Semiconductor device

1. A semiconductor device comprising:

a transistor, wherein the transistor comprises:

an oxide film;

an oxide semiconductor film over the oxide film, the oxide semiconductor film comprising a channel formation region;

a gate electrode; and

a gate insulating film between the oxide semiconductor film and the gate electrode,

wherein the oxide semiconductor film has an angle formed between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film, the angle being greater than or equal to 10° and less than 90°,

wherein each of the oxide film and the oxide semiconductor film comprises In and M (M is one selected from the group consisting of Al, Ga, Ge, Y, Zr, Sn, La, Ce, and Nd), and the oxide film has a lower atomic ratio of In to M than the oxide semiconductor film, and

wherein the oxide semiconductor film comprises a crystal part.

2. The semiconductor device according to claim 1 ,

wherein the oxide film has an angle formed between a bottom surface of the oxide film and a side surface of the oxide film, and

wherein the angle of the oxide semiconductor film is an acute angle and smaller than the angle of the oxide film.

3. The semiconductor device according to claim 1 ,

wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the oxide semiconductor film.

4. The semiconductor device according to claim 1 , wherein the oxide semiconductor film comprises an In—Ga—Zn oxide.

5. The semiconductor device according to claim 1 , wherein the oxide film comprises an In—Ga—Zn oxide.

6. The semiconductor device according to claim 1 , wherein the gate electrode is located over the oxide semiconductor film.

7. The semiconductor device according to claim 1 , further comprising:

a source electrode over the oxide semiconductor film;

a drain electrode over the oxide semiconductor film; and

a second oxide film over the oxide semiconductor film, the source electrode and the drain electrode,

wherein the second oxide film is in contact with the oxide semiconductor film.

8. A display device comprising:

a transistor; and

an electroluminescent element electrically connected to the transistor,

wherein the transistor comprises:

an oxide film;

an oxide semiconductor film over the oxide film, the oxide semiconductor film comprising a channel formation region;

a gate electrode; and

a gate insulating film between the oxide semiconductor film and the gate electrode,

wherein the oxide semiconductor film has an angle formed between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film, the angle being greater than or equal to 10° and less than 90°,

wherein each of the oxide film and the oxide semiconductor film comprises In and M (M is one selected from the group consisting of Al, Ga, Ge, Y, Zr, Sn, La, Ce, and Nd), and the oxide film has a lower atomic ratio of In to M than the oxide semiconductor film, and

wherein the oxide semiconductor film comprises a crystal part.

9. The display device according to claim 8 ,

wherein the oxide film has an angle formed between a bottom surface of the oxide film and a side surface of the oxide film, and

wherein the angle of the oxide semiconductor film is an acute angle and smaller than the angle of the oxide film.

10. The display device according to claim 8 ,

wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the oxide semiconductor film.

11. The display device according to claim 8 , wherein the oxide semiconductor film comprises an In—Ga—Zn oxide.

12. The display device according to claim 8 , wherein the oxide film comprises an In—Ga—Zn oxide.

13. The display device according to claim 8 , wherein the gate electrode is located over the oxide semiconductor film.

14. The display device according to claim 8 , further comprising:

a source electrode over the oxide semiconductor film;

a drain electrode over the oxide semiconductor film; and

a second oxide film over the oxide semiconductor film, the source electrode and the drain electrode,

wherein the second oxide film is in contact with the oxide semiconductor film.

15. A display device comprising:

a transistor; and

a liquid crystal element electrically connected to the transistor,

wherein the transistor comprises:

an oxide film;

an oxide semiconductor film over the oxide film, the oxide semiconductor film comprising a channel formation region;

a gate electrode; and

a gate insulating film between the oxide semiconductor film and the gate electrode,

wherein the oxide semiconductor film has an angle formed between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film, the angle being greater than or equal to 10° and less than 90°,

wherein each of the oxide film and the oxide semiconductor film comprises In and M (M is one selected from the group consisting of Al, Ga, Ge, Y, Zr, Sn, La, Ce, and Nd), and the oxide film has a lower atomic ratio of In to M than the oxide semiconductor film, and

wherein the oxide semiconductor film comprises a crystal part.

16. The display device according to claim 15 ,

wherein the oxide film has an angle formed between a bottom surface of the oxide film and a side surface of the oxide film, and

wherein the angle of the oxide semiconductor film is an acute angle and smaller than the angle of the oxide film.

17. The display device according to claim 15 ,

wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the oxide semiconductor film.

18. The display device according to claim 15 , wherein the oxide semiconductor film comprises an In—Ga—Zn oxide.

19. The display device according to claim 15 , wherein the oxide film comprises an In—Ga—Zn oxide.

20. The display device according to claim 15 , wherein the gate electrode is located over the oxide semiconductor film.

21. The display device according to claim 15 , further comprising:

a source electrode over the oxide semiconductor film;

a drain electrode over the oxide semiconductor film; and

a second oxide film over the oxide semiconductor film, the source electrode and the drain electrode,

wherein the second oxide film is in contact with the oxide semiconductor film.

22. A semiconductor device comprising:

a multilayer film in which an oxide semiconductor film and an oxide film are stacked;

a gate electrode;

a gate insulating film;

a source electrode; and

a drain electrode,

wherein each of the oxide semiconductor film and the oxide film comprises In-M-Zn oxide (M is one selected from the group consisting of Al, Ga, Ge, Y, Zr, Sn, La, Ce, and Nd), and the oxide film has a lower atomic ratio of In to M than the oxide semiconductor film,

wherein the oxide film has an atomic ratio of In to M of x:y, and y is greater than or equal to x,

wherein the oxide film is in contact with a top surface of the oxide semiconductor film,

wherein an upper edge of the oxide semiconductor film substantially coincides with a lower edge of the oxide film,

wherein the multilayer film comprises a first region overlapping with the gate electrode through the gate insulating film and a second region not overlapping with the gate electrode,

wherein the oxide semiconductor film has a first angle formed between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film,

wherein the oxide film has a second angle formed between a bottom surface of the oxide film and a side surface of the oxide film,

wherein the first angle is smaller than the second angle and is an acute angle,

wherein the source electrode comprises a region in contact with a top surface of the oxide film, a region in contact with a side surface of the oxide film, and a region in contact with a side surface of the oxide semiconductor film, and

wherein the drain electrode comprises a region in contact with a top surface of the oxide film, a region in contact with a side surface of the oxide film, and a region in contact with a side surface of the oxide semiconductor film.

23. The semiconductor device according to claim 22 ,

wherein M is Ga,

wherein the oxide semiconductor film comprises a crystal part, and

wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the oxide semiconductor film.

24. A semiconductor device comprising:

a gate electrode;

a gate insulating film over the gate electrode;

a first In-M-Zn oxide film (M is one selected from the group consisting of Al, Ga, Ge, Y, Zr, Sn, La, Ce, and Nd) over and in contact with the gate insulating film; and

a second In-M-Zn oxide film over the first In-M-Zn oxide film,

wherein the first In-M-Zn oxide film has a first angle formed between a bottom surface of the first In-M-Zn oxide film and a side surface of the first ln-M-Zn oxide film, the first angle being greater than or equal to 10° and less than 90°,

wherein the second In-M-Zn oxide film has a lower atomic ratio of In to M than the first In-M-Zn oxide film,

wherein the second In-M-Zn oxide film has an atomic ratio of In to M of x:y, and y is greater than or equal to x, and

wherein the first In-M-Zn oxide film comprises a crystal part.

25. The semiconductor device according to claim 24 , wherein M is Ga.

26. The semiconductor device according to claim 24 , wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the first In-M-Zn oxide film.

27. The semiconductor device according to claim 25 , wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the first In-M-Zn oxide film.

28. The semiconductor device according to claim 24 , wherein the second In-M-Zn oxide film has a second angle formed between a bottom surface of the second In-M-Zn oxide film and a side surface of the second In-M-Zn oxide film, the first angle being smaller than the second angle.

29. A semiconductor device comprising:

a gate electrode;

a gate insulating film over the gate electrode;

a first In—Ga—Zn oxide film over and in contact with the gate insulating film;

a second In—Ga—Zn oxide film over the first In—Ga—Zn oxide film;

an electrode over the second In—Ga—Zn oxide film, the electrode comprising copper; and

an insulating film over the electrode, wherein the insulating film is in contact with a top surface of the second In—Ga—Zn oxide film,

wherein the first In—Ga—Zn oxide film has a first angle formed between a bottom surface of the first In—Ga—Zn oxide film and a side surface of the first In—Ga—Zn oxide film, the first angle being greater than or equal to 30° and less than 70°,

wherein the second In—Ga—Zn oxide film has a lower atomic ratio of In to Ga than the first In—Ga—Zn oxide film,

wherein the second In—Ga—Zn oxide film has an atomic ratio of In to Ga of x:y, and y is greater than x,

wherein the electrode is in contact with a top surface of the second In—Ga—Zn oxide film, a side surface of the second In—Ga—Zn oxide film, and a side surface of the first In—Ga—Zn oxide film, and

wherein the first In-Ga-Zn oxide film comprises a crystal part.

30. The semiconductor device according to claim 29 , wherein y is less than 3 times x.

31. The semiconductor device according to claim 29 ,

wherein a c-axis of the crystal part is parallel to a normal vector of a surface of the first In—Ga—Zn oxide film.

32. The semiconductor device according to claim 29 , wherein the second In—Ga—Zn oxide film has a second angle formed between a bottom surface of the second In—Ga—Zn oxide film and a side surface of the second In—Ga—Zn oxide film, the first angle being smaller than the second angle.

33. A semiconductor device comprising:

an oxide semiconductor film;

an oxide film;

a gate electrode;

a gate insulating film;

a source electrode; and

a drain electrode,

wherein each of the oxide semiconductor film and the oxide film comprises In-M-Zn oxide (M is one selected from the group consisting of AI, Ga, Ge, Y, Zr, Sn, La, Ce, and Nd), and the oxide film has a lower atomic ratio of In to M than the oxide semiconductor film,

wherein the oxide film has an atomic ratio of In to M of x:y, and y is greater than or equal to x,

wherein the oxide film is in contact with a top surface of the oxide semiconductor film,

wherein an upper edge of the oxide semiconductor film substantially coincides with a lower edge of the oxide film,

wherein the oxide semiconductor film and the oxide film comprise a region overlapping with the gate electrode through the gate insulating film,

wherein the oxide semiconductor film has a first angle formed between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film,

wherein the oxide film has a second angle formed between a bottom surface of the oxide film and a side surface of the oxide film,

wherein the first angle is smaller than the second angle and is an acute angle,

wherein the source electrode comprises a region in contact with a top surface of the oxide film, a region in contact with a side surface of the oxide film, and a region in contact with a side surface of the oxide semiconductor film, and

wherein the drain electrode comprises a region in contact with a top surface of the oxide film, a region in contact with a side surface of the oxide film, and a region in contact with a side surface of the oxide semiconductor film.