Purging of porogen from UV cure chamber

1. A method for removing chemical species from a substrate, comprising:

arranging a purge ring in a chamber proximate to a pedestal, wherein:

the purge ring includes an inlet portion and an exhaust portion,

the inlet portion defines an inlet plenum and an inlet baffle,

the inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°, and

the exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle;

supplying ozone to the inlet plenum:

at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion;

conveying gas from the inlet plenum into the ring hole space using the inlet baffle;

conveying gas and other matter out of a purge space using the exhaust portion; and

inhibiting deposition of material evolved from the substrate during curing using the purge ring.

2. The method of claim 1 , wherein supplying ozone to the inlet plenum includes at least one of:

generating the ozone remotely from the chamber; and

generating the ozone in the chamber by converting oxygen to the ozone using ultraviolet (UV) light.

3. The method of claim 1 , further comprising:

transmitting UV light through a window and through the ring hole space toward the pedestal;

arranging the purge ring between the window and the pedestal; and

at least partially defining the purge space using the window, the purge ring and the pedestal,

wherein the purge space includes the ring hole space.

4. The method of claim 3 , further comprising:

arranging a ring-window gap between a top surface of the purge ring and the window,

wherein the purge space includes the ring-window gap.

5. The method of claim 3 , further comprising:

arranging a ring-pedestal gap between a bottom surface of the purge ring and the pedestal,

wherein the purge space includes the ring-pedestal gap.

6. The method of claim 3 , wherein the purge space has a purge space height in a range of about from 35 mm to 60 mm.

7. The method of claim 3 , wherein:

the window has a window bottom; and

a distance between the window bottom and the inlet baffle comprises a distance in a range of about from 6 mm to 19 mm.

8. The method of claim 1 , wherein a total open flow area of the inlet baffle is not less than about 4 cm 2 .

9. The method of claim 1 , further comprising:

providing a gas inlet hole to convey gas into the inlet plenum,

wherein the gas inlet hole has a cross-sectional area not less than about 5 cm 2 .

10. The method of claim 1 , further comprising:

providing an exhaust channel opening,

wherein a total cross-sectional area of the exhaust channel opening is not less than about 20 cm 2 .