CMP apparatus
Provided is a chemical mechanical polishing (CMP) apparatus that includes a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval, a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad, a rotator rotatably installed on the other end of the connector, a CMP pad conditioner coupled to the rotator and conditioning the CMP pad when rotated, and a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner, thereby predicting a wear rate of the CMP pad based on the vibration acceleration and a state in which the CMP pad conditioner is installed or being used.
1. A chemical mechanical polishing (CMP) apparatus that measures a vibration acceleration of a CMP pad conditioner conditioning a CMP pad comprising:
a vibration meter detecting vibrations to measure a vibration acceleration of the CMP pad conditioner; and
a controller that generates a check signal for the CMP apparatus or a replacement signal for the CMP pad conditioner when a vibration acceleration measured by the vibration meter is outside a previously stored range of the vibration acceleration, wherein when the check signal is generated, the controller adjusts process conditions affecting the vibration acceleration comprising the load of the CMP pad conditioner, the method of applying the load to the CMP pad conditioner, the tolerance of the rotator when the CMP pad conditioner is installed, and the position at which the vibration meter is installed, and checks so as to allow the measured vibration acceleration to be put within the previously stored range of the vibration acceleration, and
when the measured vibration acceleration after adjusting the process conditions deviates from the previously stored range of the vibration acceleration, the controller generates the replacement signal.
2. A CMP apparatus comprising:
a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval;
a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad;
a rotator rotatably installed on the other end of the connector;
a CMP pad conditioner coupled with the rotator and conditioning the CMP pad when rotated;
a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner; and
a controller that generates a check signal for the CMP apparatus or a replacement signal for the CMP pad conditioner when the vibration acceleration measured by the vibration meter is outside a previously stored range of the vibration acceleration,
wherein when the check signal is generated, the controller adjusts process conditions affecting the vibration acceleration comprising the load of the CMP pad conditioner, the method of applying the load to the CMP pad conditioner, the tolerance of the rotator when the CMP pad conditioner is installed, and the position at which the vibration meter is installed, and checks so as to allow the measured vibration acceleration to be put within the previously stored range of the vibration acceleration, and
when the measured vibration acceleration after adjusting the process condition may deviate from the previously stored range of the vibration acceleration, the controller generates the replacement signal.
3. The CMP apparatus according to claim 2 , wherein the vibration meter is installed on the connector at any position selected from a position corresponding to the swing unit, a position corresponding to the rotator, and a middle position of the connector.
4. The CMP apparatus according to claim 3 , wherein the vibration meter is installed on the connector at the position corresponding to the rotator.
5. The CMP apparatus according to claim 2 , wherein the vibration acceleration of the CMP pad conditioner is proportional to a wear rate of the CMP pad.
6. The CMP apparatus according to claim 5 , wherein the vibration acceleration of the CMP pad conditioner is adjusted so as to be in a range from 0.06 m/s 2 to 5.4 m/s 2 .
7. The CMP apparatus according to claim 6 , wherein, when the adjusted vibration acceleration of the CMP pad conditioner is outside the range of 0.06 m/s 2 to 5.4 m/s 2 , the CMP apparatus is checked or the CMP pad conditioner is replaced.
8. The CMP apparatus according to claim 2 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .
9. The CMP apparatus according to claim 3 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .
10. The CMP apparatus according to claim 4 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .
11. The CMP apparatus according to claim 5 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .
12. The CMP apparatus according to claim 6 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .
13. The CMP apparatus according to claim 7 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .
14. The CMP apparatus according to claim 1 , wherein the previously stored range of the vibration acceleration is from 0.06 m/s 2 to 5.4 m/s 2 .