IP Library Granted Patent US 8,450,716
Granted Patent B2
US 8,450,716 · App. 13/300,571 · Granted May 28, 2013

Resistive memory

Inventor: Bao Tran (Saratoga, CA)
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Quick Facts
Patent No.
US 8,450,716
App. No.
13/300,571
Granted
May 28, 2013
Kind
B2
Abstract

A memory device memory device includes a first array of memory structures disposed in rows and columns and constructed over a substrate, each memory structure having a first signal electrode, a second signal electrode, and a resistive layer positioned between the first signal electrode and the second signal electrode.

Claims (34)

1. A memory device, comprising:

a first array of memory structures disposed in rows and columns and constructed over a substrate, each memory structure comprising:

a first signal electrode,

a second signal electrode, and

a resistive layer positioned between the first signal electrode and the second signal electrode with an amorphous or crystalline conduction channel and lateral composition gradient; and

a second array of memory structures disposed in rows and columns and constructed either above or below the first array of memory, each memory structure comprising a first signal electrode, a second signal electrode, and a resistive layer between the first signal electrode and the second signal electrode, wherein the second array increases storage capacity of the memory device.

2. The memory device of claim 1 , further comprising a driver circuit for selectively controlling first signal electrodes or second signal electrodes.

3. The memory device of claim 2 , wherein the circuit includes one or more of a sense amplifier, an input-output buffer, an X address decoder, a Y address decoder, and an address buffer.

4. The memory device of claim 1 , wherein the substrate includes a silicon-on-insulator wafer.

5. The memory device of claim 1 , wherein the resistive layer is spin-coated over the substrate wherein first signal electrodes and the second signal electrodes are constructed.

6. The memory device of claim 1 , wherein the resistive layer form memory circuits, analog circuits, hybrid circuits, or logic circuits.

7. The memory device of claim 1 , wherein the resistive layer forms transistors.

8. The memory device of claim 1 , wherein the resistive layer store data at intersections of resistors.

9. The memory device of claim 1 , further comprising an array of redundant memory elements.

10. The memory device of claim 9 , wherein the redundant array is a row or a column of redundant resistive-elements.

11. The memory device of claim 1 , comprising magnetic elements or optical elements coupled to the memory.

12. The memory device of claim 1 , further comprising memory devices forming a plurality of memory hierarchy to optimize data access speed.

13. A memory electronic device, comprising:

a substrate;

a first layer fabricated using semiconductor fabrication techniques;

a second layer formed above the first layer, the second layer having one or more resistive-bonding areas and one or more resistive memory elements self-assembled to the second layer resistive bonding areas; and

a third layer formed above the second layer, the third layer having one or more resistive-bonding areas and one or more resistive memory elements self-assembled to the third layer resistive bonding areas.

14. The device of claim 13 , wherein the resistive-elements are spin-coated on the second layer.

15. A memory electronic device, comprising:

a substrate;

a first layer fabricated using semiconductor fabrication techniques;

a second layer formed above the first layer, the second layer having one or more resistive-bonding areas and one or more resistive memory elements self-assembled to the second layer resistive bonding areas, wherein the resistive layer comprises a combination of two resistive elements that in combination have a zero temperature coefficient.

16. A memory electronic device, comprising:

a substrate;

a first layer fabricated using semiconductor fabrication techniques;

a second layer formed above the first layer, the second layer having one or more resistive-bonding areas;

a plurality of resistive memory elements self-assembled to the second layer resistive bonding areas, wherein each resistive memory element has a zero temperature coefficient.

17. The device of claim 16 , comprising a first resistive element with a positive temperature coefficient and the second resistive element with a negative temperature coefficient.

18. The device of claim 16 , wherein the temperature coefficient is selected such that a series or parallel combination of two elements results in a resistive element having zero temperature coefficient.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 24, 2020
From: RONDEVOO TECHNOLOGIES LLC
To: TRAN, BAO
Reel/Frame 053871/0047 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 22, 2019
From: TRAN, BAO
To: RONDEVOO TECHNOLOGIES, LLC
Reel/Frame 048678/0392 →
Continuity (2)
Continuation 12905069 · Oct 14, 2010
Related Publication 20120091429A1 · Apr 19, 2012