Self-correcting power grid for semiconductor structures method
Aspects of the present invention relate to a self-correcting power grid for a semiconductor structure and a method of using thereof. Various embodiments include a self-correcting power grid for a semiconductor structure. The power grid may include a plurality of interconnect layers. Each of the plurality of interconnect layers may include a plurality of metal lines, where each of the plurality of metal lines are positioned substantially parallel to one another and substantially perpendicular to a plurality of distinct metal lines in adjacent interconnect layers. Additionally the interconnect layers may include a plurality of fuses formed within each of the metal lines of the plurality of interconnect layers. In the power grid, at least one of the fuses positioned immediately adjacent to a defect included in the power grid may be configured to blow during a testing process to isolate the defect.
1. A self-correcting power grid for a semiconductor structure, the power grid comprising:
a plurality of interconnect layers, each of the plurality of interconnect layers including:
a plurality of metal lines, each of the plurality of metal lines positioned substantially parallel to one another and positioned substantially perpendicular to a plurality of distinct metal lines in an adjacent interconnect layer;
a plurality of vias for electrically connecting each of the plurality of interconnect layers; and
a plurality of fuses positioned substantially adjacent to each of the plurality of vias, the plurality of fuses formed within each of the plurality of metal lines of each of the plurality of interconnect layers,
wherein at least one of the plurality of fuses positioned immediately adjacent to a defect included in at least one of the plurality of interconnect layers is configured to blow during a testing process to isolate the defect.
2. The power grid of claim 1 , wherein the plurality of metal lines of the plurality of interconnect layers include:
a plurality of voltage lines; and
a plurality of ground lines, wherein the plurality of voltage lines and the plurality of ground lines are positioned in an alternating pattern and positioned substantially parallel to one another.
3. The power grid of claim 1 , wherein each of the plurality of metal lines includes at least one fuse of the plurality of fuses positioned between each of the plurality of vias.
4. The power grid of claim 1 , wherein the defect included in the at least one of the plurality of interconnect layers is positioned through at least one of the plurality of metal lines.
5. The power grid of claim 1 , wherein a group of the plurality of fuses surrounding the at least one blown fuse of the plurality of fuses positioned immediately adjacent to the defect are configured to remain unblown during the testing process.
6. The power grid of claim 1 , wherein a predetermined number of fuses included in the plurality of fuses formed within each of the plurality of metal lines is based upon predetermined semiconductor structure characteristics.
7. The power grid of claim 6 , wherein a rated current of each of the plurality of fuses formed within each of the plurality of metal lines is based upon the predetermined semiconductor structure characteristics.
8. The power grid of claim 7 , wherein fuse characteristics of the plurality of fuses formed within each of the plurality of metal lines is based upon the predetermined semiconductor structure characteristics, the fuse characteristics including:
dimensions of each of the plurality of fuses; and
a material composition of each of the plurality of fuses.
9. The power grid of claim 8 , wherein the predetermined semiconductor structure characteristics are selected from a group consisting of: a desired operational current for at least one component of the semiconductor structure electrically connected to the power grid, the number of the at least one component of the semiconductor structure, dimensions of the power grid, predetermined reliability of the power grid of the semiconductor structure, an end-of-life reliability of the power grid, and a predetermined acceptable number of inoperable metal lines of the plurality of metal lines.
10. The power grid of claim 1 , wherein the testing process includes a stress-test performed on the semiconductor structure.