IP Library Granted Patent US 9,657,757
Granted Patent B2
US 9,657,757 · App. 14/658,576 · Granted May 23, 2017

System of exhuast and operation method thereof

Inventors: Tung-Lin Yang (Hsinchu, TW); Chun-Hung Chang (Hsinchu County, TW); Rouh Jier Wang (Hsinchu, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
F15D1/00F04D25/00F04D29/00
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,657,757
App. No.
14/658,576
Granted
May 23, 2017
Kind
B2
Abstract

Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.

Claims (31)

1. A method of dissipating process exhaust from a chamber, the method comprising:

conveying the process exhaust from the chamber through an inner tube of a pipeline to an abatement, wherein the process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline; and

maintaining an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline,

wherein the second temperature is negative offset from the first temperature within a predetermined value.

2. The method of claim 1 , further comprising sensing the first temperature or the second temperature.

3. The method of claim 1 , further comprising keeping pressure inside the outer tube below a predetermined pressure range.

4. The method of claim 1 , further comprising sensing a pressure inside the outer tube.

5. The method of claim 1 , further comprising sensing a temperature in the outer tube.

6. The method of claim 1 , further comprising preventing a direction of flow from entering into the outer tube.

7. A method of dissipating process exhaust from a chamber, the method comprising:

extracting the process exhaust from the chamber through a vacuum pump, wherein a pipeline is disposed between the chamber and the vacuum pump;

configuring the pipeline into at least two different portions comprising an inner portion provided as a path of the process exhaust and an outer portion maintained at a vacuum state, wherein the outer portion thermally isolates the inner portion from the atmosphere around the pipeline; and

keeping temperature inside the inner portion above a predetermined value such that the process exhaust stays in gas phase throughout the path.

8. The method of claim 7 , further comprising sensing temperature inside the inner portion.

9. The method of claim 7 , further comprising sensing temperature inside the outer portion.

10. The method of claim 7 , further comprising sensing pressure inside the outer portion.

11. The method of claim 7 , further comprising maintaining pressure inside the outer portion within a predetermined pressure range.

12. The method of claim 7 , further comprising monitoring pressure and temperature in the pipeline.

13. The method of claim 7 , further comprising monitoring a temperature variation in the inner portion.

14. The method of claim 7 , further comprising preventing a direction of flow from entering into the outer portion of the pipeline.

15. A system for exhaust dissipation, comprising:

a pipeline configured to connect to an exhaust outlet of a chamber at one end, comprising:

a multi-layer structure comprising:

an inner portion configured for the exhaust to pass through; and

an outer portion surrounded the inner portion and configured to provide a thermal insulation for the inner portion;

a pump coupled to the outer portion and configured to maintain a vacuum state inside the outer portion.

16. The system of claim 15 , wherein the pump is coupled to the other end of the pipeline and configured to extract exhaust from the chamber.

17. The system of claim 15 , further comprising an invert valve coupled to the outer portion.

18. The system of claim 15 , further comprising a vacuum gauge coupled to the outer portion.

19. The system of claim 15 , further comprising a thermometer coupled to the inner portion.

20. The system of claim 15 , wherein an inner wall of the outer portion is configured to be a radiation reflective surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 23, 2015
From: YANG, TUNG-LIN; CHANG, CHUN-HUNG; WANG, ROUH JIER
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
Reel/Frame 035483/0963 →
Continuity (1)
Related Publication 20160273541A1 · Sep 22, 2016