IP Library › Granted Patent US 9,910,064
Granted Patent B2
US 9,910,064 · App. 15/438,429 · Granted Mar 6, 2018

Force measurement with real-time baseline determination

Inventors: Changchun Liu (Goleta, CA); Bede Pittenger (Santa Barbara, CA); Shuiqing Hu (Santa Barbara, CA); Chanmin Su (Ventura, CA)
Assignee: Bruker Nano, Inc.
G01Q10/065
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Quick Facts
Patent No.
US 9,910,064
App. No.
15/438,429
Granted
Mar 6, 2018
Kind
B2
Abstract

An atomic force microscope (AFM) and corresponding method to provide low force (sub-20 pN) AFM control and mechanical property measurement is provided. The preferred embodiments employ real-time false deflection correction/discrimination by adaptively modifying the drive ramp to accommodate to deflection artifacts.

Claims (26)

1. An AFM having a probe that interacts with a sample, the AFM comprising:

a scanner to position at least one of the probe and the sample at a location of interest of the sample;

a Z-axis scanner to move at least one of the probe and the sample to lessen a separation therebetween and cause the two to interact;

a detector to measure a deflection of the probe;

a processor to discriminate a deflection artifact from a deflection due to probe-sample interaction from the measured deflection data by continuously identifying a baseline during the moving step to derive an artifact free deflection and compare it with a predefined trigger force;

wherein the Z-axis scanner retracts the probe from the sample if the artifact free deflection substantially corresponds to the trigger force; and

wherein the processor determines the force between the sample and the probe, wherein the force is less than 20 pN.

2. The AFM of claim 1 , wherein the force is used as a trigger to change a parameter associated with the moving step.

3. The AFM of claim 2 , wherein the parameter is at least one of a speed, a direction and a force gradient.

4. The AFM of claim 1 , wherein the processor compares a drive ramp to a fit line based on data corresponding to the deflection, and further extrapolates the baseline based on the comparison.

5. The AFM of claim 4 , wherein the fit line is determined by performing a least squares fit.

6. The AFM of claim 5 , wherein the processor provides a rolling baseline until a threshold trigger is met.

7. An atomic force microscope (AFM) that detects a force between a sample and a probe of the AFM, the AFM comprising:

an actuator that positions the at least one of the probe and the sample at a location of interest of the sample;

a Z actuator that moves at least one of the probe and the sample to lessen a separation therebetween and cause the two to interact;

a detector that measures a deflection of the probe in response to the probe-sample interaction; and

a processor that uses the measured deflection, in real time as the Z actuator moves at least one of the probe and the sample, to determine an instantaneous baseline.

8. An atomic force microscope (AFM) including a probe that interacts with a sample, the AFM comprising:

an actuator that positions at least one of the probe and the sample at a location of interest of the sample;

a Z actuator that moves at least one of the probe and the sample to lessen a separation therebetween and cause the two to interact;

a detector that measures an observable interaction between the probe and the sample based on the moving step;

a processor that determines an observable interaction artifact from the observable interaction and derives an artifact free observable interaction, and wherein the processor compares the artifact free observable interaction with a trigger; and

wherein the Z actuator retracts the probe from the sample if the artifact free observable interaction substantially corresponds to the trigger.

9. The AFM of claim 8 , wherein the observable interaction includes at least one of a group including: force, deflection, electric interaction, magnetic interaction, thermal interaction and electromagnetic interaction.

10. The AFM of claim 9 , wherein the observable interaction is an electric interaction, and the electric interaction is one of force, current and voltage.

11. The AFM of claim 9 , wherein the electromagnetic interaction is based on scattered near field optical signals.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2017
From: LIU, CHANGCHUN; PITTENGER, BEDE; HU, SHUIQING; SU, CHANMIN
To: BRUKER NANO, INC.
Reel/Frame 043684/0852 →
Continuity (3)
Division 14563826 · Dec 8, 2014
Provisional Application 61913248 · Dec 7, 2013
Related Publication 20170227577A1 · Aug 10, 2017