Polishing apparatus, method for controlling the same, and method for outputting a dressing condition

1. A polishing apparatus comprising:

a turntable for supporting a polishing pad;

a turntable rotation mechanism configured to rotate the turntable;

a dresser configured to dress the polishing pad; and

a scanning mechanism configured to cause the dresser to scan between a first position and a second position on the polishing pad,

wherein Ttt/Tds and Tds/Ttt are a non-integer where the Ttt is a rotation cycle of the turntable during dressing, and the Tds is a scanning cycle during which the dresser scans between the first position and the second position.

2. The polishing apparatus according to claim 1 , further comprising a controller configured to set the Ttt and/or the Tds.

3. The polishing apparatus according to claim 1 , wherein Tds/Ttt=n+1/N (n is any integer) is satisfied where the N is a number of times for which the dresser scans on the polishing pad during dressing once.

4. The polishing apparatus according to claim 1 , wherein Tds/Ttt=n±d/2πr0 is established (n is any integer) where the d is a diameter of the dresser, and the r0 is a distance from a starting point of the dresser in scanning to a center of the turntable.

5. The polishing apparatus according to claim 3 , wherein in a case where a diameter of the dresser is denoted by d, the n is selected such that an average scanning speed of the dresser is closest to d/Ttt.

6. The polishing apparatus according to claim 1 , wherein the dresser dresses the polishing pad during a period after polishing one substrate is completed and before a next substrate is started to be polished, and

the Tds is set such that the dresser scans on the polishing pad for first times or more during the period.

7. The polishing apparatus according to claim 1 , wherein the dresser dresses the polishing pad in parallel with polishing the substrate, and

the Ttt is set in accordance with a polishing condition of the substrate.

8. The polishing apparatus according to claim 1 , wherein the scanning mechanism causes the dresser to scan from a neighborhood of a center on the polishing pad as a starting point.

9. The polishing apparatus according to claim 1 , further comprising a pressing mechanism configured to press the dresser against the polishing pad,

wherein V(t)A(t)/r(t) is substantially constant where the V(t) is a relative speed between the dresser and the polishing pad at a time t, the r(t) is a distance between a center of the turntable and a center of the dresser at a time t, and the A(t) is a pressing force or a pressure of the dresser against the polishing pad at a time t.

10. The polishing apparatus according to claim 9 , further comprising a controller configured to control the V(t) and/or the A(t) such that V(t)A(t)/r(t) becomes substantially constant.

11. The polishing apparatus according to claim 9 , further comprising a controller configured to control the V(t) and/or the A(t) such that a friction coefficient between the dresser and the polishing pad becomes constant.

12. The polishing apparatus according to claim 11 , wherein the controller calculates the friction coefficient based on the V(t), the A(t), and a force to actually dress the polishing pad by the dresser.

13. A polishing apparatus comprising:

a turntable for supporting a polishing pad;

a turntable rotation mechanism configured to rotate the turntable;

a dresser configured to dress the polishing pad;

a pressing mechanism configured to press the dresser against the polishing pad; and

a scanning mechanism configured the dresser to scan between a first position and a second position of the polishing pad,

wherein V(t)A(t)/r(t) is substantially constant where the V(t) is a relative speed between the dresser and the polishing pad at a time t, the r(t) is a distance between a center of the turntable and a center of the dresser at a time t, and the A(t) is a pressing force or a pressure of the dresser against the polishing pad at a time t.

14. The polishing apparatus according to claim 13 , further comprising a controller configured to control the V(t) and/or the A(t) such that V(t)A(t)/r(t) becomes substantially constant.

15. The polishing apparatus according to claim 13 , further comprising a controller configured to control the V(t) and/or the A(t) such that a friction coefficient between the dresser and the polishing pad becomes constant.

16. The polishing apparatus according to claim 15 , wherein the controller calculates the friction coefficient based on the V(t), the A(t), and a force to actually dress the polishing pad by the dresser.

17. The polishing apparatus according to claim 13 , further comprising a controller configured to rotate the turntable by controlling the turntable rotation mechanism and cause the dresser to scan by controlling the scanning mechanism in a state in which the dresser does not come into contact with the polishing pad, to monitor a locus of the dresser on the polishing pad in a state in which the dresser does not come into contact with the polishing pad.

18. A control method for a polishing apparatus, said method comprising:

providing a turntable for supporting a polishing pad, a turntable rotation mechanism, a dresser, a scanning mechanism, and a controller; and

controlling the turntable rotation mechanism and the scanning mechanism such that Ttt/Tds and Tds/Ttt become non-integers in a case where a rotation cycle of the turntable during dressing is denoted by Ttt, and a scanning cycle in which the dresser scans between a first position and a second position on the polishing pad is denoted by Tds.

19. A control method for a polishing apparatus, said method comprising:

providing a turntable for supporting a polishing pad, a turntable rotation mechanism, a dresser, a pressing mechanism, a scanning mechanism, and a controller; and

controlling the turntable rotation mechanism, the pressing mechanism, and the scanning mechanism such that V(t)A(t)/r(t) becomes substantially constant where the V(t) is a relative speed between the dresser and the polishing pad at a time t, the r(t) is a distance between a center of the turntable and a center of the dresser at a time t, and the A(t) is a pressing force or a pressure of the dresser against the polishing pad at a time t.

20. A dressing condition output method for a polishing apparatus, said method comprising:

preparing a turntable for supporting a polishing pad, a turntable rotation mechanism a dresser, a scanning mechanism, and a controller;

receiving a restriction condition;

first referring to a database previously storing a first condition which is a dressing condition capable of uniformly dressing the polishing pad and a second condition which is a dressing condition incapable of uniformly dressing the polishing pad, and outputting the first condition in a case where the first condition satisfying the restriction condition is stored in the database;

calculating a dressing condition in a case where the first condition satisfying the restriction condition is not stored; and

second referring to the database to output the calculated dressing condition in a case where the calculated dressing condition and the second condition are not matched,

wherein, upon calculating the dressing condition, the dressing condition is calculated such that Ttt/Tds and Tds/Ttt become non-integers where the Ttt is a rotation cycle of the turntable during dressing, and the Tds is a scanning cycle during which the dresser scans between a first position and a second position on the polishing pad.

21. The dressing condition output method according to claim 20 , further comprising adding the calculated dressing condition to the database in a case where the calculated dressing condition and the second condition are not matched.

22. The dressing condition output method according to claim 20 , further comprising, in a case where the calculated dressing condition and the second condition are not matched, rotating the turntable by controlling the turntable rotation mechanism and causing the dresser to scan by controlling the scanning mechanism in a state in which the dresser does not come into contact with the polishing pad and under the calculated dressing condition, to confirm by monitoring a locus of the dresser on the polishing pad whether or not dressing the polishing pad uniformly is possible,

wherein if possible to dress the polishing pad uniformly as a result of a confirmation, the controller outputs the calculated dressing condition.

23. The dressing condition output method according to claim 20 , further comprising calculating other dressing condition in a case where the calculated dressing condition and the second condition are matched.

24. A method for outputting a dressing condition for a polishing apparatus, said method comprising:

supplying a turntable for supporting a polishing pad, a turntable rotation mechanism, a dresser, a pressing mechanism, a scanning mechanism, and a controller; and

receiving a restriction condition;

first referring to a database preliminary storing the first condition which is a dressing condition capable of uniformly dressing the polishing pad and a second condition which is a dressing condition incapable of uniformly dressing the polishing pad, and outputting a first condition in a case where the first condition satisfying the control condition is stored in the database;

calculating a dressing condition in a case where the first condition satisfying the restriction condition is not stored; and

second referring to the database to output the calculated dressing condition in a case where the calculated dressing condition and the second condition are not matched,

wherein, upon calculating the dressing condition, the dressing condition is calculated such that V(t)A(t)/r(t) becomes substantially constant where the V(t) is a relative speed between the dresser and the polishing pad at a time t, the r(t) is a distance between a center of the turntable and a center of the dresser at a time t, and the A(t) is a pressing force or a pressure of the dresser against the polishing pad at a time t.

25. The method for outputting a dressing condition according to claim 24 , further comprising adding the calculated dressing condition to the database in a case where the calculated dressing condition and the second condition are not matched.

26. The method for outputting a dressing condition according to claim 24 , further comprising, in a case where the calculated dressing condition and the second condition are not matched, rotating the turntable by controlling the turntable rotation mechanism and causing the dresser to scan by controlling the scanning mechanism in a state in which the dresser does not come into contact with the polishing pad and under the calculated dressing condition, to confirm by monitoring a locus of the dresser on the polishing pad whether or not dressing the polishing pad uniformly is possible,

wherein if possible to dress the polishing pad uniformly as a result of a confirmation, the controller outputs the calculated dressing condition.

27. The method for outputting a dressing condition according to claim 24 , further comprising calculating other dressing condition in a case where the calculated dressing condition and the second condition are matched.