Color filter array, imagers and systems having same, and methods of fabrication and use thereof
A pixel cell with a photosensitive region formed in association with a substrate, a color filter formed over the photosensitive region, the color filter comprising a first material layer and a second material layer formed in association with the first shaping material layer.
1. An imager, comprising:
a pixel cell array formed in a substrate, the pixel cell array having an array of photosensors; and
a color filter array corresponding to the array of photosensors, and comprising first, second, and third conforming materials formed over and between respective first, second, and third base materials such that a gapless surface is formed in the color filter array, wherein the gapless surface formed by the conforming materials consists of rounded structures over the underlying base materials, wherein the portion of the conforming materials formed between said first and second, and second and third base materials includes a topmost surface which extends respectively below a topmost surface of said first and second, and second and third base materials, and at least the first conforming material has a bottommost surface substantially planar to a bottommost surface of a respective first base material.
2. The imager of claim 1 , wherein at least one of the first, second, and third base materials has a different height than the other two of the base materials.
3. The imager of claim 1 , wherein at least one of the first, second, and third conforming materials respectively formed over a respective base material has a shape defined at least in part by the respective base material.
4. A method of forming an imaging device, comprising:
forming a pixel cell array in a substrate, the pixel cell array having an array of photosensors;
forming a color filter array corresponding to the array of photosensors by:
depositing a base material precursor on a substantially planar material layer;
selectively etching the base material precursor to create an array of spaced apart base materials supported on said planar material layer; and
depositing a conforming material over and between the base materials to form a gapless surface in the color filter array, wherein the gapless surface formed by the conforming material consists of rounded structures over the underlying base materials and the portion of the conforming material formed between said base materials includes a topmost surface which extends below a topmost surface said base materials; and
forming a coating over the conforming material.
5. The method according to claim 4 , wherein the color filter array is formed by depositing a base material precursor on a substantially planar material layer by spin coat deposition, and patterning the base layer precursor to form an array of spaced base materials.
6. The method of claim 5 , wherein the conforming material is deposited over the base materials by spin coat deposition.
7. The method of claim 6 , wherein the conforming material has a shape defined at least partially by the base materials.
8. The method of claim 4 , wherein at least one base material comprises a plurality of stacked materials.
9. The method of claim 4 , wherein at least one of the base materials is selectively planarized such that at least one other base material has a different cross-sectional height than said at least one planarized base material.
10. A pixel cell array, comprising:
a plurality of photosensitive regions formed in association with a substrate; and
a gapless color filter array formed over the plurality of photosensitive regions, at least one color filter comprising:
a first base material provided on a substantially planar material; and
a second material formed over and between the first base material and a second base material of another color filter located on said substantially planar material, wherein the portion of the second material formed between said first and second base materials includes a topmost surface which extends below a topmost surface of said first and second base materials, and the first base material and the second material have bottommost surfaces that are substantially planar.
11. The pixel cell array of claim 10 , wherein the first base material comprises a plurality of material blocks.
12. The pixel cell array of claim 10 , wherein the second material is formed over a surface of the first base material.
13. The pixel cell array of claim 10 , wherein at least one of the first base material and second material is formed of a material selected from the group consisting of zinc selenide (ZnSe), silicon oxide, silicon nitride, silicon oxynitride, silicon-carbon (SiC) (BLOk), tantalum pentoxide (Ta 2 O 5 ), titanium oxide (TiO 2 ), polymethylmethacrylate, polycarbonate, polyolefin, cellulose acetate butyrate, polystyrene, polyimide, epoxy resin, photosensitive gelatin, acrylate, methacrylate, urethane acrylate, epoxy acrylate, polyester acrylate, a positive photoresist, and a negative photoresist.
14. The pixel cell array of claim 10 , wherein a coating is formed on a surface of the second material.
15. An imager comprising:
a pixel cell array having first, second, and third photo sensors; and
a color filter array comprising first, second, and third color filters corresponding to said first, second, and third photo sensors, said first, second, and third color filters comprising respective first, second and third spaced apart base materials formed on a support surface and first, second, and third conforming materials respectively formed over and between said first, second, and third base materials such that said conforming materials form a gapless surface in the color filter array and at least respective portions of said second and third conforming materials formed between said second and third base materials include topmost surfaces which extend below a topmost surface of said second or third base materials.
16. The imager of claim 15 , further comprising a coating formed over the first, second and third conforming materials.
17. The imager of claim 15 , wherein the first, second and third base materials comprise spaced blocks of base material.
18. The imager of claim 17 , wherein the first, second, and third conforming materials have respective first, second, and third radius of curvatures, and wherein at least two of the first, second, and third radius of curvatures are different from each other.
19. The image of claim 16 , wherein the coating comprises at least first, second, and third coating materials formed respectively over surfaces of the first, second, and third conforming materials.
20. The imager of claim 19 , wherein the first, second, and third coating materials have respective first, second, and third radius of curvatures, at least two of the radius of curvature being different from each other.
21. The imager of claim 15 , wherein the conforming materials formed over the base materials have a shape defined at least in part by the base material.
22. The imager of claim 15 , wherein the conforming materials formed over the base materials have a shape defined at least in part by the base materials and spaces formed between the base materials.
23. The imager of claim 22 , wherein at least two of the conforming materials have different shapes from one another.
24. The imager of claim 15 , wherein at least two of the first, second and third color filters have different focal lengths.
25. The imager of claim 15 , wherein the conforming materials form a microlens for respective photo sensors.
26. The imager of claim 15 , wherein said base materials are formed of a color filter material.
27. The imager of claim 15 , wherein said conforming materials are formed of a color filter material.
28. The imager of claim 15 , further comprising a microlens array provided over said color filter array.
29. The imager of claim 15 , wherein said first, second and third base materials have a substantially flat upper surface.
30. The imager of claim 15 , wherein said first, second and third conforming materials have a curved upper surface.
31. The image of claim 15 , wherein at least one of said first, second and third base materials has a cross section height, which differs from the cross sectional height of another of said first, second and third base materials.