IP Library › Granted Patent US 8,618,424
Granted Patent B2
US 8,618,424 · App. 12/969,961 · Granted Dec 31, 2013

Multilayer wiring substrate and method of manufacturing the same

Inventor: Tomoko Yamada (Nagano, JP)
Assignee: Shinko Electric Industries Co., Ltd.
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Quick Facts
Patent No.
US 8,618,424
App. No.
12/969,961
Granted
Dec 31, 2013
Kind
B2
Abstract

The multilayer wiring substrate includes: a first insulating layer comprising a first surface and a second surface opposite to the first surface; a second insulating layer on the first surface of the first insulating layer; a first wiring pattern on the second surface of the first insulating layer; a second wiring pattern on a surface of the second insulating layer; a first via formed through the first insulating layer; a second via formed through the second insulating layer; and a third wiring pattern formed on the first surface of the first insulating layer and embedded in the second insulating layer, the third wiring pattern having a hole therethrough. A diameter of the hole is smaller than each diameter of the first and second vias. The first via and the second via are connected to each other through a metal filled in the hole of the third wiring pattern.

Claims (21)

1. A multilayer wiring substrate, comprising:

a first insulating layer comprising a first surface and a second surface opposite to the first surface;

a second insulating layer on the first surface of the first insulating layer;

a first wiring pattern on the second surface of the first insulating layer;

a second wiring pattern on a surface of the second insulating layer, the second wiring pattern being opposed to the first wiring pattern;

a first via formed through the first insulating layer and electrically connected to the first wiring pattern;

a second via formed through the second insulating layer and electrically connected to the second wiring pattern, the second via being opposed to the first via; and

a third wiring pattern formed on the first surface of the first insulating layer and embedded in the second insulating layer, the third wiring pattern having a hole therethrough, and

wherein the first via and the second via are connected to each other through a metal filled in the hole of the third wiring pattern,

wherein the third wiring pattern comprises a first surface and a second surface opposite to the first surface,

wherein a diameter of the first via is gradually decreased toward the first surface of the third wiring pattern, and the first via comprises:

a top surface contacting the first wiring pattern; and

a bottom surface opposite to the top surface and contacting the first surface of the third wiring pattern,

wherein a diameter of the second via is gradually decreased toward the second surface of the third wiring pattern, and the second via comprises:

a top surface contacting the second wiring pattern; and

a bottom surface opposite to the top surface and contacting the second surface of the third wiring pattern, and

wherein a diameter of the hole is smaller than the bottom surfaces of the first via and the second via.

2. The substrate according to claim 1 ,

wherein the diameter of the hole is gradually increased toward the first and second surfaces of the third wiring pattern.

3. The substrate according to claim 1 , wherein a maximum value of the diameter of the hole is more than twice a minimum value thereof.

4. The substrate according to claim 1 , wherein the diameter of the hole is gradually decreased in a direction from the first surface of the third wiring pattern to the second surface thereof.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 16, 2010
From: YAMADA, TOMOKO
To: SHINKO ELECTRIC INDUSTRIES CO., LTD.
Reel/Frame 025511/0695 →
Priority Claims (1)
JP 2009-292910 · Dec 24, 2009 · national
Continuity (1)
Related Publication 20110155439A1 · Jun 30, 2011