Microlithographic imaging optical system including multiple mirrors
An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.
1. An imaging optical system having an object plane and an image plane, the imaging optical system comprising:
a plurality of mirrors configured to image an object field in the object plane into an image field in the image plane,
wherein:
the plurality of mirrors comprises a first mirror in a first plane;
of the plurality of mirrors, the first mirror is most closely adjacent to the object field or the image field;
the plurality of mirrors comprises a second mirror in a second plane;
the second plane is optically conjugated to the first plane; and
the imaging optical system is a microlithographic imaging optical system.
2. The imaging optical system of claim 1 , wherein the second mirror is a deformable mirror.
3. The imaging optical system of claim 2 , further comprising actuating elements configured to deform the second mirror.
4. The imaging optical system of claim 3 , wherein the actuating elements comprise Lorentz actuators.
5. The imaging optical system of claim 2 , wherein the imaging optical system comprises a plurality of deformable mirrors.
6. The imaging optical system of claim 2 , further comprising a detection device configured to detect a deformation of the first mirror.
7. The imaging optical system of claim 6 , further comprising an actuating element configured to deform the second mirror.
8. The imaging optical system of claim of claim 7 , further comprising a control device connected with the actuating element so that the actuating element deforms the second mirror based on a signal from the control device.
9. The imaging optical system of claim 8 , wherein the detection device is connected with the detection device so that deformation of the second mirror is based on deformation of the first mirror.
10. The imaging optical system of claim 2 , wherein the second mirror has a reflection surface without any holes in it.
11. The imaging optical system of claim 2 , wherein the second mirror comprises a plurality of mirror sections which are movable independently of each other.
12. The imaging optical system of claim 2 , wherein the second mirror comprises a piezo-electric layer.
13. The imaging optical system of claim 1 , wherein the imaging optical system comprises precisely six mirrors.
14. The imaging optical system of claim 1 , wherein a reflection surface of one of the plurality of mirrors is a rotationally symmetrical asphere.
15. The imaging optical system of claim 1 , wherein a reflection surface of one of the plurality of mirrors is a freeform surface which cannot be described by a rotationally symmetrical function.
16. The projection exposure system of claim 1 , wherein at least one of the plurality of mirrors has a through-opening through which the beam path passes.
17. A projection exposure system, comprising:
an imaging optical system according to claim 1 ; and
an optical illumination system configured so that, during use of the projection exposure system, the optical illumination system guides illumination light to the object field of the imaging optical system,
wherein the projection exposure system is a microlithography projection exposure system.
18. The projection exposure system of claim 17 , wherein the optical illumination system comprises a pupil facet mirror arranged in the entry pupil plane of the imaging optical system.
19. The projection exposure system of claim 17 , wherein the imaging optical system comprises precisely six mirrors.
20. The projection exposure system of claim 17 , wherein a reflection surface of one of the plurality of mirrors is a rotationally symmetrical asphere.
21. The projection exposure system of claim 17 , wherein a reflection surface of one of the plurality of mirrors is a freeform surface which cannot be described by a rotationally symmetrical function.
22. The projection exposure system of claim 15 , wherein at least one of the plurality of mirrors has a through-opening through which the beam path passes.
23. A method, comprising:
providing a microlithography projection exposure system, comprising:
an imaging optical system according to claim 1 ; and
an optical illumination system configured so that, during use of the projection exposure system, the optical illumination system guides illumination light to the object field of the imaging optical system;
using the microlithography projection exposure system to project a structure on a reticle onto a light-sensitive layer of the wafer; and
producing a microstructure on the wafer.