Inter connection structure including copper pad and pad barrier layer, semiconductor device and electronic apparatus including the same
A semiconductor device including an interconnection structure including a copper pad, a pad barrier layer and a metal redistribution layer, an interconnection structure thereof and methods of fabricating the same are provided. The semiconductor device includes a copper pad disposed on a first layer, a pad barrier layer including titanium disposed on the copper pad, an inorganic insulating layer disposed on the pad barrier layer, a buffer layer disposed on the inorganic insulating layer, wherein the inorganic insulating layer and the buffer layer expose a portion of the pad barrier layer, a seed metal layer disposed on the exposed buffer layer, a metal redistribution layer disposed on the seed metal layer, and a first protective layer disposed on the metal redistribution layer.
1. A semiconductor device, comprising:
an interconnection structure comprising:
a copper pad disposed on a first layer;
a pad barrier layer including titanium disposed on the copper pad;
an inorganic insulating layer disposed on the pad barrier layer;
a buffer layer disposed on the inorganic insulating layer, wherein the inorganic insulating layer and the buffer layer expose a portion of the pad barrier layer;
a seed metal layer disposed on the exposed buffer layer;
a second protective layer disposed between the buffer layer and the seed metal layer;
a metal redistribution layer disposed on the seed metal layer; and
a first protective layer disposed on the metal redistribution layer.
2. The device according to claim 1 , wherein the first layer comprises silicon oxide and a first surface of the first layer is coplanar with a first surface of the copper pad.
3. The device according to claim 2 , wherein the pad barrier layer projects from the first surface of the first layer.
4. The device according to claim 1 , wherein the seed metal layer includes at least one of copper and gold.
5. The device according to claim 1 , wherein the seed metal layer includes a first seed metal layer including titanium and a second seed metal layer.
6. The device according to claim 5 , wherein the second seed metal layer comprises at least one of copper and gold.
7. The device according to claim 1 , wherein the metal redistribution layer includes at least one of copper and gold.
8. The device according to claim 1 , wherein the metal redistribution layer includes a first metal redistribution layer formed of the same metal as the seed metal layer and a second metal redistribution layer including gold.
9. The device according to claim 8 , wherein the metal redistribution layer includes an intermediate metal redistribution layer including nickel that is disposed between the first metal redistribution layer and the second metal redistribution layer.
10. The device according to claim 1 , wherein the inorganic insulating layer comprises silicon nitride, and exposes at least a part of a first surface of the pad barrier layer.
11. The device according to claim 1 , wherein the buffer layer comprises polymer, and exposes at least a part of a first surface of the pad barrier layer.
12. The device according to claim 11 , wherein the buffer layer comprises polyimide.
13. The device according to claim 1 , wherein the first protective layer comprises polyimide containing epoxy.
14. The device according to claim 1 , wherein the second protective layer and the first protective layer comprise polymer.
15. The device according to claim 14 , wherein the second protective layer comprises polyimide containing epoxy resin.
16. The device according to claim 1 , further comprising:
an internal circuit in the first layer; and
an input/output part to connect the interconnection structure to an external circuit.
17. The device according to claim 16 , wherein the internal circuit is connected to the copper pad through an internal interconnection.
18. A semiconductor device, comprising:
an interconnection structure comprising:
a copper pad disposed on a first layer of silicon, wherein top surfaces of the copper pad and the silicon oxide are coplanar with each other;
a pad barrier layer including titanium disposed on the copper pad, the pad barrier layer projects from the first layer;
an inorganic insulating layer disposed on the pad barrier layer;
a buffer layer disposed on the inorganic insulating layer, wherein the inorganic insulating layer and the buffer layer expose a portion of the pad barrier layer;
a seed metal layer disposed on the exposed buffer layer;
a second protective layer disposed between the buffer layer and the seed metal layer;
a metal redistribution layer disposed on the seed metal layer; and
a first protective layer disposed on the metal redistribution layer,
an internal circuit electrically connected to the copper pad in the first layer; and
an input/output part to connect the interconnection structure to an external circuit.
19. An electronic apparatus comprising:
a semiconductor device comprising:
an interconnection structure comprising:
a copper pad disposed on a first layer of the semiconductor device;
a pad barrier layer having titanium disposed on the copper pad;
an inorganic insulating layer disposed on the pad barrier layer;
a buffer layer disposed on the inorganic insulating layer;
a seed metal layer disposed on the buffer layer;
a second protective layer disposed between the buffer layer and the seed metal layer;
a metal interconnection layer disposed on the seed metal layer; and
a first protective layer disposed on the metal interconnection layer,
an internal circuit electrically connected to the copper pad in the first layer; and
an input/output part to connect the interconnection structure to an external circuit; and
a controller electrically connected to the semiconductor device; and
an input/output unit electrically connected to the controller.