IP Library › Granted Patent US 9,903,651
Granted Patent B2
US 9,903,651 · App. 14/556,969 · Granted Feb 27, 2018

Sealing member and substrate processing apparatus including the same

Inventors: Yong-Myung Jun (Hwaseong-si, KR); Yong-Sun Ko (Suwon-si, KR); Kun-Tack Lee (Suwon-si, KR); Il-Sang Lee (Hwaseong-si, KR); Ji-Hoon Jeong (Suwon-si, KR); Yong-Jhin Cho (Hwaseong-si, KR); Jin-Suk Hong (Hwaseong-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
F26B25/008F16J15/022F26B25/14H01L21/67017H01L21/67028H01L21/67034C23C16/4409
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Quick Facts
Patent No.
US 9,903,651
App. No.
14/556,969
Granted
Feb 27, 2018
Kind
B2
Abstract

A sealing member includes a body having a ring shape, a lower contacting portion protruding from a lower end of the body and having at least one recess, the recess provided in a lower surface of the lower contacting portion and extending in a radial direction of the body, and an outer contacting portion protruding outwards from the body along an outer side portion of the body.

Claims (30)

1. A sealing member, comprising:

a body having a ring shape;

a lower contacting portion protruding from a lower end of the body and having at least one recess, the recess provided in a lower surface of the lower contacting portion and extending in a radial direction of the body; and

an outer contacting portion protruding outwards from the body along an outer side portion of the body.

2. The sealing member of claim 1 , wherein a plurality of the recesses is arranged to be spaced apart from each other along a circumferential direction of the body.

3. The sealing member of claim 1 , wherein the sealing member comprises an indentation which is defined by a lower surface of the outer contacting portion and an outer surface of the lower contacting portion, the indentation extending in a circumferential direction of the body.

4. The sealing member of claim 3 , wherein the indentation is connected to the recess.

5. The sealing member of claim 3 , wherein the indentation is provided in an edge of an outer lower portion of the sealing member.

6. The sealing member of claim 3 , wherein the recess has a first depth from the lower surface of the lower contacting portion, and the indentation has a second depth from a plane having the lower surface of the lower contact portion, the second depth being substantially the same as or greater than the first depth.

7. The sealing member of claim 1 , wherein an outer surface of the outer contacting portion forms an acute inclination angle with respect to a plane of the lower surface of the lower contacting portion.

8. The sealing member of claim 1 , wherein an inner side portion of a vertical sectional profile of the sealing member has a linear or curvilinear shape.

9. The sealing member of claim 1 , wherein the sealing member comprises polymer material having elasticity.

10. A substrate processing apparatus, comprising:

a process chamber including a lower chamber and an upper chamber which are combined to provide a substrate processing space; and

the sealing member of claim 1 , the sealing member being configured to be seated in a receiving groove formed in at least one of mating surfaces of the lower chamber and the upper chamber opposite to each other and compressed between the upper chamber and the lower chamber to seal the space.

11. The substrate processing apparatus of claim 10 , further comprising:

a supply port supplying a supercritical fluid into the process chamber; and

an exhaust port exhausting from the supercritical fluid from the process chamber.

12. The substrate processing apparatus of claim 11 , wherein the supply port comprises a first supply port in the lower chamber and a second supply port in the upper chamber.

13. The substrate processing apparatus of claim 11 , wherein the exhaust port is in the lower chamber.

14. The substrate processing apparatus of claim 10 , further comprising a substrate supporting member provided in the process chamber to support a substrate in the process chamber.

15. The substrate processing apparatus of claim 14 , wherein the substrate supporting member extends from a lower surface of the upper chamber.

16. The substrate processing apparatus of claim 10 , wherein an outer sidewall of the receiving groove has a first height from a bottom face of the receiving groove, and an inner sidewall of the receiving groove has a second height from the bottom face of the receiving groove.

17. A sealing member, comprising:

a deformable body;

a first contacting portion of the deformable body including at least one recess; and

a second contacting portion of the deformable body including at least one indentation, the at least one recess, the at least one indentation and a receiving groove of a process chamber forming an auxiliary space in which reaction byproducts are collected and exhausted from the process chamber.

18. The sealing member of claim 17 , wherein a plurality of the recesses is arranged to be spaced apart from each other along a circumferential direction of the body.

19. The sealing member of claim 17 , wherein the at least one indentation is provided in an edge of the second contacting portion of the sealing member.

20. The sealing member of claim 19 , wherein the at least one recess has a first depth from a lower surface of the first contacting portion, and the indentation has a second depth from a plane having the lower surface of the first contact portion, the second depth being substantially the same as or greater than the first depth.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 2, 2014
From: JUN, YONG-MYUNG; KO, YONG-SUN; LEE, KUN-TACK; LEE, IL-SANG; JEONG, JI-HOON; CHO, YONG-JHIN; HONG, JIN-SUK
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 034313/0748 →
Priority Claims (1)
KR 10-2013-0161314 · Dec 23, 2013 · national
Continuity (1)
Related Publication 20150176897A1 · Jun 25, 2015