Hydrophilic photoacid generator and resist composition comprising same
Disclosed are a hydrophilic photoacid generator prepared by copolymerization of a first (meth)acrylic acid ester having a structure represented by the following Formula 1 or 2, with a polymerizable monomer selected from the group consisting of a second (meth)acrylic acid ester, an olefin-based compound and a mixture thereof, each of which contains a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a lactone group, a nitrile group and a halogen group: wherein respective substituents are defined in the specification, and a resist composition comprising the same. The hydrophilic photoacid generator is uniformly dispersed in a resist film, thus improving a line edge roughness of resist patterns.
1. A resist composition comprising a hydrophilic photoacid generator, a base copolymer and a solvent, wherein the photoacid generator is selected from the group consisting of compounds represented by Formulae 15 to 23:
wherein, in Formulae 15 to 23, ph represents a phenyl group, and m and n are numbers of repeat units present in the main chain and satisfy m+n=1, o<m/(m+n)≦0.99 and 0<n/(m+n)≦0.99.
2. The resist composition according to claim 1 , wherein the hydrophilic photoacid generator has a weight average molecular weight in terms of polystyrene measured by gel permeation chromatography (GPC) of 1,000 to 500,000 g/mol.
3. The resist composition according to claim 1 , wherein the hydrophilic photoacid generator has a ratio of weight average molecular weight to number average molecular weight of 1 to 5.
4. The resist composition according to claim 1 , wherein the hydrophilic photoacid generator is present in an amount of 0.3 to 10 parts by weight, with respect to 100 parts by weight of a solid content of the resist composition.