IP Library › Granted Patent US 9,515,002
Granted Patent B2
US 9,515,002 · App. 14/617,375 · Granted Dec 6, 2016

Bonding pads with thermal pathways

Inventors: Jaspreet S Gandhi (Boise, ID); James M. Derderian (Boise, ID); Sameer S Vadhavkar (Boise, ID); Jian Li (Boise, ID)
Assignee: Micron Technology, Inc.
H01L23/34H01L23/481H01L24/06H01L2224/06519
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,515,002
App. No.
14/617,375
Granted
Dec 6, 2016
Kind
B2
Abstract

Apparatuses and methods for providing thermal pathways from a substrate to a thermal bonding pad. The thermal pathways may be metal extensions of the thermal bonding pad that are disposed in channels formed in a backside passivation layer underneath the thermal bonding pad, and may be in direct contact with an underlying substrate. The thermal pathways may provide improved thermal dissipation from the substrate.

Claims (24)

1. An apparatus, comprising:

a substrate; and

an electrically-inactive bonding pad including thermally conductive pathways in direct contact with a backside of the substrate, wherein the thermally conductive pathways are disposed in channels formed in a backside passivation layer on the backside of the substrate.

2. The apparatus of claim 1 , wherein the substrate further includes a through-via formed through the substrate from a front side to the backside.

3. The apparatus of claim 2 , further comprising an electrically-active through via bonding pad with a conductor disposed through the through-via and the electrically-active through-via bonding pad disposed on the backside passivation layer.

4. The apparatus of claim 3 , wherein the electrically-active through-via bonding pad further includes thermal conductive pathways in direct contact with the backside of the substrate, and wherein the thermally conductive pathways are disposed in channels form in the backside passivation layer.

5. The apparatus of claim 4 , wherein the thermally conductive pathways are formed under the electrically-active through-via bonding pad.

6. The apparatus of claim 1 , wherein the thermally conductive pathways are formed under the electrically-inactive bonding pad.

7. The apparatus of claim 1 , wherein the thermally conductive pathways comprise a plurality of parallel lines.

8. An apparatus, comprising:

an electrically-active through-via conductor disposed through a substrate, the electrically-active through via conductor including a bonding pad and thermal pathways under the bonding pad in direct contact with a backside of the substrate.

9. The apparatus of claim 8 , wherein the thermal pathways include thermally conductive material disposed in channels formed in a backside passivation layer.

10. The apparatus of claim 8 , further comprising a thermal bonding pad formed on the backside of the substrate.

11. The apparatus of claim 10 , wherein the thermal bonding pad is formed on a backside passivation layer.

12. The apparatus of claim 11 , wherein the thermal bonding pad includes thermal pathways disposed in channels formed in the backside passivation layer and between the thermal bonding pad and the substrate.

13. The apparatus of claim 8 , wherein the thermal pathways comprise concentric circles under the bond pad of the electrically-active through-via conductor.

14. An apparatus, comprising:

a through-via conductor bonding pad and an electrically-inactive bonding pad, both formed on a substrate, wherein the through-via conductor bonding pad and the electrically-inactive bonding pad include thermal conductive extensions in direct contact with a surface of the substrate.

15. The apparatus of claim 14 , wherein the thermal conductive extensions in direct contact with the surface of the substrate are disposed within channels formed in a passivation layer on the substrate.

16. The apparatus of claim 14 , wherein the electrically-inactive bonding pad provides a thermal dissipation pathway for heat generated within the substrate.

17. The apparatus of claim 14 , wherein the thermal conductive extensions included with the electrically-inactive bonding pad are disposed between the electrically-inactive bonding pad and the substrate.

18. The apparatus of claim 14 , wherein the through-via conductor bonding pad and the electrically-inactive bonding pad are formed of the same material.

19. The apparatus of claim 14 , wherein the through-via conductor bonding pad and the electrically-inactive bonding pad are simultaneously fabricated.

20. The apparatus of claim 14 , wherein the through-via conductor bonding pad provides an electrically conductive pathway from a front of the substrate to a back of the substrate.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 9, 2015
From: GANDHI, JASPREET S; DERDERIAN, JAMES M; VADHAVKAR, SAMEER S; LI, JIAN
To: MICRON TECHNOLOGY, INC.
Reel/Frame 034922/0510 →
Continuity (1)
Related Publication 20160233139A1 · Aug 11, 2016