Substrate mounting table of substrate processing apparatus
A substrate mounting table of a substrate processing apparatus includes a base portion and a circular plate-shaped electrostatic chuck adhered to an upper surface of the base portion by an adhesive layer. The electrostatic chuck has a circular attracting surface to support a substrate. The substrate mounting table further includes an annular focus ring arranged around the electrostatic chuck to surround the substrate and to cover an outer peripheral portion of the upper surface of the base portion. The electrostatic chuck has a two-layer structure including an upper circular part and a lower circular part having a diameter larger than that of the upper circular part. An outer peripheral portion of the lower circular part and an outer peripheral portion of the adhesive layer adhering the lower circular part to the base portion are covered with the focus ring.
1. A substrate mounting table of a substrate processing apparatus comprising:
a base portion;
a circular plate-shaped electrostatic chuck adhered to an upper surface of the base portion by an adhesive layer, the electrostatic chuck having a circular attracting surface to support a substrate; and
an annular focus ring arranged around the electrostatic chuck to surround the substrate and to cover an outer peripheral portion of the upper surface of the base portion,
wherein the electrostatic chuck has a two-layer structure including an upper circular part and a lower circular part having a diameter larger than that of the upper circular part,
wherein the base portion has a depression in which the lower circular part of the electrostatic chuck is disposed, and
wherein a gap is located between a side surface of the lower circular part disposed in the depression and an inner wall surface of the depression, and wherein the gap and an outer peripheral portion of the adhesive layer adhering the lower circular part to the base portion are hidden under the focus ring when viewing the electrostatic chuck from a substrate side.
2. The substrate mounting table of claim 1 , wherein the focus ring is mounted on an upper surface of the base portion surrounding the depression, and a gap greater than 0 mm and equal to or smaller than about 0.4 mm exists between a lower surface of the focus ring and an upper surface of the lower circular part of the electrostatic chuck.
3. The substrate mounting table of claim 1 , wherein the focus ring is mounted on the lower circular part of the electrostatic chuck, and a gap greater than 0 mm and equal to or smaller than about 0.4 mm exists between a lower surface of the focus ring and an upper surface of the base portion surrounding the depression.
4. The substrate mounting table of claim 1 , wherein the focus ring includes a cutoff portion into which an outer peripheral portion of the lower circular part of the electrostatic chuck and an outer peripheral portion of the adhesive layer are loosely inserted and fitted, and a gap between an inner wall surface of the cutoff portion and the outer peripheral portions of the adhesive layer and the lower circular part is hidden under the focus ring when viewing the electrostatic chuck from the substrate side.
5. The substrate mounting table of claim 1 , wherein the substrate is a circular plate-shaped member, and the substrate partially vertically overlaps with the focus ring, an overlapping width of the overlapping portion in a radial direction of the substrate ranging from about 0.5 mm to about 1.5 mm.
6. The substrate mounting table of claim 5 , wherein a gap between a lower surface of the substrate and an upper surface of the focus ring at the overlapping portion is equal to or smaller than about 0.4 mm.
7. The substrate mounting table of claim 1 , wherein a gap between an outer peripheral surface of the upper circular part of the electrostatic chuck and an inner peripheral surface of the focus ring ranges from about 0.05 mm to about 0.4 mm.