IP Library Granted Patent US 9,887,303
Granted Patent B2
US 9,887,303 · App. 14/971,019 · Granted Feb 6, 2018

Semiconductor device including two-dimensional material, and method of manufacturing the semiconductor device

Inventors: Jinseong Heo (Seoul, KR); Kiyoung Lee (Seoul, KR); Sangyeob Lee (Hwaseong-si, KR); Eunkyu Lee (Yongin-si, KR); Jaeho Lee (Seoul, KR); Seongjun Park (Seoul, KR)
Assignee: Samsung Electronics Co., Ltd.
H01L31/032H01L27/1446H01L29/127H01L29/1606H01L29/24H01L29/45H01L29/66977H01L29/786H01L31/022408H01L31/022425H01L31/022466H01L31/035209H01L31/035218H01L31/035227H01L31/035281H01L31/1884Y02E10/50
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Quick Facts
Patent No.
US 9,887,303
App. No.
14/971,019
Granted
Feb 6, 2018
Kind
B2
Abstract

Example embodiments relate to semiconductor devices including two-dimensional (2D) materials, and methods of manufacturing the semiconductor devices. A semiconductor device may be an optoelectronic device including at least one doped 2D material. The optoelectronic device may include a first electrode, a second electrode, and a semiconductor layer between the first and second electrodes. At least one of the first electrode and the second electrode may include doped graphene. The semiconductor layer may have a built-in potential greater than or equal to about 0.1 eV, or greater than or equal to about 0.3 eV. One of the first electrode and the second electrode may include p-doped graphene, and the other may include n-doped graphene. Alternatively, one of the first electrode and the second electrode may include p-doped or n-doped graphene, and the other may include a metallic material.

Claims (74)

1. An optoelectronic device comprising:

a first electrode;

a second electrode; and

a semiconductor active layer between the first and second electrodes, the semiconductor active layer being a photodetecting layer,

wherein the semiconductor active layer has a built-in potential of substantially 0.1 eV or greater,

wherein one of the first electrode and the second electrode includes graphene doped with a p-type dopant, and

wherein another of the first electrode and the second electrode includes graphene doped with an n-type dopant.

2. The optoelectronic device of claim 1 , wherein a built-in electric field of the semiconductor active layer is substantially 0.3 MV/cm to 100 MV/cm.

3. The optoelectronic device of claim 1 , wherein

the semiconductor active layer comprises a first region that is adjacent to the first electrode, and a second region that is adjacent to the second electrode, and

at least one of the first region and the second region is a doped region.

4. The optoelectronic device of claim 3 , wherein

when the first electrode is doped with a dopant of a first type, the first region of the semiconductor active layer is doped with a dopant of the first type, and/or

when the second electrode is doped with a dopant of a second type, the second region of the semiconductor active layer is doped with a dopant of the second type.

5. The optoelectronic device of claim 3 , wherein the first and second regions of the semiconductor active layer are apart from each other or in contact with each other.

6. The optoelectronic device of claim 1 , wherein the semiconductor active layer comprises a two-dimensional (2D) semiconductor having a 2D crystal structure.

7. The optoelectronic device of claim 6 , wherein

the 2D semiconductor includes a metal chalcogenide-based material, and

the metal chalcogenide-based material includes a metal element including Mo, W, Nb, V, Ta, Ti, Zr, Hf, Tc, Re, Cu, Ga, In, Sn, Ge, and Pb, and a chalcogen element including S, Se, and Te.

8. The optoelectronic device of claim 1 , wherein the semiconductor active layer comprises a quantum dot.

9. The optoelectronic device of claim 1 , wherein at least one of the first electrode, the second electrode; and the semiconductor active layer comprises a 2D material.

10. The optoelectronic device of claim 1 , wherein the built-in potential of the semiconductor active layer is less than or equal to substantially 5 eV.

11. The optoelectronic device of claim 1 , wherein the optoelectronic device comprises a photodetector or a photovoltaic device.

12. An optoelectronic device comprising:

a first electrode;

a second electrode; and

a semiconductor active layer between the first and second electrodes, the semiconductor active layer being a photodetecting layer,

wherein the semiconductor active layer has a built-in potential of substantially 0.1 eV or greater,

wherein one of the first electrode and the second electrode includes graphene doped with a p-type dopant,

wherein another of the first electrode and the second electrode includes graphene doped with an n-type dopant, and

wherein the optoelectronic device comprises a photodetector, and the photodetector is a self-powered photodetector.

13. The optoelectronic device of claim 1 , further comprising:

a first contact electrode in contact with the first electrode; and

a second contact electrode in contact with the second electrode.

14. The optoelectronic device of claim 13 , wherein the first contact electrode and the second contact electrode are apart from each other in a horizontal direction.

15. The optoelectronic device of claim 13 , wherein the first contact electrode and the second contact electrode are apart from each other in a vertical direction.

16. The optoelectronic device of claim 1 , wherein

the first electrode extends from the semiconductor active layer in a first direction, and

the second electrode extends from the semiconductor active layer in a second direction opposite the first direction.

17. The optoelectronic device of claim 1 , wherein

the first electrode extends from the semiconductor active layer in a first direction, and

the second electrode extends from the semiconductor active layer in a second direction perpendicular to the first direction.

18. The optoelectronic device of claim 1 , wherein

the first electrode, the second electrode, and the semiconductor active layer constitute a unit cell,

the optoelectronic device includes a plurality of unit cells, and further includes a plurality of first contact electrodes respectively connected to first ends of the plurality of unit cells, and a second contact electrode commonly connected to second ends of the plurality of unit cells.

19. An optoelectronic device comprising:

a first electrode;

a second electrode; and

a semiconductor active layer interposed between the first and second electrodes and including at least one of a 2D semiconductor and a quantum dot, the semiconductor active layer being a photodetecting layer,

wherein the semiconductor active layer has a built-in potential of substantially 0.1 eV or greater between the first and second electrodes,

wherein one of the first electrode and the second electrode includes graphene doped with a p-type dopant, and

wherein another of the first electrode and the second electrode includes graphene doped with an n-type dopant.

20. The optoelectronic device of claim 19 , wherein

the semiconductor active layer comprises a first region that is adjacent to the first electrode, and a second region that is adjacent to the second electrode, and

at least one of the first region and the second region is a doped region.

21. The optoelectronic device of claim 20 , wherein

when the first electrode is doped with a dopant of a first type, the first region of the semiconductor active layer is doped with a dopant of the first type, and

when the second electrode is doped with a dopant of a second type, the second region of the semiconductor active layer is doped with a dopant of the second type.

22. The optoelectronic device of claim 19 , wherein

the 2D semiconductor includes a metal chalcogenide-based material, and

the metal chalcogenide-based material includes a metal element from Mo, W, Nb, V, Ta, Ti, Zr, Hf, Tc, Re, Cu, Ga, In, Sn, Ge, and Pb, and a chalcogen element from S, Se, and Te.

23. An optoelectronic device comprising:

a first electrode;

a second electrode; and

a semiconductor active layer between the first and second electrodes, the semiconductor active layer being a photodetecting layer,

wherein at least one of the first electrode and the second electrode includes doped graphene,

wherein the semiconductor active layer has a built-in potential of substantially 0.1 eV or greater, and

wherein the semiconductor active layer comprises a two-dimensional (2D) semiconductor having a 2D crystal structure.

24. The optoelectronic device of claim 23 , wherein

one of the first electrode and the second electrode includes graphene doped with a p-type dopant, and

another of the first electrode and the second electrode includes graphene doped with an n-type dopant.

25. The optoelectronic device of claim 23 , wherein

one of the first electrode and the second electrode includes graphene doped with a p-type dopant or an n-type dopant, and

another of the first electrode and the second electrode includes a metallic material.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2015
From: HEO, JINSEONG; LEE, KIYOUNG; LEE, SANGYEOB; LEE, EUNKYU; LEE, JAEHO; PARK, SEONGJUN
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 037322/0805 →
Priority Claims (1)
KR 10-2015-0069119 · May 18, 2015 · national
Continuity (1)
Related Publication 20160343891A1 · Nov 24, 2016