High mobility PMOS and NMOS devices having Si—Ge quantum wells

1. A method for providing a semiconductor base structure, comprising:

forming a substrate;

forming a strained relaxed layer on said substrate;

forming a first tensile strained layer on said strained relaxed layer;

forming a first compressive strain layer on said first tensile strained layer;

forming a second tensile strained layer above said first compressive strain layer; and

forming a second compressive strain layer above said second tensile strained layer.

2. The method of claim 1 , further comprising:

determining whether an NMOS device or a PMOS is to be formed on said base structure;

forming a third tensile strained layer above said second compressive strain layer in response to determining that an NMOS device is to be formed on said base structure.

3. The method of claim 1 , further comprising forming at least one of an NMOS device and a PMOS device on said semiconductor base structure.

4. The method of claim 1 , wherein forming a strained relaxed layer on said substrate comprises forming a layer comprising silicon at a first concentration and germanium at a second concentration.

5. The method of claim 1 , wherein forming said first tensile strained layer comprises forming a layer comprising silicon at a first concentration and germanium at a second concentration, wherein said first concentration is greater than said second concentration.

6. The method of claim 5 , further comprising adjusting at least one of said first and second concentrations for adjusting the electron mobility of said first tensile strained layer.

7. The method of claim 1 , wherein forming said first compressive strain layer comprises comprising silicon at a first concentration and germanium at a second concentration, wherein said second concentration is greater than said first concentration.

8. The method of claim 7 , further comprising adjusting at least one of said first and second concentrations for adjusting the hole mobility of said first compressive strained layer.

9. The method of claim 1 , wherein:

forming said strained relaxed layer comprises forming said strained relaxed layer having a thickness of about 0.1 micron to about 5 microns;

forming said first tensile strained layer comprises forming said first tensile strained layer having a thickness of about 60 Angstroms to about 600 Angstroms; and

forming said first compressive strain layer comprises forming said first compressive strain layer having a thickness of about 60 Angstroms to about 600 Angstroms.

10. The method of claim 1 , wherein further comprising at least one of:

forming an N-channel MOSFET on said base substrate;

forming an N-channel finFET on said base substrate;

forming a P-channel MOSFET on said base substrate; or

forming a P-channel finFET on said base substrate.

11. A semiconductor device, comprising:

a silicon substrate;

a strained relaxed layer positioned on said silicon substrate; and

a quantum well layer positioned on said strained relaxed layer, wherein said quantum well layer comprising a tensile strained layer positioned on said strained relaxed layer, and a compressive strain layer on said tensile strained layer; and

wherein said semiconductor base substrate is capable of providing an enhanced current drive for at least one of a NMOS device and a PMOS device formed on said quantum well layer.

12. The semiconductor device of claim 11 , wherein said quantum well layer comprises a plurality of tensile strained layers and a plurality of compressive strain layers, wherein said tensile strained layers are formed alternating with said compressive strain layers.

13. The semiconductor device of claim 11 , wherein said NMOS device is at least one of an N-channel MOSFET or an N-channel finFET; and wherein said PMOS device is at least one of a P-channel MOSFET or a P-channel finFET.

14. The semiconductor device of claim 11 , wherein said strained relaxed layer on said substrate comprises silicon and germanium at equal concentrations.

15. The semiconductor device of claim 11 , wherein said tensile strained layer comprises silicon at a first concentration and germanium at a second concentration, wherein said first concentration is greater than said second concentration.

16. The semiconductor device of claim 11 , wherein said compressive strain layer comprises silicon at a first concentration and germanium at a second concentration, wherein said second concentration is greater than said first concentration.

17. A system, comprising:

a semiconductor device processing system to provide an integrated circuit device, wherein said integrated circuit device comprises:

a silicon substrate;

a strained relaxed layer positioned on said silicon substrate; and

a quantum well layer positioned on said strained relaxed layer wherein said quantum well layer comprising a tensile strained layer positioned on said strained relaxed layer, and a compressive strain layer on said tensile strained layer; and

wherein said semiconductor base substrate is capable of providing an increased current drive for at least one of a NMOS device and a PMOS device formed on said quantum well layer; and

a processing controller operatively coupled to said semiconductor device processing system, said processing controller configured to control an operation of said semiconductor device processing system.

18. The system of claim 17 , further comprising a base structure unit for providing data comprising a plurality of parameters for fabricating said integrated circuit device.

19. The system of claim 17 , wherein:

said quantum well layer comprises a plurality of tensile strained layers and a plurality of compressive strain layers, wherein said tensile strained layers are formed alternating with said compressive strain layers; and

said NMOS device is at least one of an N-channel MOSFET or an N-channel finFET; and wherein said PMOS device is at least one of a P-channel MOSFET or a P-channel finFET.