including a portion sensitive to a change of an angle of incidence of a light beam striking on the portion;
a lower surface which when interfacing with a surface of an object, translates a shape of the object surface into a relative position of the sensitive portion to the light beam; and
a cut-off portion between the upper surface and the lower surface, the cut-off portion substantially perpendicular to the surface of the stage,
wherein the sensitive portion of the upper surface includes one of a convex portion or a concave portion;
an angle of incidence mechanism configured to measure an angle of incidence of the light beam to the calibration target; and
an alignment monitoring unit configured to monitor the stage alignment based on the determined angle of incidence measured by the angle of incidence mechanism.