Integrated circuit and method of manufacturing the same
Presented is an integrated circuit packaged at the wafer level wafer (also referred to as a wafer level chip scale package, WLCSP), and a method of manufacturing the same. The WLCSP comprises a die having an electrically conductive redistribution layer, RDL, formed above the upper surface of the die, the RDL defining a signal routing circuit. The method comprises the steps of: depositing the electrically conductive RDL so as to form an electrically conductive ring surrounding the signal routing circuit; and coating the side and lower surfaces of the die with an electrically conductive shielding material.
1. A method of manufacturing a wafer level chip scale package, WLCSP, comprising a die having an electrically conductive redistribution layer, RDL, formed above the upper surface of the die, wherein the method comprises:
depositing the electrically conductive RDL so as to define a signal routing circuit and form an electrically conductive ring surrounding the signal routing circuit;
coating the side and lower surfaces of the die with an electrically conductive shielding material, wherein the electrically conductive shielding material contacts at least a portion of the periphery of the conductive ring; and
wherein after depositing the electrically conductive RDL and prior to coating the side and lower surfaces of the die with an electrically conductive shielding material, removing at least a portion of the periphery of the conductive ring.
2. The method of claim 1 , wherein coating the side and lower surfaces of the die with an electrically conductive shielding material comprises electroless plating the side and lower surfaces of the die with an electroless metal.
3. The method of claim 2 , wherein the electroless metal is an electroless nickel.
4. The method of claim 2 further comprising, prior to coating the side and lower surface of the die with an electrically conductive shielding material, turning the die over so as to reverse the orientation of the upper and lower surfaces of the die.
5. The method of claim 1 further comprising, prior to coating the side and lower surface of the die with an electrically conductive shielding material, turning the die over so as to reverse the orientation of the upper and lower surfaces of the die.
6. A method of manufacturing a wafer level chip scale package, WLCSP, comprising a die having an electrically conductive redistribution layer, RDL, formed above the upper surface of the die, wherein the method comprises:
depositing the electrically conductive RDL so as to define a signal routing circuit and form an electrically conductive ring surrounding the signal routing circuit:
coating the side and lower surfaces of the die with an electrically conductive shielding material, wherein the electrically conductive shielding material contacts at least a portion of the periphery of the conductive and
wherein prior to depositing the electrically conductive RDL, etching trenches in the die surrounding the signal routing circuit.
7. The method of claim 6 , wherein coating the side and lower surfaces of the die with an electrically conductive shielding material comprises electroless plating the side and lower surfaces of the die with an electroless metal.
8. The method of claim 7 , wherein the electroless metal is an electroless nickel.
9. The method of claim 6 , further comprising , prior to coating the side and lower surface of the die with an electrically conductive shielding material, turning the die over so as to reverse the orientation of the upper and lower surfaces of the die.