Substrate processing apparatus
An apparatus includes a process chamber, a substrate holder arranged in the process chamber, a first shield provided on the peripheral portion of the substrate holder, and a second shield provided inside the process chamber. The internal space of the process chamber is partitioned into an outer space and a process space to process the substrate, by at least the first shield, the second shield, and the substrate holder. The substrate holder can be driven along a driving direction perpendicular to a substrate holding surface. The length, in a direction parallel to the driving direction, of a minimum gap portion having a minimum size in a direction perpendicular to the driving direction between the first and second shields does not change even if the substrate holder is driven in the driving direction.
1. A substrate processing apparatus comprising:
a process chamber;
an exhaust unit configured to exhaust gas from the process chamber;
a gas introduction unit configured to introduce a gas into the process chamber;
a substrate holder having a substrate holding surface configured to hold a substrate in the process chamber, the substrate holder being capable of being driven along a driving direction perpendicular to the substrate holding surface;
a first shield provided on a peripheral portion of the substrate holder; and
a second shield provided inside the process chamber,
wherein the first shield includes, at a peripheral portion thereof, a cylindrical portion extending in a direction parallel to the driving direction, and the second shield includes a concave portion,
an internal space of the process chamber is partitioned into an outer space and a process space to process the substrate by at least the first shield, the second shield, and the substrate holder,
a relative position of the first shield and the second shield changes when the substrate holder is driven in the driving direction,
the first shield and the second shield are provided so as not to make a linear path from a center of the process space to the outer space exist,
the first shield and the second shield form a gap therebetween, the gap including a minimum gap portion having a minimum size in a direction perpendicular to the driving direction, the minimum gap portion being formed by an outer side surface of the cylindrical portion of the first shield and an inner side surface of the second shield,
a length of the minimum gap portion in the direction parallel to the driving direction does not change when the substrate holder is driven in the driving direction and the relative position of the first shield and the second shield changes, and
the substrate holder is driven in the driving direction within a range in which an inner side surface of the cylindrical portion of the first shield does not face an inner side surface of the concave portion of the second shield.
2. The substrate processing apparatus according to claim 1 , wherein the first shield includes a ring-shaped portion.
3. The substrate processing apparatus according to claim 1 , wherein the substrate processing apparatus comprises a sputtering processing apparatus for performing a sputtering process for the substrate.
4. The substrate processing apparatus according to claim 3 , wherein the gas introduction unit comprises a reactive gas introduction unit configured to introduce a reactive gas to the outer space, and the reactive gas is introduced into the process space via the gap between the first shield and the second shield.
5. A substrate processing apparatus wherein comprising:
a process chamber;
a substrate holder having a substrate holding surface configured to hold a substrate in the process chamber, the substrate holder being capable of being driven along a driving direction perpendicular to the substrate holding surface;
a first shield provided on a peripheral portion of the substrate holder; and
a second shield provided inside the process chamber,
wherein the first shield includes, at a peripheral portion thereof, a cylindrical portion extending in a direction parallel to the driving direction, and the second shield includes a concave portion,
an internal space of the process chamber is partitioned into an outer space and a process space to process the substrate by at least the first shield, the second shield, and the substrate holder,
a relative position of the first shield and the second shield changes when the substrate holder is driven in the driving direction, and
the first shield and the second shield form a gap therebetween, the gap including a minimum gap portion having a minimum size in a direction perpendicular to the driving direction, the minimum gap portion being formed by an outer side surface of the cylindrical portion of the first shield and an inner side surface of the second shield,
a length of the minimum gap portion in the direction parallel to the driving direction does not change when the substrate holder is driven in the driving direction and the relative position of the first shield and the second shield changes, and
the substrate holder is driven in the driving direction within a range in which an inner side surface of the cylindrical portion of the first shield does not face an inner side surface of the concave portion of the second shield.
6. A substrate processing apparatus comprising:
a process chamber;
an exhaust unit configured to exhaust gas from the process chamber;
a gas introduction unit configured to introduce a gas into the process chamber;
a substrate holder having a substrate holding surface configured to hold a substrate in the process chamber, the substrate holder being capable of being driven along a driving direction perpendicular to the substrate holding surface;
a first shield provided on a peripheral portion of the substrate holder; and
a second shield provided inside the process chamber,
wherein the first shield includes, at a peripheral portion thereof, a cylindrical portion extending in a direction parallel to the driving direction, and a projecting portion that extends in a direction parallel to the substrate holding surface to project toward the second shield,
an internal space of the process chamber is partitioned into an outer space and a process space to process the substrate by at least the first shield, the second shield, and the substrate holder,
a relative position of the first shield and the second shield changes when the substrate holder is driven in the driving direction,
the first shield and the second shield are provided so as not to make a linear path from a center of the process space to the outer space exist,
the first shield and the second shield form a gap therebetween, the gap including a minimum gap portion having a minimum size in a direction perpendicular to the driving direction, the minimum gap portion being formed by an outer side surface of the projecting portion and an inner side surface of the second shield,
a length of the minimum gap portion in the direction parallel to the driving direction does not change when the substrate holder is driven in the driving direction and the relative position of the first shield and the second shield changes.
7. A substrate processing apparatus comprising:
a process chamber;
an exhaust unit configured to exhaust gas from the process chamber;
a gas introduction unit configured to introduce a gas into the process chamber;
a substrate holder having a substrate holding surface configured to hold a substrate in the process chamber, the substrate holder being capable of being driven along a driving direction perpendicular to the substrate holding surface;
a first shield provided on a peripheral portion of the substrate holder; and
a second shield provided inside the process chamber,
wherein the second shield includes a cylindrical portion, and the first shield includes a concave portion having a concave shape in a cross-section of a plane including a central axis of the substrate holder,
a lower end of the cylindrical portion of the second shield faces a bottom surface of the concave portion of the first shield,
the first shield further includes a projecting portion that extends in a direction parallel to the substrate holding surface to project toward an outer side surface of the second shield,
an internal space of the process chamber is partitioned into an outer space and a process space to process the substrate by at least the first shield, the second shield, and the substrate holder,
a relative position of the first shield and the second shield changes when the substrate holder is driven in the driving direction,
the first shield and the second shield are provided so as not to make a linear path from a center of the process space to the outer space exist,
the first shield and the second shield form a gap therebetween, the gap including a minimum gap portion having a minimum size in a direction perpendicular to the driving direction, the minimum gap portion being formed by an inner side surface of the projecting portion of the first shield and the outer side surface of the cylindrical portion of the second shield, and
a length of the minimum gap portion in the direction parallel to the driving direction does not change when the substrate holder is driven in the driving direction and the relative position of the first shield and the second shield changes.
8. A substrate processing apparatus comprising:
a process chamber;
an exhaust unit configured to exhaust gas from the process chamber;
a gas introduction unit configured to introduce a gas into the process chamber;
a substrate holder having a substrate holding surface configured to hold a substrate in the process chamber, the substrate holder being capable of being driven along a driving direction perpendicular to the substrate holding surface;
a first shield provided on a peripheral portion of the substrate holder;
a second shield provided inside the process chamber; and
a third shield connected to an end portion of the substrate holder and extending in a direction parallel to the driving direction,
an internal space of the process chamber is partitioned into an outer space and a process space to process the substrate by at least the first shield, the second shield, and the substrate holder,
a relative position of the first shield and the second shield changes when the substrate holder is driven in the driving direction,
the first shield and the second shield are provided so as not to make a linear path from a center of the process space to the outer space exist,
the second shield and the third shield form a gap therebetween, the gap including a minimum gap portion having a minimum size in a direction perpendicular to the driving direction, the minimum gap portion being formed by the third shield and the inner side surface of the second shield, and
a length of the minimum gap portion in the direction parallel to the driving direction does not change when the substrate holder is driven in the driving direction and the relative position of the first shield and the second shield changes.