Projection exposure method and projection exposure apparatus

1. A method of using a projection exposure apparatus comprising an illumination system and an anamorphic projection lens, the method comprising:

using the illumination system to illuminate an illumination region of a mask which comprises a pattern, the mask being located in a region of an object plane of the anamorphic projection lens;

using the anamorphic projection lens to project an illuminated part of the pattern of the mask onto a radiation-sensitive material located in an image plane of the anamorphic projection lens;

synchronously moving the mask and the radiation-sensitive material in a respective scanning direction during a scan operation;

rotating the mask by a first angle about a first axis oriented perpendicular to the object plane of the anamorphic lens; and

rotating the radiation-sensitive material by a second angle about a second oriented perpendicular to the image plane of the anamorphic lens,

wherein the rotation of the mask and the rotation of the radiation-sensitive material are coordinated with one another so that:

for a first aberration caused by the rotation of the mask, a profile over the image field is set; and

for a second image aberration caused by the rotation of the mask, a profile over the image field is compensated for by the rotation of the sub radiation-sensitive material to a greater extent than the profile of the first image aberration over the image field.

2. The method of claim 1 , comprising synchronously rotating the mask and the radiation-sensitive material about the assigned rotation axes during the scan operation so that the rotation of the mask and the rotation of the radiation-sensitive material, in a time interval between the beginning and end of a scan operation proceeding in one direction, are effected synchronously with variation of the first and second rotation angles according to a predefinable movement profile.

3. The method of claim 2 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a ratio of the first and second imaging scales.

4. The method of claim 2 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a reciprocal of a ratio of the first and second imaging scales.

5. The method of claim 1 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a ratio of the first and second imaging scales.

6. The method of claim 1 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a reciprocal of a ratio of the first and second imaging scales.

7. The method of claim 1 , further comprising:

determining a movement profile for rotating the mask by the first angle and for rotation the radiation-sensitive material by the second angle; and

synchronously rotating the mask by the first angle and the radiation-sensitive material by the second angle rotation axes during the scan operation according to the movement profile.

8. An apparatus configured to expose a radiation-sensitive material with an image of a pattern of a mask, the apparatus comprising:

an illumination system configured to generate an illumination radiation directed onto the mask;

an anamorphic projection lens configured to generate an image of the pattern in the region of an image plane of the projection lens;

a mask holding unit configured to hold the mask between the illumination system and the projection lens so that the pattern is arranged in a region of an object plane of the anamorphic projection lens and so that the pattern is movable in a scanning direction perpendicular to a reference axis of the anamorphic projection lens;

a substrate holding unit configured to hold the radiation-sensitive material so that the radiation-sensitive material is in a region of the image plane of the anamorphic projection lens, and so that the radiation-sensitive material is synchronously movable with the mask perpendicular to the reference axis of the projection lens; and

a control unit,

wherein:

the image plane is optically conjugate to the object plane;

the mask holding unit comprises a first rotation unit configured to controllably rotate the mask about a first rotation axis running orthogonally with respect to the object plane;

the substrate holding unit comprises a second rotation unit configured to controllably rotate the radiation-sensitive material about a second rotation axis running orthogonally with respect to the image plane;

the control unit is configured to rotate the mask holding unit and the substrate holding unit in a manner coordinated with each other so that:

for a first image aberration caused by the rotation of the mask, a profile over the image field is set; and

for a second image aberration caused by the rotation of the mask, a profile over the image field is compensated for by the rotation of the radiation-sensitive material to a greater extent than the profile of the first image aberration over the image field; and

the apparatus is a projection exposure apparatus.

9. The apparatus of claim 8 , wherein the first and second rotation units are configured so that a rotation of the mask and of the radiation-sensitive material, in a time interval between the beginning and end of a scan operation proceeding in one direction, is controllable according to a predefinable movement profile.

10. The apparatus of claim 9 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a ratio of the first and second imaging scales.

11. The apparatus of claim 9 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a reciprocal of a ratio of the first and second imaging scales.

12. The apparatus of claim 8 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a ratio of the first and second imaging scales.

13. The apparatus of claim 8 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a reciprocal of a ratio of the first and second imaging scales.

14. The apparatus of claim 8 , wherein control unit is configured to:

determine a movement profile for rotating the mask by the first angle and for rotation the radiation-sensitive material by the second angle; and

synchronously rotate the mask by the first angle and the radiation-sensitive material by the second angle rotation axes during the scan operation according to the movement profile.

15. An apparatus, comprising:

an illumination system configured provide an illumination radiation directed onto at least a portion of a pattern of a mask;

an anamorphic projection lens configured to generate an image of at least a portion of the illuminated portion of the pattern of the mask, in the region of an image plane of the projection lens; and

a control unit,

wherein:

the mask is located in a region of an object plane of the anamorphic projection lens;

the radiation-sensitive material is located in a region of an image plane of the anamorphic lens;

the image plane is optically conjugate to the object plane;

the control unit is configured to rotate the mask and the radiation-sensitive material so that:

the rotation of the mask causes first and second image aberrations over the image field;

a profile of the first aberration over the image field is set; and

a profile of the second aberration over the image field is compensated for by the rotation of the radiation-sensitive material to a greater extent than the profile of the first image aberration over the image field; and

the apparatus is a projection exposure apparatus.

16. The apparatus of claim 15 , wherein the apparatus is configured so that rotation of the mask and of the radiation-sensitive material, in a time interval between the beginning and end of a scan operation proceeding in one direction, is controllable according to a predefinable movement profile.

17. The apparatus of claim 16 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a ratio of the first and second imaging scales.

18. The apparatus of claim 16 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a reciprocal of a ratio of the first and second imaging scales.

19. The apparatus of claim 15 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a ratio of the first and second imaging scales.

20. The apparatus of claim 15 , wherein:

the anamorphic projection lens has a first imaging scale in a first direction;

the anamorphic projection lens has a second imaging scale in a second direction perpendicular to the first direction;

the second imaging scale is different from the first imaging scale; and

the first and second rotation angles are in a ratio to one another which corresponds to a reciprocal of a ratio of the first and second imaging scales.