In-situ spatially resolved plasma monitoring by using optical emission spectroscopy
Implementations of the present disclosure relate to a plasma chamber having an optical device for measuring emission intensity of plasma species. In one implementation, the plasma chamber includes a chamber body defining a substrate processing region therein, the chamber body having a sidewall, a viewing window disposed in the sidewall, and a plasma monitoring device coupled to the viewing window. The plasma monitoring device includes an objective lens and an aperture member having a pinhole, wherein the aperture member is movable relative to the objective lens by an actuator to adjust the focal point in the plasma using principles of optics, allowing only the light rays from the focal point in the plasma to reach the pinhole. The plasma monitoring device therefore enables an existing OES (coupled to the plasma monitoring device through an optical fiber) to monitor emission intensity of the species at any specific locations of the plasma.
1. A plasma chamber, comprising:
a chamber body defining a substrate processing region therein, the chamber body having a sidewall;
a viewing window disposed in the sidewall;
a plasma monitoring device coupled to the viewing window, the plasma monitoring device comprising:
an objective lens; and
an aperture member, wherein the aperture member is movable relative to the objective lens by a first actuator; and
a pivoting actuator for pivotally moving the plasma monitoring device about a central axis direction vertically passing through the chamber body.
2. The plasma chamber of claim 1 , wherein the objective lens is a converging lens.
3. The plasma chamber of claim 1 , wherein the aperture member has a pinhole, and the aperture member is coupled to an optical fiber at the pinhole.
4. The plasma chamber of claim 1 , wherein the aperture member is coupled to an optical fiber, and the optical fiber has a pinhole integrated therein at one end.
5. The plasma chamber of claim 3 , further comprising:
an optical emission spectrometer coupled to the plasma monitoring device through the optical fiber.
6. The plasma chamber of claim 1 , wherein the objective lens is movable horizontally by a second actuator.
7. The plasma chamber of claim 1 , wherein the aperture member is movable horizontally and vertically with respect to the objective lens.
8. The plasma chamber of claim 1 , wherein a longitudinal axis of the plasma monitoring device forms an angle in the range of about ±60 degrees with respect to an imaginary diameter line of the chamber body passing through the viewing window.
9. A plasma chamber, comprising:
a chamber body defining a substrate processing region therein, the chamber body having a sidewall;
a viewing window disposed in the sidewall;
a plasma monitoring device coupled to the viewing window, the plasma monitoring device comprising:
an objective lens;
an aperture member having a pinhole, wherein the aperture member is movable relative to the objective lens by a first actuator; and
a first diaphragm disposed in a light path between the chamber body and the objective lens, the first diaphragm having a first adjustable aperture; and
a pivoting actuator pivotally moving the plasma monitoring device about a central axis direction vertically passing through the chamber body.
10. The plasma chamber of claim 9 , wherein the first diaphragm is movable with respect to the objective lens.
11. The plasma chamber of claim 9 , further comprising:
a second diaphragm disposed in the light path between the objective lens and the aperture member, wherein the second diaphragm has a second adjustable aperture.
12. The plasma chamber of claim 11 , wherein the second diaphragm is movable with respect to the objective lens.
13. The plasma chamber of claim 9 , wherein the objective lens is movable with respect to the aperture member by a second actuator, and the aperture member is movable horizontally and vertically with respect to the objective lens.
14. A method for monitoring a plasma in a process chamber, comprising:
coupling a plasma monitoring device to a viewing window disposed in a sidewall of the process chamber, wherein the plasma monitoring device comprising:
an objective lens; and
an aperture member having a pinhole;
moving pivotally the plasma monitoring device about a central axis direction vertically passing through the process chamber and moving the aperture member with respect to the objective lens to change a focal point in the plasma and allow light emitted from the focal point to travel through the objective lens and impinge onto the pinhole; and
analyzing characteristics of the light passing through the pinhole by an optical emission spectrometer.
15. The method of claim 14 , further comprising:
moving the aperture member horizontally and vertically with respect to the objective lens to change a focal point to different heights in the plasma.
16. The method of claim 14 , further comprising:
moving a first diaphragm disposed in a light path between the process chamber and the objective lens, the first diaphragm having a first aperture sized to block a portion of the light from outside a focal plane of the objective lens.
17. The method of claim 16 , further comprising:
moving a second diaphragm disposed in a light path between the objective lens and the aperture member, the second diaphragm having a second aperture sized to block a portion of the light from inside the focal plane of the objective lens.
18. The method of claim 14 , further comprising:
determining a processing end-point based on the analyzed characteristics of the light from the optical emission spectrometer.
19. The plasma chamber of claim 4 , further comprising:
an optical emission spectrometer coupled to the plasma monitoring device through the optical fiber.