IP Library › Granted Patent US 9,947,552
Granted Patent B2
US 9,947,552 · App. 15/195,321 · Granted Apr 17, 2018

Structure and formation method of chip package with fan-out structure

Inventors: Shing-Chao Chen (Zhubei, TW); Chih-Wei Lin (Zhubei, TW); Meng-Tse Chen (Changzhi Township, Pingtung County, TW); Hui-Min Huang (Taoyuan, TW); Ming-Da Cheng (Zhubei, TW); Kuo-Lung Pan (Hsinchu, TW); Wei-Sen Chang (Jinsha Township, Kinmen County, TW); Tin-Hao Kuo (Hsinchu, TW); Hao-Yi Tsai (Hsinchu, TW)
Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
H01L21/566H01L21/486H01L21/568H01L23/315H01L23/3114H01L23/585
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Quick Facts
Patent No.
US 9,947,552
App. No.
15/195,321
Granted
Apr 17, 2018
Kind
B2
Abstract

Structures and formation methods of a chip package are provided. The method includes forming multiple conductive structures over a carrier substrate and disposing a semiconductor die over the carrier substrate. The method also includes disposing a mold over the carrier substrate. The method further includes forming a protection layer between the mold and the carrier substrate to surround the semiconductor die and the conductive structures. In addition, the method includes removing the mold.

Claims (46)

1. A method for forming a chip package, comprising:

forming conductive structures over a carrier substrate;

disposing a semiconductor die over the carrier substrate;

disposing a mold over the carrier substrate;

injecting a molding compound material into the mold through an opening of the mold to form a protection layer between the mold and the carrier substrate to surround the semiconductor die and the conductive structures, wherein the mold comprises a release film, the release film is in direct contact with the conductive structures during the injecting of the molding compound material, and the release film is in direct contact with the semiconductor die during the injecting of the molding compound material;

and removing the mold.

2. The method for forming a chip package as claimed in claim 1 , further comprising:

forming an interconnection structure over the protection layer, the conductive structures, and the semiconductor die; and

removing the carrier substrate.

3. The method for forming a chip package as claimed in claim 2 , wherein the protection layer and the conductive structures are not planarized after the removal of the mold and before the formation of the interconnection structure.

4. The method for forming a chip package as claimed in claim 1 , further comprising cutting upper portions of the conductive structures so that top surfaces of the conductive structures are substantially coplanar with each other.

5. The method for forming a chip package as claimed in claim 1 , further comprising:

forming a mask layer over the carrier substrate, wherein the mask layer has a plurality of openings exposing a seed layer over the carrier substrate;

forming the conductive structures in the openings by plating;

cutting upper portions of the mask layer and upper portions of the conductive structures so that top surfaces of the conductive structures are substantially coplanar with each other; and

removing the mask layer.

6. The method for forming a chip package as claimed in claim 1 , wherein height difference between the semiconductor die and one of the conductive structures is in a range from about 2 μm to about 3 μm.

7. A method for forming a chip package, comprising:

forming conductive structures over a carrier substrate;

cutting upper portions of the conductive structures so that top surfaces of the conductive structures are substantially coplanar with each other;

disposing a semiconductor die over the carrier substrate after cutting the upper portions of the conductive structures;

disposing a mold over the carrier substrate;

injecting a molding compound material into the mold through an opening of the mold to form a protection layer over the carrier substrate to surround the conductive structures and the semiconductor die, wherein the mold comprises a release film, the release film is in direct contact with the conductive structures during the injecting of the molding compound material, and the release film is in direct contact with the semiconductor die during the injecting of the molding compound material; and

removing the mold.

8. The method for forming a chip package as claimed in claim 7 , further comprising:

forming an interconnection structure over the protection layer, the conductive structures, and the semiconductor die;

forming a plurality of conductive bumps over the interconnection structure; and

removing the carrier substrate.

9. The method for forming a chip package as claimed in claim 8 , wherein the protection layer is not thinned before the formation of the interconnection structure.

10. The method for forming a chip package as claimed in claim 7 , wherein the conductive structures are formed using a plating process.

11. The method for forming a chip package as claimed in claim 7 , wherein the molding compound material does not cover the top surfaces of the conductive structures during the injecting of the molding compound material.

12. The method for forming a chip package as claimed in claim 8 , wherein the top surfaces of the conductive structures are higher than a top surface of the semiconductor die.

13. A method for forming a chip package, comprising:

forming a conductive structure over a carrier substrate;

disposing a semiconductor die over the carrier substrate;

disposing a mold over the carrier substrate;

injecting a material between the mold and the carrier substrate to form a protection layer surrounding the semiconductor die, wherein the mold comprises a release film, the release film is in direct contact with the conductive structure during the injecting of the material, and the release film is in direct contact with the semiconductor die during the injecting of the material; and removing the mold.

14. The method for forming a chip package as claimed in claim 13 , further comprising cutting an upper portion of the conductive structure before the protection layer is formed.

15. The method for forming a chip package as claimed in claim 13 , wherein the material does not cover a conductive pad of the semiconductor die during the material is injected.

16. The method for forming a chip package as claimed in claim 13 , further comprising removing an upper portion of the conductive structure by cutting before the protection layer is formed.

17. The method for forming a chip package as claimed in claim 13 , further comprising performing a thermal process to harden the material such that the protection layer is formed.

18. The method for forming a chip package as claimed in claim 13 , further comprising:

forming a mask layer over the carrier substrate, wherein the mask layer has an opening exposing a seed layer over the carrier substrate;

forming the conductive structure in the opening by plating;

cutting an upper portion of the mask layer and an upper portion of the conductive structure; and removing the mask layer.

19. The method for forming a chip package as claimed in claim 1 , wherein the semiconductor die is disposed between two of the conductive structures.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2016
From: CHEN, SHING-CHAO; LIN, CHIH-WEI; CHEN, MENG-TSE; HUANG, HUI-MIN; CHENG, MING-DA; PAN, KUO-LUNG; CHANG, WEI-SEN; KUO, TIN-HAO; TSAI, HAO-YI
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 039045/0425 →
Continuity (2)
Provisional Application 62329851 · Apr 29, 2016
Related Publication 20170316957A1 · Nov 2, 2017