Carrier bonding and detaching processes for a semiconductor wafer
The present invention provides a temporary carrier bonding and detaching process. A first surface of a semiconductor wafer is mounted on a first carrier by a first adhesive layer, and a first isolation coating disposed between the first adhesive layer and the first carrier. Then, a second carrier is mounted on the second surface of the semiconductor wafer. The first carrier is detached. Then, the first surface of the semiconductor wafer is mounted on a film frame. The second carrier is detached. The method of the present invention utilizes the second carrier to support and protect the semiconductor wafer, after which the first carrier is detached. Therefore, the semiconductor wafer will not be damaged or broken, thereby improving the yield rate of the semiconductor process. Furthermore, the simplicity of the detaching method for the first carrier allows for improvement in efficiency of the semiconductor process.
1. A method for handling a semiconductor wafer, comprising:
attaching a first carrier to an active surface of the semiconductor wafer using a first adhesive, the first carrier including at least one recess extending partially into the first carrier and allowing a portion of the first adhesive to flow therein;
exposing a tip of at least one conductive pillar formed in the semiconductor wafer by removing a portion of the inactive surface;
covering the exposed tips with a passivation layer; and
thinning the passivation layer so that the tips protrude from the passivation layer.
2. The method of claim 1 , further comprising:
attaching a second carrier to an inactive surface of the semiconductor wafer using a second adhesive.
3. The method of claim 2 , further comprising:
electroplating the tips.
4. The method of claim 2 , wherein the second adhesive is a thermal release adhesive.
5. The method of claim 2 , wherein the second adhesive is an ultraviolet light release adhesive.
6. The method of claim 5 , wherein the second carrier is substantially transparent.
7. The method of claim 2 , wherein the first adhesive and the second adhesive are substantially different.
8. The method of claim 2 , further comprising:
thinning the first carrier so as to expose the at least one recess;
dissolving at least a portion of the first adhesive, including at least some of the first adhesive contained in the at least one recess; and
removing the first carrier from the semiconductor wafer.
9. The method of claim 8 , further comprising:
mounting the semiconductor wafer on a frame;
transporting the semiconductor wafer using the frame; and
after the transporting, detaching the second carrier from the semiconductor wafer.
10. The method of claim 1 , wherein the first adhesive is a solvent-dissolving adhesive.
11. A method for handling a semiconductor wafer, comprising:
attaching a first carrier to an active surface of the semiconductor wafer using a first adhesive, wherein a first isolation layer made of a hydrophobic material is disposed between the first adhesive and the first carrier;
exposing a tip of at least one conductive pillar formed in the semiconductor wafer by removing a portion of the inactive surface;
covering the exposed tips with a passivation layer;
thinning the passivation layer so that the tips protrude from the passivation layer; and
attaching a second carrier to the inactive surface of the semiconductor wafer using a second adhesive, wherein a second isolation layer made of a hydrophobic material is disposed between the second adhesive and the second carrier.
12. The method of claim 11 , further comprising:
grinding a surface of the first carrier so as to make the first carrier thinner; and
etching the first carrier so as to detach the first carrier.
13. The method of claim 11 , wherein the second carrier is substantially transparent and the second adhesive is an ultraviolet light release adhesive.
14. The method of claim 11 , further comprising:
cutting at least one recess in the first carrier, the at least one recess penetrating into the first adhesive;
dissolving at least a portion of the first adhesive, including at least some of the first adhesive contained in the at least one recess; and
removing the first carrier from the semiconductor wafer.
15. The method of claim 11 , wherein the first adhesive is a thermal release adhesive, and further comprising:
mounting a first chuck to hold the first carrier;
mounting a second chuck to hold the second carrier; and
under a sufficiently high temperature, moving the first chuck and the second chuck in opposite directions to detach the first carrier from the semiconductor wafer.
16. A method for handling a semiconductor wafer, comprising:
attaching a first carrier to an active surface of the semiconductor wafer using a first adhesive, wherein a first isolation layer is disposed between the first adhesive and the first carrier;
exposing a tip of at least one conductive pillar formed in the semiconductor wafer by removing a portion of the inactive surface;
covering the exposed tips with a passivation layer; and
thinning the passivation layer so that the tips protrude from the passivation layer;
wherein the first isolation layer includes a hydrophobic material.
17. The method of claim 16 , further comprising:
attaching a second carrier to an inactive surface of the semiconductor wafer using a second adhesive, wherein a second isolation layer is disposed between the second adhesive and the second carrier.
18. The method of claim 17 , wherein the second isolation layer includes a hydrophobic material.