Method of measuring temperature of component in processing chamber of substrate processing apparatus
A component in a processing chamber of a substrate processing apparatus, where a temperature may be accurately measured by using a temperature measuring apparatus using an interference of a low-coherence light, even when a front surface and a rear surface are not parallel due to abrasion, or the like. A focus ring used in a vacuum atmosphere and of which a temperature is measured includes an abrasive surface exposed to an abrasive atmosphere according to plasma, a nonabrasive surface not exposed to the abrasive atmosphere, a thin-walled portion including a top surface and a bottom surface that are parallel to each other, and a coating member coating the top surface of the thin-walled portion, wherein a mirror-like finishing is performed on each of the top and bottom surfaces of the thin-walled portion.
1. A method of measuring a temperature of a component in a processing chamber of a substrate processing apparatus by using an interference of a low-coherence light, the method comprising:
irradiating a measurement light to a surface of a temperature measured portion at a nonabrasive surface side, wherein the temperature measured portion is formed in the component in the processing chamber of the substrate processing apparatus, the component comprising an abrasive surface exposed to an abrasive atmosphere and the nonabrasive surface not exposed to the abrasive atmosphere, a surface of the temperature measured portion at the abrasive surface side and the surface of the temperature measured portion at the nonabrasive surface side are parallel to each other, and the surface of the temperature measured portion at the abrasive surface side is covered by a coating portion;
receiving a reflection light of the measurement light reflected from the surface of the temperature measured portion at the nonabrasive surface side, and a reflection light of the measurement light reflected from the surface of the temperature measured portion at the abrasive surface side;
detecting an optical path length difference between the two received reflection lights; and
calculating a temperature of the temperature measured portion based on the detected optical path length difference and a pre-obtained relationship between the optical path length difference and a temperature of the temperature measured portion,
wherein the temperature measured portion is a thin-walled portion corresponding to a concave portion formed on the abrasive surface of the component in the processing chamber of the substrate processing apparatus, and a mirror surface finishing is performed on each of a surface of the thin-walled portion at the abrasive surface side and a surface of the thin-walled portion at the nonabrasive surface side.
2. The method of claim 1 , wherein a surface roughening process is performed on a surface of the coating portion facing the surface of the thin-walled portion at the abrasive surface side.
3. The method of claim 1 , wherein a heat transfer sheet or a heat transfer gas is disposed at a contact portion of the coating portion and an inner surface of the concave portion.
4. The method of claim 1 , wherein the coating portion is formed of any one of silicon (Si), silicon carbide (SiC), quartz, sapphire, ceramic, alumina (Al 2 O 3 ), and aluminum nitride (AlN).
5. The method of claim 1 , wherein the component in the processing chamber of the substrate processing apparatus is any one of a focus ring, an upper electrode, a lower electrode, an electrode protecting member, an insulator, an insulation ring, an observation window, a bellows cover, a baffle plate, and a deposhield.
6. A method of measuring a temperature of a component in a processing chamber of a substrate processing apparatus by using an interference of a low-coherence light, the method comprising:
irradiating a measurement light to a surface of a temperature measured portion at a nonabrasive surface side, wherein the temperature measured portion is formed in the component in the processing chamber of the substrate processing apparatus, the component comprising an abrasive surface exposed to an abrasive atmosphere and the nonabrasive surface not exposed to the abrasive atmosphere, a surface of the temperature measured portion at the abrasive surface side and the surface of the temperature measured portion at the nonabrasive surface side are parallel to each other, and the surface of the temperature measured portion at the abrasive surface side is covered by a coating portion;
receiving a reflection light of the measurement light reflected from the surface of the temperature measured portion at the nonabrasive surface side, and a reflection light of the measurement light reflected from the surface of the temperature measured portion at the abrasive surface side;
detecting an optical path length difference between the two received reflection lights; and
calculating a temperature of the temperature measured portion based on the detected optical path length difference and a pre-obtained relationship between the optical path length difference and a temperature of the temperature measured portion,
wherein the temperature measured portion is a temperature measured member inserted to a concave portion formed on the nonabrasive surface of the component in the processing chamber of the substrate processing apparatus, and
a mirror surface finishing is performed on each of a surface of the temperature measured member at the abrasive surface side and a surface of the temperature measured member at the nonabrasive surface side.
7. The method of claim 6 , wherein a surface roughing process is performed on an inner surface of the concave portion facing the surface of the temperature measured member at the abrasive surface side.
8. The method of claim 6 , wherein a heat transfer sheet or a heat transfer gas is disposed at a contact portion of the temperature measured member and the inner surface of the concave portion.
9. The method of claim 6 , wherein the temperature measured member is formed of silicon (Si), quartz, or sapphire.