Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this type
A metrology system serves to examine an object arranged in an object field using EUV illumination light. An illumination optics of the metrology system has a collector mirror which is arranged in the beam path directly downstream of an EUV light source. Downstream of the collector mirror, less than three additional illumination mirrors are arranged in the beam path between the collector mirror and the object field. An intermediate focus is arranged in the beam path between the collector mirror and the additional illumination mirror. The metrology system further includes a magnifying imaging optics for imaging the object field into an image field in an image plane. As a result a metrology system is obtained which comprises an illumination optics that ensures an efficient illumination of the object field by means of illumination parameters which are well adapted to the illumination situation of current EUV projection exposure apparatuses.
1. Illumination optics for a metrology system for examining an object arranged in an object field using EUV illumination light, the illumination optics comprising:
a beam path between an EUV light source and the object field;
a collector mirror which is arrangeable in the beam path directly downstream of the EUV light source; and
less than three additional illumination mirrors arranged in the beam path between the collector mirror and the object field,
with an intermediate focal plane being arranged in the beam path between the collector mirror and the first additional illumination mirror.
2. The illumination optics according to claim 1 , wherein exactly two additional illumination mirrors are provided downstream of the collector mirror.
3. The illumination optics according to claim 2 , wherein the two additional illumination mirrors are NI mirrors.
4. The illumination optics according to claim 1 , wherein an illumination chief ray angle (α) is at least 6°.
5. The illumination optics according to claim 1 , wherein a numerical aperture on the object side is at least 0.0625.
6. The illumination optics according to claim 1 , comprising a setting stop in the beam path between the intermediate focal plane and the first additional illumination mirror downstream of the collector mirror.
7. The illumination optics according to claim 1 , comprising an arrangement of bundle-guiding components such that a plane, which is provided for arranging the EUV light source, is imaged into an object plane in which the object field is arranged.
8. A metrology system for examining an object arranged in an object field using EUV illumination light, the metrology system comprising:
an illumination optics according to claim 1 ; and
a magnifying imaging optics for imaging the object field into an image field in an image plane.
9. The metrology system according to claim 8 , wherein the imaging optics comprises exactly four mirrors.
10. The illumination optics according to claim 2 , wherein an illumination chief ray angle (α) is at least 6°.
11. The illumination optics according to claim 3 , wherein an illumination chief ray angle (α) is at least 6°.
12. The illumination optics according to claim 2 , wherein a numerical aperture on the object side is at least 0.0625.
13. The illumination optics according to claim 3 , wherein a numerical aperture on the object side is at least 0.0625.
14. The illumination optics according to claim 4 , wherein a numerical aperture on the object side is at least 0.0625.
15. The illumination optics according to claim 2 , comprising a setting stop in the beam path between the intermediate focal plane and the first additional illumination mirror downstream of the collector mirror.
16. The illumination optics according to claim 3 , comprising a setting stop in the beam path between the intermediate focal plane and the first additional illumination mirror downstream of the collector mirror.
17. The illumination optics according to claim 4 , comprising a setting stop in the beam path between the intermediate focal plane and the first additional illumination mirror downstream of the collector mirror.
18. The illumination optics according to claim 5 , comprising a setting stop in the beam path between the intermediate focal plane and the first additional illumination mirror downstream of the collector mirror.
19. The illumination optics according to claim 2 , comprising an arrangement of bundle-guiding components such that a plane, which is provided for arranging the EUV light source, is imaged into an object plane in which the object field is arranged.
20. The illumination optics according to claim 3 , comprising an arrangement of bundle-guiding components such that a plane, which is provided for arranging the EUV light source, is imaged into an object plane in which the object field is arranged.
21. Illumination optics for a metrology system for examining an object arranged in an object field using EUV illumination light, the illumination optics comprising:
a beam path between an EUV light source and the object field;
a collector mirror which is arrangeable in the beam path directly downstream of the EUV light source;
less than three additional illumination mirrors arranged in the beam path between the collector mirror and the object field, with an intermediate focal plane being arranged in the beam path between the collector mirror and the first additional illumination mirror; and
a setting stop in the beam path between the intermediate focal plane and the first additional illumination mirror downstream of the collector mirror.