Method for correcting the surface form of a mirror
A method for correcting a surface form of a mirror ( 1 ) for reflecting radiation in the wavelength range of 5-30 nm, which includes: applying a correction layer ( 13 ) having a layer thickness variation ( 21 ) for correcting the mirror's surface form, and applying a first group ( 19 ) of layers to the correction layer. The first group ( 19 ) of layers includes first ( 9 ) and second ( 11 ) layers arranged alternately one above another, wherein the first layers have a refractive index at the operating wavelength which is greater than the refractive index of the second layers for that radiation. The correction layer ( 13 ) is applied by: introducing the mirror into an atmosphere including a reaction gas ( 15 ), applying a correction radiation ( 17 ) having a location-dependent radiation energy density, such that a correction layer having a location-dependent layer thickness variation ( 21 ) grows on the mirror's irradiated surface.
1. A method for correcting a surface form of a mirror for reflecting radiation having an operating wavelength in the range of 5-30 nm,
wherein the mirror comprises a substrate,
wherein the method comprises:
applying a correction layer having a layer thickness variation for correcting the surface form of the mirror, and
applying a first group of layers to the correction layer, wherein the first group of layers comprises a plurality of first and second layers arranged alternately one above another, wherein the first layers have a refractive index for radiation having the operating wavelength which is greater than a refractive index of the second layers for radiation having the operating wavelength,
wherein applying the correction layer having the layer thickness variation for correcting the surface form of the mirror comprises:
introducing the mirror into an atmosphere comprising a reaction gas,
applying a correction radiation having a location-dependent radiation energy density to the mirror such that a correction layer having a location-dependent layer thickness variation grows on the irradiated surface of the mirror.
2. The method according to claim 1 , wherein
the mirror, prior to the correction layer being applied, comprises a reflective coating for reflecting radiation having an operating wavelength in the range of 5-30 nm,
wherein the reflective coating comprises a second group of layers, wherein the second group of layers comprises a plurality of first and second layers arranged alternately one above another,
and wherein the first layers have a refractive index for radiation having the operating wavelength which is greater than a refractive index of the second layers for radiation having the operating wavelength.
3. The method according to claim 1 , wherein
the correction radiation reacts with the atmosphere of the reaction gas such that at least one of a constituent of and a chemical reaction product of the reaction gas is deposited on the irradiated surface of the mirror, such that the correction layer grows in response to the deposition.
4. The method according to claim 3 , wherein
the deposition is proportional to the radiation energy density of the correction radiation at various locations on the irradiated surface of the mirror.
5. The method according to claim 3 , wherein
the correction radiation comprises at least one of an electromagnetic radiation, an ion radiation, an electron radiation and a radiation of chemical radicals.
6. The method according to claim 3 , wherein
the constituent or the chemical reaction product originates from a group consisting of:
carbon, silicon, sulfur, phosphorus, fluorine or organic compounds based on these elements, and inorganic metal compounds.
7. The method according to claim 1 , wherein
the correction radiation is an electromagnetic radiation having a wavelength of less than 250 nm, such that photoelectrons are released from an irradiated mirror surface and lead to a dissociation of adsorbed molecules of the reaction gas, such that the correction layer grows in accordance with a deposition of at least one of the dissociation products of the reaction gas.
8. The method according to claim 1 , wherein
the correction radiation comprises hydrogen radicals which lead to an enrichment of the reaction gas with metal hydride compounds, such that the metal is deposited and the correction layer comprising the metal grows on the irradiated surface of the mirror.
9. The method according to claim 1 , further comprising, prior to the correction radiation being applied to the mirror, applying an auxiliary layer to the mirror to control a growth rate of the correction layer.
10. A method for correcting imaging properties of a projection optical unit of a microlithography projection exposure apparatus, comprising a method for correcting a surface form of a mirror of the projection optical unit as claimed in claim 1 .
11. A method for correcting imaging properties of a projection optical unit of a microlithography projection exposure apparatus comprising:
a. determining wavefront aberrations of the projection optical unit,
b. calculating a correction surface form of at least one mirror from the wavefront aberrations of the projection optical unit, and
c. correcting a surface form of the at least one mirror according to the method claimed in claim 1 .