Charged particle beam writing apparatus and charged particle beam writing method
Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The aperture plate has a stacked structure of a first member and a second member, and a position of an end portion of the first opening portion in the second member is recessed from the position of the end portion of the first opening portion in the first member.
1. A charged particle beam writing apparatus comprising:
a stage on which a sample can be mounted;
an irradiation unit which emits a charged particle beam to be irradiated on the sample;
an aperture plate which includes a first opening portion to shape the charged particle beam; and
an objective lens provided between the stage and the aperture plate,
wherein the aperture plate has a stacked structure of a first member and a second member, the second member being stacked on and adhered to the first member, position of an end portion of the first opening portion in the second member is recessed from the position of an end portion of the first opening portion in the first member by between 0.5 μm and 5 μm, and a portion of the first member protruding into the first opening portion and having no portion of the second member stacked thereon has a substantially uniform thickness.
2. The charged particle beam writing apparatus according to claim 1 , wherein a charged particle beam transmittance of the second member is smaller than that of the first member.
3. The charged particle beam writing apparatus according to claim 1 , wherein the aperture plate further includes a second opening portion having an area smaller than that of the first opening portion and a third opening portion having the same shape as that of the second opening portion, and positions of end portions of the second and third opening portions in the second member are respectively recessed from the positions of end portions of the second and third opening portions in the first member.
4. The charged particle beam writing apparatus according to claim 1 , wherein, in the end portion of the first opening portion, an air gap exists in an interface between the first member and the second member.
5. The charged particle beam writing apparatus according to claim 1 , wherein the first and second members are formed of the same material.
6. The charged particle beam writing apparatus according to claim 5 , wherein the first and second members are formed of silicon.
7. The charged particle beam writing apparatus according to claim 1 , wherein the first and second members are formed of different materials.
8. The charged particle beam writing apparatus according to claim 7 , wherein the first member is formed of silicon, and the second member is formed of molybdenum, tungsten, or tantalum.
9. A charged particle beam writing apparatus comprising:
a stage on which a sample can be mounted;
an irradiation unit which emits a charged particle beam to be irradiated on the sample;
an aperture plate which includes a plurality of opening portions to form multi-beams by allowing a region including all the plurality of opening portions to be irradiated with the charged particle beam and allowing portions of the charged particle beam to pass through the plurality of opening portions: and
an objective lens provided between the stage and the aperture plate,
wherein the aperture plate has a stacked structure of a first member and a second member, the second member being stacked on and adhered to the first member, position of an end portion of each of the opening portions in the second member is recessed from the position of an end portion of the same opening portion in the first member by between 0.5 μm and 5 μm, and a portion of the first member protruding into the first opening portion and having no portion of the second member stacked thereon has a substantially uniform thickness.
10. The charged particle beam writing apparatus according to claim 9 , wherein a charged particle beam transmittance of the second member is smaller than that of the first member.
11. The charged particle beam writing apparatus according to claim 9 , wherein, in the end portion of the first opening portion, an air gap exists in an interface between the first member and the second member.
12. The charged particle beam writing apparatus according to claim 9 , wherein the plurality of opening portions each have the same dimension and shape.
13. The charged particle beam writing apparatus according to claim 9 , wherein the first and second members are formed of the same material.
14. The charged particle beam writing apparatus according to claim 13 , wherein the first and second members are formed of silicon.
15. The charged particle beam writing apparatus according to claim 9 , wherein the first and second members are formed of different materials.
16. The charged particle beam writing apparatus according to claim 15 , wherein the first member is formed of silicon, and the second member is formed molybdenum, tungsten, or tantalum.