Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.
1. Method for treating a surface of at least one part having multiple faces with a non-uniform plasma generated with elementary plasma sources by distributed electron cyclotron resonance, comprising: subjecting the at least one part to at least one movement of revolution with regard to at least one fixed linear row of spaced apart elementary plasma sources, each source comprising a coaxial waveguide and an end fitting containing a magnet for electron cyclotron resonance, setting spacing between adjacent sources of the at least one fixed linear row between a minimum distance of about twice a diameter of the magnet, and a maximum distance Dmax determined by the formula:
D
max
=
2
R
max
o
P
o
P
where: R max o is about 5 cm, P o is 2.10 −3 mbar, and P is working pressure in mbar, the at least one fixed linear row of elementary plasma sources being disposed parallel to an axis of revolution of the at least one part and providing uniform treatment in volume of the at least one part although the plasma itself is not uniform in volume, whereby uniform surface treatment on the multiple faces of the at least one part is realized without requiring modification of equipment geometry according to geometry of the at least one part.
2. The method according to claim 1 , wherein the movement of revolution is a single rotation.
3. The method according to claim 1 , wherein the movement of revolution is a single or double planetary movement.
4. The method according to claim 1 , wherein adjacent elementary sources have a same polarity.
5. The method according to claim 1 , wherein magnetisation axis of the magnet is colinear with an axis of the waveguide and preserves symmetry of revolution of said guide and guarantees that electron paths close upon themselves.
6. The method according to claim 1 , wherein the elementary sources are supplied by a single generator having a power divided into equal parts between the sources.
7. The method according to claim 1 , wherein the elementary sources are supplied by generators having a power that is adjusted to have a uniform treatment along the row of the said sources.
8. The method according to claim 1 , wherein minimum distance from the sources to the at least one part is the closest distance during the movement and is between 40 and about 160 mm.
9. The method according to claim 1 , wherein the at least one fixed linear row of spaced apart elementary plasma sources comprises at least three elementary plasma sources.
10. The method according to claim 1 , wherein the at least one fixed linear row of spaced apart elementary plasma sources consists of a single row.