Photopatternable imaging layers for controlling block copolymer microdomain orientation
The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
1. A structure comprising:
a crosstinked polymer mat, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosstlinked polymer mat has a thickness of no greater than about 5 nm and the random copolymer has a crosslinking density of at least about 2%; and
a self-assembled block copolymer film disposed over the crosslinked polymer mat, the self-assembled block copolymer film comprising domains uniformly oriented perpendicular to the crosslinked polymer mat.
2. The structure of claim 1 , wherein the self-assembled block copolymer film comprises domains oriented parallel to the crosslinked polymer mat.
3. The structure of claim 1 , wherein the crosslinked polymer mat has a thickness of no greater than about 4 nm.
4. The structure of claim 1 , wherein the crosslinked polymer mat has a thickness of no greater than about 3 nm.
5. The structure of claim 1 , wherein the crosslinked polymer mat has a thickness of no greater than about 2 nm.
6. The structure of claim 3 , wherein the random copolymer has a crosslinking density of at least about 3%.
7. The structure of claim 3 , wherein the random copolymer has a crosslinking density of at least about 4%.
8. The structure of claim 3 , wherein the random copolymer has a crosslinking density of at least about 5%.
9. The structure of claim 1 , further comprising a substrate underlying crosslinked polymer mat.
10. The structure of claim 9 , wherein the structure comprises a pattern transfer mask and the underlying substrate comprises a patterned transferred from the pattern transfer mask.
11. The structure of claim 1 , wherein the orientation of the self-assembled block copolymer film is induced by the crosslinked polymer mat.
12. The structure of claim 1 , wherein the crosslinkable monomer is a photo-crosslinkable monomer or a thermally cross-linkable monomer.
13. The structure of claim 5 , wherein the random copolymer has a crosslinking density of at least about 3%.
14. A structure comprising:
a substrate; and
a crosslinked polymer film disposed over the substrate and configured for inducing uniform perpendicular domain orientation in a block copolymer film, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosslinked polymer film has a thickness of no greater than about 8 nm and the random copolymer has a crosslinking density of at least about 2%.
15. The structure of claim 14 , wherein the crosslinked polymer film has a thickness of no greater than about 5 nm.
16. The structure of claim 15 , wherein the crosslinked polymer film has a thickness of no greater than about 4 nm.
17. The structure of claim 15 , wherein the crosslinked polymer film has a thickness of no greater than about 3 nm.
18. The structure of claim 14 , wherein the third monomer is a photo-crosslinkable monomer.
19. A structure comprising:
a substrate;
a crosslinked polymer film disposed over the substrate, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a photo-crosslinkable or thermally-crosslinkable monomer, and further wherein the crosslinked polymer film has a thickness of no greater than about 5 nm and the random copolymer has a crosslinking density of at least about 2%; and
a block copolymer film defining a pattern disposed over the crosslinked polymer film, the block copolymer film including domains of uniform perpendicular orientation;
wherein the crosslinked polymer film produces the pattern by inducing the self-assembly of the block copolymer.
20. A structure comprising:
substrate; and
a crosslinked polymer film disposed over the substrate and configured for inducing uniform domain orientation in a block copolymer film, the erosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosslinked polymer film has a thickness of no greater than about 8 nm and the random copolymer has a crosslinking density of at least about 3%.
21. The structure of claim 20 , wherein the random copolymer has a crosslinking density of at least about 4%.
22. The structure of claim 20 , wherein the random copolymer has a crosslinking density of at least about 5%.
23. The structure of claim 20 , wherein the crosslinked polymer film has a thickness of no greater than about 6 nm.
24. The structure of claim 20 , wherein the crosslinked polymer film has a thickness of no greater than about 5 nm.