Photonics grating coupler and method of manufacture
A structure for coupling an optical signal between an integrated circuit photonic structure and an external optical fiber is disclosed as in a method of formation. The coupling structure is sloped relative to a horizontal surface of the photonic structure such that light entering or leaving the photonic structure is substantially normal to its upper surface.
1. A photonic structure comprising:
a substrate;
a photonic element supported by the substrate and having horizontal portion and a sloped portion coupled to the horizontal portion; and
a grating formed at the sloped portion for directing light into or out of the photonic element, and
wherein the photonic element is a waveguide core, and
wherein the photonic structure further comprises a lower cladding material between the substrate and waveguide core, the lower cladding material having a horizontal portion and a sloped portion, the waveguide core being provided over the lower cladding material.
2. A photonic structure comprising:
a substrate;
a photonic element supported by the substrate and having horizontal portion and a sloped portion coupled to the horizontal portion; and
a grating formed at the sloped portion for directing light into or out of the photonic element, and
wherein the photonic element is a waveguide core, and
wherein the slope of the sloped portion of the waveguide core is in the range of about 8 to about 12 degrees with respect to the horizontal portion of the waveguide core.
3. A photonic structure as in claim 1 , further comprising an upper cladding material over the waveguide core having a flat upper surface and wherein the light is directed by the grating in a direction substantially normal to the flat upper surface.
4. A photonic structure as in claim 1 , wherein the lower cladding material comprises an oxide.
5. A photonic structure as in claim 3 , wherein the waveguide core and upper lower cladding material provide a waveguide suitable for transmitting light in the wavelength range of 1525 nm to 1565 nm.
6. A photonic structure as in claim 3 , wherein the waveguide core and upper and lower cladding material provide a waveguide suitable for transmitting light in the wavelengths range of 1180 nm to 1260 nm.
7. A photonic structure as in claim 4 , wherein the oxide comprises silicon dioxide.
8. A photonic coupler, comprising:
a lower cladding material over a substrate, the lower cladding material having a first horizontal portion with an upper surface which is substantially parallel to the upper surface of the substrate and a second portion contiguous with the first portion which has an upper surface with an upward slope relative to the upper surface of the first portion;
a waveguide core material provided over the first and second portions of the lower cladding material such that the waveguide core material has a first horizontal portion provided over the first portion of the lower cladding material and a second portion provided over the second portion of the lower cladding material, the second portion of the waveguide core having an upward slope relative to the first horizontal portion of the waveguide core; and,
a grating coupler formed in an upper surface of the second portion of the waveguide core, the grating coupler being arranged to transmit or receive light passing through the waveguide core.
9. A photonic coupler as in claim 8 , wherein the grating coupler is configured to transmit or receive light in a direction substantially normal to an upper surface of the first horizontal portion of the waveguide core.
10. A photonic coupler as in claim 9 , further comprising an upper cladding material provided over the waveguide core and having a flat upper surface which is substantially parallel to the upper surface of the first horizontal portion of the waveguide core, wherein light passing to or from the grating coupler is substantially normal to an upper surface of the upper cladding material.
11. A photonic coupler as in claim 10 , wherein the upper cladding material comprises an anti-reflective coating material.
12. A photonic coupler as in claim 11 , wherein the anti-reflective coating material comprises silicon nitride.
13. A photonic coupler as in claim 10 , wherein spaced grooves extend through the upper cladding material and into the sloped portion of the waveguide core.
14. A photonic coupler as in claim 13 , wherein the upper cladding material further comprises an additional cladding material within the grooves of the upper cladding material and grooves of the sloped portion of the waveguide core.
15. A photonic coupler as in claim 14 , wherein the additional cladding material comprises an oxide.
16. A photonic coupler as in claim 15 , wherein the oxide comprises silicon dioxide.
17. A photonic coupler as in claim 8 , wherein the second portion of the waveguide core is sloped within the range of about 8 degrees to about 12 degrees with respect to the first horizontal portion of the waveguide core.
18. A photonic coupler as in claim 8 , wherein the second portion of the waveguide core is sloped within the range of about 11.5 to about 12 degrees with respect to the first horizontal portion of the waveguide core.
19. A photonic coupler as in claim 8 , wherein the grating coupler is formed by spaced grooves in the second portion of the waveguide core, the spaced grooves being oriented substantially vertically relative to an upper surface of the first horizontal portion of the waveguide core.
20. A photonic coupler as in claim 19 , wherein the spaced grooves in the second portion of the waveguide core have a depth from the upper surface of the waveguide core to the bottom of the grooves in the range of about 270 nm to about 280 nm.
21. A photonic coupler as in claim 19 , wherein the spaced grooves have a period of about 498 nm.
22. A photonic coupler as in claim 8 , wherein the grating coupler emits light in a direction which is substantially normal to the direction of light passing through the horizontal portion of the waveguide core.
23. A method of forming a photonic structure, the method comprising:
forming a waveguide core having a horizontal portion and a contiguous sloped portion over a lower cladding material; and
forming an optical grating in the sloped portion of the waveguide core,
wherein the sloped portion of the waveguide core has a sloped angle relative to the horizontal portion which causes light emitted by the grating to be in a direction substantially normal to an upper surface of the horizontal portion of the waveguide core, and
wherein the method further comprises forming the lower cladding material over an upper surface of a supporting substrate, the lower cladding material having a horizontal upper surface and a sloped upper surface; and forming the waveguide core over the lower cladding material.
24. A method of forming a photonic structure, the method comprising:
forming a waveguide core having a horizontal portion and a contiguous sloped portion over a lower cladding material; and
forming an optical grating in the sloped portion of the waveguide core, and
wherein the sloped portion of the waveguide core has a slope in the range of about 8 to about 12 degrees relative to the horizontal portion of the waveguide core.
25. A method of forming a photonic structure, the method comprising:
forming a waveguide core having a horizontal portion and a contiguous sloped portion over a lower cladding material; and
forming an optical grating in the sloped portion of the waveguide core, and
wherein forming the sloped surface of the lower cladding material further comprises: forming the lower cladding material over the upper surface of the substrate; forming a photoresist material over the lower cladding material; gray scale lithograph patterning the photoresist material to form a slope therein; and etching through the gray scale patterning photoresist material and into the underlying first cladding material to form a slope in the lower cladding material.
26. A method as in claim 25 , further comprising using a high resolution 193 nm laser light source and a gray scale mask to gray scale pattern the photoresist material.
27. A method as in claim 25 , wherein the etching comprises a dry etching.
28. A method as in claim 25 , wherein forming the optical grating further comprises forming an upper cladding material over the sloped portion of the waveguide core and etching grooves through the upper cladding material and into an upper surface of the sloped portion of the waveguide core.
29. A method as in claim 27 , wherein the dry etch comprises a reactive ion etch.