Method to enable compressively strained pFET channel in a FinFET structure by implant and thermal diffusion
A method of making a semiconductor device patterns a first fin in a pFET region, and patterns a second fin in an nFET region. A plurality of conformal microlayers containing a straining material are deposited on the first and second fins. A protective cap material is formed on the first fin, and the conformal layers are selectively removed from the second fin. The straining material is then thermally diffused into the first fin. The protective cap material is removed from the first fin after the thermal annealing and after the conformal micro layers are selectively removed from the second fin.
1. A method of making a semiconductor device, said method comprising:
patterning a first fin-type field effect transistor (FinFET) device and a second FinFET device on a substrate;
successively depositing a plurality of conformal layers on both said first FinFET device and said second FinFET device, said conformal layers each comprising a straining agent;
patterning a protective cap material only on portions of said conformal layers covering said first FinFET device;
selectively removing said conformal layers only from said second FinFET device;
thermally annealing said conformal layers to drive said straining agent from said conformal layers into said first FinFET; and
applying a bias charge to said substrate during said depositing of said conformal layers on said first FinFET device and said second FinFET device.
2. The method of making a semiconductor device according to claim 1 , said conformal layers comprising several monolayers of conformal material.
3. The method of making a semiconductor device according to claim 1 , said bias charge comprising a bias below 3 kV.
4. The method of making a semiconductor device according to claim 1 , said straining agent, which also moves the threshold voltage of the pFET device closer to band edge.
5. The method of making a semiconductor device according to claim 1 , said thermal annealing driving said straining agent into lateral portions of said first FinFET device.
6. The method of making a semiconductor device according to claim 1 , said straining agent comprising Germanium.
7. A method of making a semiconductor device, said method comprising:
patterning a first fin-type field effect transistor (FinFET) device and a second FinFET device on a substrate, said first FinFET device having a first channel region and first source and drain regions on opposite sides of said first channel region, said second FinFET device having a second channel region and second source and drain regions on opposite sides of said second channel region;
forming a gate insulator on said first FinFET device and said second FinFET device;
patterning a gate conductor on portions of said gate insulator covering said first channel region and said second channel region;
successively depositing a plurality of conformal layers on both said first FinFET device and said second FinFET device while applying a bias charge to said substrate, said conformal layers each comprising a straining agent;
patterning a protective cap material only on portions of said conformal layers covering said first FinFET device;
selectively removing said conformal layers only from said second FinFET device in said nFET region; and
thermally annealing said conformal layers to drive said straining agent from said conformal layers into said first source and drain regions.
8. The method of making a semiconductor device according to claim 7 , said conformal layers comprising several monolayers of conformal material.
9. The method of making a semiconductor device according to claim 7 , said bias charge comprising a bias below 3 kV.
10. The method of making a semiconductor device according to claim 7 , said straining agent imparting a stress to said first FinFET device.
11. The method of making a semiconductor device according to claim 7 , said thermal annealing driving said straining agent into lateral portions of said first source and drain regions.
12. The method of making a semiconductor device according to claim 7 , said straining agent comprising Germanium.
13. A method of making a semi-conductor device, said method comprising:
patterning a first fin-type field effect transistor (FinFET) device on a substrate in a p-type field effect transistor (pFET) region of said substrate;
patterning a second FinFET device on said substrate in an n-type field effect transistor (nFET) region of said substrate;
plasma doping an impurity layer on said first FinFET device and said second FinFET device in said pFET region and said nFET region, respectively, while applying a bias charge to said substrate, said impurity layer comprising a straining agent;
forming a protective cap on said first FinFET device in said pFET region;
selectively removing said impurity layer from said second FinFET device in said nFET region; and
thermally annealing said impurity into said first FinFET in said pFET region.
14. The method of making a semi-conductor device according to claim 13 , said selectively removing of said impurity layer comprising:
masking said first FinFET; and
removing said impurity layer from said second FinFET.
15. The method of making a semi-conductor device according to claim 13 , said bias charge comprising a bias below 3 kV.
16. The method of making a semi-conductor device according to claim 13 , said plasma doping on said first FinFET device imparts a stress to said surface Si of said first FinFET device and converts a portion of said surface Si of said fin into an alloy of silicon and said impurity to one of lower threshold voltage and enhance carrier mobility, and said impurity comprising Germanium.
17. The method of making a semi-conductor device according to claim 13 , said thermal annealing diffuses said impurity into lateral portions of said first FinFET device.
18. The method of making a semi-conductor device according to claim 13 , said impurity comprising at least one of Germanium, Boron, Aluminum, Gallium, Antimony, Arsenic, and Phosphorous.