Method for manufacturing semiconductor device
It is an object to provide a highly reliable semiconductor device which includes a thin film transistor having stable electric characteristics. It is another object to manufacture a highly reliable semiconductor device at lower cost with high productivity. In a method for manufacturing a semiconductor device which includes a thin film transistor where a semiconductor layer having a channel formation region, a source region, and a drain region are formed using an oxide semiconductor layer, heat treatment (heat treatment for dehydration or dehydrogenation) is performed so as to improve the purity of the oxide semiconductor layer and reduce impurities such as moisture. Moreover, the oxide semiconductor layer subjected to the heat treatment is slowly cooled under an oxygen atmosphere.
1. A method for manufacturing a semiconductor device comprising the steps of:
forming a first oxide semiconductor layer;
forming a second oxide semiconductor layer over the first oxide semiconductor layer;
performing a heat treatment on the first oxide semiconductor layer and the second oxide semiconductor layer to be dehydrated or dehydrogenated, whereby each of the first oxide semiconductor layer and the second oxide semiconductor layer has a carrier density of 1×10 18 /cm 3 or more;
etching a part of the second oxide semiconductor layer so as to expose a part of the first oxide semiconductor layer; and
forming an oxide insulating layer over and in contact with the part of the first oxide semiconductor layer, whereby the part of the first oxide semiconductor layer has a carrier density of less than 1×10 18 /cm 3 .
2. The method for manufacturing a semiconductor device according to claim 1 , wherein the heat treatment is performed under an inert gas atmosphere.
3. The method for manufacturing a semiconductor device according to claim 2 , wherein the inert gas atmosphere comprises nitrogen.
4. The method for manufacturing a semiconductor device according to claim 1 , wherein the heat treatment is performed at 400° C. or higher.
5. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the first oxide semiconductor layer comprises indium, gallium, and zinc, and
wherein the second oxide semiconductor layer comprises indium and zinc.
6. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the first oxide semiconductor layer comprises indium, tin, and zinc, and
wherein the second oxide semiconductor layer comprises indium and zinc.
7. A method for manufacturing a semiconductor device comprising the steps of:
forming a first oxide semiconductor layer;
forming a second oxide semiconductor layer over the first oxide semiconductor layer;
performing a first heat treatment on the first oxide semiconductor layer and the second oxide semiconductor layer to be dehydrated or dehydrogenated, whereby each of the first oxide semiconductor layer and the second oxide semiconductor layer has a carrier density of 1×10 18 /cm 3 or more;
forming a conductive layer over the second oxide semiconductor layer;
etching a part of the second oxide semiconductor layer so as to expose a part of the first oxide semiconductor layer, wherein the part of the second oxide semiconductor layer does not overlap the conductive layer; and
forming an oxide insulating layer over and in contact with the part of the first oxide semiconductor layer, whereby the part of the first oxide semiconductor layer has a carrier density of less than 1×10 18 /cm 3 .
8. The method for manufacturing a semiconductor device according to claim 7 , wherein the first heat treatment is performed under an inert gas atmosphere.
9. The method for manufacturing a semiconductor device according to claim 8 , wherein the inert gas atmosphere comprises nitrogen.
10. The method for manufacturing a semiconductor device according to claim 7 , wherein the first heat treatment is performed at 400° C. or higher.
11. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the first oxide semiconductor layer comprises indium, gallium, and zinc, and
wherein the second oxide semiconductor layer comprises indium and zinc.
12. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the first oxide semiconductor layer comprises indium, tin, and zinc, and
wherein the second oxide semiconductor layer comprises indium and zinc.
13. The method for manufacturing a semiconductor device according to claim 7 , wherein the conductive layer comprises copper.
14. The method for manufacturing a semiconductor device according to claim 7 , further comprising a step of performing a second heat treatment on the oxide insulating layer.