Semiconductor device manufacturing method, substrate processing apparatus and semiconductor device
A semiconductor device manufacturing method includes loading a substrate, on which a high-k film is formed, into a processing chamber, performing a reforming process by heating the high-k film through irradiation of a microwave on the substrate, and unloading the substrate from the processing chamber.
1. A semiconductor device manufacturing method, comprising:
loading a substrate, on which a high-k film is formed, into a processing chamber;
supporting the substrate with a substrate support unit installed on a substrate support table;
reforming the high-k film by heating the high-k film through irradiation by microwave on the substrate; and
unloading the substrate from the processing chamber;
wherein reforming the high-k film includes, if the temperature of the substrate supported with the substrate support unit exceeds a predetermined temperature during the irradiation by microwave, cooling the substrate to the predetermined temperature while the microwave is irradiating the substrate.
2. The method of claim 1 , wherein the high-k film is a compound having a dielectric constant of 8 or more and including 20 atom % or more of any one of Si, Al, Zr, Hf, Ti, and Sr, or a laminated film including the compound.
3. The method of claim 1 , wherein reforming the high-k film includes scanning a surface of the substrate by the microwave through rotation of the substrate support table.
4. The method of claim 1 , wherein the reforming the high-k film includes operating a diffusing mechanism that reflects and diffuses the microwave.
5. The method of claim 1 , wherein supporting the substrate by the substrate support unit includes placing the substrate at a position of quarter wavelength of the microwave from the substrate support table, or a position of an odd multiple of quarter wavelength of the microwave from the substrate support table.
6. The method of claim 1 , wherein the microwave irradiating the substrate has a frequency equal to or more than half of a peak frequency unique to the high-k film.
7. The method of claim 1 , wherein reforming the high-k film includes varying a frequency of the microwave irradiating the substrate.
8. The method of claim 1 , wherein supporting the substrate with the substrate support unit includes setting a distance between the substrate supported by the substrate support unit and a waveguide opening to be shorter than the wavelength of the microwave, and
wherein the waveguide opening is provided in the top wall of the processing chamber allowing the microwave irradiating the substrate to be introduced into the processing chamber.
9. The method of claim 1 , wherein the center position of a waveguide opening is eccentric from the center position of the substrate supported by the substrate support unit,
wherein the waveguide opening is provided in the top wall of the processing chamber allowing the microwave irradiating the substrate to be introduced into the processing chamber, and
wherein reforming the high-k film includes scanning a surface of the substrate by the microwave through rotation of the substrate support table.