Vertical breakdown protection layer
The present disclosure relates to a semiconductor structure including a plurality of connecting lines arranged on a plurality of vertical levels, the plurality of connecting lines including at least a first connecting line arranged in a first vertical level and a second connecting line arranged in a second vertical level, different from the first vertical level, and a breakdown prevention layer placed in at least part of the vertical space separating the first connecting line from the second connecting line.
1. A semiconductor structure, comprising:
a plurality of connecting lines arranged on a plurality of vertical levels, said plurality of connecting lines comprising at least a first connecting line arranged in a first vertical level and a second connecting line arranged in a second vertical level that is different from said first vertical level; and
a dielectric breakdown prevention layer positioned in a vertical space separating said first connecting line from said second connecting line, said dielectric breakdown prevention layer and said first connecting line having substantially a same lateral width.
2. The semiconductor structure of claim 1 , wherein said dielectric breakdown prevention layer is a silicon-based dielectric film.
3. The semiconductor structure of claim 1 , wherein said dielectric breakdown prevention layer has a thickness in the range of approximately 5-30 nm.
4. The semiconductor structure of claim 1 , wherein said first connecting line and said dielectric breakdown prevention layer are embedded in a layer of a silicon-based insulator material, a portion of said layer of said silicon-based insulator material being in said vertical space and separating said dielectric breakdown prevention layer from said second connecting line.
5. The semiconductor structure of claim 1 , wherein at least one of said first connecting line and said second connecting line comprises one of copper and aluminum.
6. The semiconductor structure of claim 5 , wherein said at least one of said first and second connecting lines comprises one of a CuMn alloy and a CuAl alloy.
7. The semiconductor structure of claim 4 , wherein said silicon-based insulator material comprises one of SiCOH and SiO 2 .
8. The semiconductor structure of claim 4 , wherein said first connecting line comprises a layer of conductive metal and a diffusion barrier layer positioned between said layer of conductive metal and said layer of said silicon-based insulator material.
9. The semiconductor structure of claim 4 , wherein said layer of conductive metal comprises copper and said diffusion barrier layer comprises tantalum.
10. The semiconductor structure of claim 2 , wherein said silicon-based dielectric film comprises one of SiN and SiCN.
11. The semiconductor structure of claim 1 , further comprising an etch stop layer positioned in said vertical space and between said dielectric breakdown prevention layer and said second connecting line.
12. A semiconductor structure, comprising:
a first metal level, comprising:
a first dielectric layer; and
a first conductive connecting line embedded in said first dielectric layer; and
a second metal level positioned vertically adjacent to said first metal level, said second metal level comprising:
a second dielectric layer;
a second conductive connecting line embedded in said second dielectric layer; and
a dielectric breakdown prevention layer embedded in said second dielectric layer, wherein said dielectric breakdown prevention layer is positioned vertically adjacent to said second conductive connecting line, wherein a portion of said second dielectric layer is positioned between and vertically separates said dielectric breakdown prevention layer from said first conductive connecting line, and wherein said second conductive connecting line has substantially a same lateral width as said dielectric breakdown prevention layer.
13. The semiconductor structure of claim 12 , further comprising a dielectric etch stop layer positioned between said dielectric breakdown prevention layer and said first conductive connecting line.
14. The semiconductor structure of claim 12 , wherein a dielectric constant of said dielectric breakdown prevention layer is greater than a dielectric constant of said second dielectric layer.
15. The semiconductor structure of claim 14 , wherein said second conductive connecting line comprises a layer of conductive metal and a diffusion barrier layer positioned between said layer of conductive metal and said second dielectric material.
16. The semiconductor structure of claim 12 , wherein said first metal level is positioned vertically below said second metal level.
17. The semiconductor structure of claim 16 , wherein a bottom surface of said second conductive connecting line directly contacts said dielectric breakdown prevention layer.
18. The semiconductor structure of claim 17 , further comprising a third conductive connecting line embedded in said second dielectric layer and positioned laterally adjacent to said second conductive connecting line, wherein a further portion of said second dielectric layer vertically separates said third conductive connecting line from said first conductive connecting line and directly contacts a bottom surface of said third conductive connecting line, said second conductive connecting line being adapted to carry a higher voltage than said third conductive connecting line.
19. The semiconductor structure of claim 12 , wherein said first metal level is positioned vertically above said second metal level.
20. The semiconductor structure of claim 12 , wherein said first and second dielectric layers comprise a same silicon-based dielectric insulator material.