Liquid processing apparatus
A liquid processing apparatus according to the present disclosure includes: a substrate holding unit configured to horizontally hold a substrate; a rotation driving unit configured to rotate the substrate holding unit about a vertical axis; a processing liquid supply unit configured to supply a processing liquid to the substrate while the substrate is being rotated; an upper guide ring and a lower guide ring which are configured to be rotated together with the substrate holding unit, to surround the substrate, to be arranged vertically to overlap each other with a gap therebetween, and to guide the processing liquid scattered from the substrate; and a rotating cup configured to be rotated together with the substrate holding unit, and to receive and downwardly guide the guided processing liquid.
1. A liquid processing apparatus comprising:
a substrate holding unit configured to horizontally hold a substrate;
a rotation driving unit configured to rotate the substrate holding unit about a vertical axis;
a processing liquid supply unit configured to supply a processing liquid to the substrate while the substrate is being rotated;
a rotating cup including an upper wall portion configured to cover an outer area of a peripheral edge of the substrate and a side wall portion configured to extend downward; and
an upper guide ring and a lower guide ring provided between the upper wall portion of the rotating cup and the substrate holding unit, and each configured to be rotated together with the substrate holding unit, to surround the substrate held by the substrate holding unit, to be arranged vertically to overlap with each other with a gap therebetween, and to guide the processing liquid scattered from the substrate,
wherein the rotating cup is surrounded by a cylindrical circumference wall and configured to be rotated together with the substrate holding unit, and to receive and downwardly guide the processing liquid guided by the upper guide ring and the lower guide ring while surrounding the upper guide ring and the lower guide ring such that the processing liquid flows through a gap between the upper wall portion of the rotating cup and the upper guide ring and the gap between the upper guide ring and the lower guide ring, and then flows downward to an external cup,
the upper guide ring and the lower guide ring are arranged in a vertical direction such that the gap between the upper guide ring and the lower guide ring is positioned at a center of a height position of the substrate in a thickness direction and becomes narrower as approaching an outer circumferential side while an outer circumference of each of the upper guide is crescent shaped such that each of a bottom surface of the upper guide ring and a top surface of the lower guide ring is obliquely slanted downward, and
each of a height position of a top surface and a bottom surface of the upper guide ring and a height position of a top surface and a bottom surface of the lower guide ring is lower at the outer circumferential side than an inner side.
2. The liquid processing apparatus of claim 1 , wherein the bottom surface of the upper guide ring is disposed at a position higher than the bottom surface of the substrate held by the substrate holding unit, and the top surface of the lower guide ring is disposed at a position lower than the top surface of the substrate.
3. The liquid processing apparatus of claim 1 , wherein the outer circumferences of the upper guide ring and the lower guide ring are obliquely slanted downward.
4. The liquid processing apparatus of claim 1 , wherein the rotating cup is accommodated inside an annular outer cup, the annular outer cup has an upper wall portion configured to cover the rotating cup from the above, and an opening having a diameter smaller than the diameter of the substrate is formed at a top side central portion of the upper wall portion.
5. The liquid processing apparatus of claim 4 , wherein the upper wall portion is formed in a truncated conical shape.
6. The liquid processing apparatus of claim 1 , wherein a truncated conical cover member is provided at a top side of the rotating cup, and the truncated conical cover member is configured to be rotated together with the substrate holding unit and having an opening of which the diameter is smaller than the diameter of the substrate at a top side central portion of the truncated conical cover member.
7. The liquid processing apparatus of claim 1 , wherein each of the upper guide ring and the lower guide ring has an inner circumferential surface, which faces the side circumferential surface of the substrate, with an end portion of an acute angle.
8. The liquid processing apparatus of claim 1 , wherein at least one of a bottom surface of the upper guide ring and a top surface of the lower guide ring is formed with a linear protrusion configured to guide the processing liquid introduced into the gap between the upper guide ring and the lower guide ring to an outside.