Solar cell comprising a plasmonic back reflector and method therefor

1. A solid-state dye-sensitized solar cell comprising:

a nanoimprinted surface, wherein the nanoimprinted surface includes a first arrangement of surface features; and

an electrode disposed on the nanoimprinted surface, wherein the electrode comprises a second arrangement of surface features that are based on the first arrangement of surface features, and wherein the second arrangement of surface features collectively define a plasmonic back reflector.

2. The solar cell of claim 1 further comprising a first layer, the first layer comprising a hole-transport material, and the first layer interposing the nanoimprinted surface and the electrode, wherein each of the first layer and the electrode is substantially conformal with the nanoimprinted surface.

3. The solar cell of claim 1 further comprising an active layer, the active layer comprising the nanoimprinted surface.

4. The solar cell of claim 3 wherein the active layer comprises titanium dioxide, a hole-transport material, and a sensitizing agent.

5. The solar cell of claim 1 wherein the nanoimprinted surface comprises surface features arranged in a two-dimensional hexagonal close-packed array.

6. The solar cell of claim 5 wherein the two-dimensional hexagonal close-packed array has a period that is within the range of approximately 400 nm to approximately 1200 nm.

7. The solar cell of claim 5 wherein the two-dimensional hexagonal close-packed array has a period that is approximately 900 nm.

8. A method for forming a solid-state dye-sensitized solar cell comprising:

forming a nanoimprinted surface, wherein the nanoimprinted surface includes a first arrangement of surface features; and

forming an electrode disposed on the nanoimprinted surface such that the electrode comprises a second arrangement of surface features that are based on the first arrangement of surface features, wherein the second arrangement of surface features collectively define a plasmonic back reflector.

9. The method of claim 8 wherein the nanoimprinted surface is formed by operations comprising:

providing a master template comprising a first surface comprising projections that are arranged in the first arrangement;

arranging the first surface and a second surface such that the first surface and second surface are in physical contact, wherein the solar cell comprises the second surface; and

applying a force between the master template and the solar cell, wherein the force is sufficient to embed the first surface into the second surface to induce an impression of at least a portion of the projections in the second surface.

10. The method of claim 8 wherein the nanoimprinted surface is formed by soft-nanoimprint lithography.

11. The method of claim 8 wherein the nanoimprinted surface is a surface of an active layer, the active layer having a mesoporous structure, and the active layer comprising a semiconductor, a sensitizing agent, and a hole-transport material.

12. The method of claim 8 further comprising forming a first layer that interposes the nanoimprinted surface and the electrode, wherein the first layer comprises a hole-transport material, and wherein the first layer is formed such that it is substantially conformal with the nanoimprinted surface.

13. The method of claim 12 wherein the first layer is formed such that it has a thickness within the range of approximately 50 nm to approximately 200 nm.

14. The method of claim 8 wherein the nanoimprinted surface is formed such that the first arrangement is a two-dimensional hexagonal close-packed array.

15. The method of claim 14 further comprising selecting a period for the array to enhance absorption of light within a range of wavelengths.

16. A method for forming a solid-state dye-sensitized solar cell comprising:

nanoimprinting a first layer of the solar cell to form a nanoimprinted surface, wherein the first layer comprises a plurality of pores, and wherein the first layer comprises titanium dioxide;

forming a second layer disposed on the nanoimprinted surface, the second layer comprising a hole-transport material; and

forming an electrode disposed on the second layer;

wherein each of the electrode and the second layer is substantially conformal with the nanoimprinted surface such that the electrode comprises a plurality of features that collectively define a plasmonic surface.

17. The method of claim 16 further comprising:

treating the first layer to add a sensitizing agent to the first layer.

18. The method of claim 16 wherein the second layer is formed by operations comprising:

dispensing a first material comprising the hole-transport material on the nanoimprinted surface;

distributing the first material over the nanoimprinted surface; and

controlling the thickness of the second layer by controlling at least one of (1) the quantity of first material dispensed on the nanoimprinted surface and (2) the concentration of the hole-transport material in the first material.

19. The method of claim 18 wherein the thickness of the second layer is controlled to be within the range of approximately 50 nm to approximately 200 nm.

20. The method of claim 16 wherein the first layer is nanoimprinted such that the nanoimprinted surface comprises surface features that are arranged in a two-dimensional hexagonal array.

21. The method of claim 20 , wherein the hexagonal array has a first periodicity, and the surface features have a first average depth and a first average width, and wherein the first periodicity, first average depth, and first average width are selected to enhance light absorption in the solar cell within a first wavelength range.

22. The method of claim 21 , wherein the first periodicity is approximately 900 nm, the first average depth is approximately 200 nm, and the first average width is approximately 600 nm.