Substrate cleaning apparatus
A substrate cleaning apparatus including a self-cleaning device is disclosed. The substrate cleaning apparatus includes a self-cleaning device configured to clean a cylindrical scrub-cleaning tool that is rubbed against a substrate surface. The self-cleaning device includes a cleaning body having an inner circumferential surface that is shaped along an circumferential surface of the scrub-cleaning tool, and at least one cleaning nozzle configured to eject a cleaning fluid toward the circumferential surface of the scrub-cleaning tool through a gap between the circumferential surface of the scrub-cleaning tool and the inner circumferential surface of the cleaning body.
1. A substrate cleaning apparatus, comprising:
a substrate holder configured to hold and rotate a substrate;
a cylindrical scrub-cleaning tool configured to come into sliding contact with a surface of the substrate;
a rotating device configured to rotate the scrub-cleaning tool about its own axis; and
a self-cleaning device configured to clean the scrub-cleaning tool,
the self-cleaning device including
a cleaning body having an inner circumferential surface that is shaped along a circumferential surface of the scrub-cleaning tool,
at least one cleaning nozzle configured to eject a cleaning fluid toward the circumferential surface of the scrub-cleaning tool through a gap between the circumferential surface of the scrub-cleaning tool and the inner circumferential surface of the cleaning body, and
a blow nozzle configured to eject a gas toward the circumferential surface of the scrub-cleaning tool through the gap, the blow nozzle being disposed downstream of the cleaning nozzle with respect to a rotational direction of the scrub-cleaning tool.
2. The substrate cleaning apparatus according to claim 1 , wherein the at least one cleaning nozzle comprises a first cleaning nozzle and a second cleaning nozzle disposed at both sides of the scrub-cleaning tool.
3. The substrate cleaning apparatus according to claim 1 , wherein the cleaning nozzle comprises a plurality of slit nozzles arranged along a central axis of the scrub-cleaning tool.
4. The substrate cleaning apparatus according to claim 1 , wherein the cleaning nozzle is inclined downwardly.
5. The substrate cleaning apparatus according to claim 1 , wherein the cleaning fluid comprises a mixture of a cleaning liquid and a high-pressure gas.
6. The substrate cleaning apparatus according to claim 1 , wherein the cleaning fluid comprises a high-pressure cleaning liquid.
7. The substrate cleaning apparatus according to claim 1 , wherein the self-cleaning device further includes a drain having a fluid inlet lying in the inner circumferential surface of the cleaning body.
8. The substrate cleaning apparatus according to claim 1 , wherein the scrub-cleaning tool is disposed so as to come into sliding contact with a lower surface of the substrate, and the self-cleaning device is disposed below the scrub-cleaning tool.
9. The substrate cleaning apparatus according to claim 1 , further comprising:
a transporting mechanism configured to transport the scrub-cleaning tool to the self-cleaning device,
the scrub-cleaning tool being disposed so as to come into sliding contact with an upper surface of the substrate, and
the self-cleaning device being disposed adjacent to the substrate holder.
10. A substrate cleaning apparatus, comprising:
a substrate holder configured to hold and rotate a substrate;
a cylindrical scrub-cleaning tool configured to come into sliding contact with a surface of the substrate;
a rotating device configured to rotate the scrub-cleaning tool about its own axis; and
a self-cleaning device configured to clean the scrub-cleaning tool,
the self-cleaning device including
a cleaning body having an inner circumferential surface that is shaped along a circumferential surface of the scrub-cleaning tool,
a first cleaning nozzle and a second cleaning nozzle each configured to eject a cleaning fluid toward the circumferential surface of the scrub-cleaning tool through a gap between the circumferential surface of the scrub-cleaning tool and the inner circumferential surface of the cleaning body, and
a suction passage for sucking a gas from the gap, the suction passage being located between the first cleaning nozzle and the second cleaning nozzle.
11. A substrate cleaning apparatus, comprising:
a substrate holder configured to hold and rotate a substrate;
a cylindrical scrub-cleaning tool configured to come into sliding contact with a surface of the substrate;
a rotating device configured to rotate the scrub-cleaning tool about its own axis; and
a self-cleaning device configured to clean the scrub-cleaning tool,
the self-cleaning device including
a cleaning body having an inner circumferential surface that is shaped along a circumferential surface of the scrub-cleaning tool, and
at least one cleaning nozzle configured to eject a cleaning fluid toward the circumferential surface of the scrub-cleaning tool through a gap between the circumferential surface of the scrub-cleaning tool and the inner circumferential surface of the cleaning body,
wherein the at least one cleaning nozzle comprises a first cleaning nozzle and a second cleaning nozzle disposed at both sides of the scrub-cleaning tool, a third cleaning nozzle disposed below the first cleaning nozzle, and a fourth cleaning nozzle disposed below the second cleaning nozzle.