IP Library › Granted Patent US 9,978,660
Granted Patent B2
US 9,978,660 · App. 14/213,890 · Granted May 22, 2018

Package with embedded heat dissipation features

Inventors: Wensen Hung (Zhubei, TW); Szu-Po Huang (Taichung, TW); Hsiang-Fan Lee (Hsin-Chu, TW); Kim Hong Chen (Fremont, CA); Chi-Hsi Wu (Hsin-Chu, TW); Shin-Puu Jeng (Hsin-Chu, TW)
Assignee: Taiwan Semiconductor Manufacturing Company
H01L23/367H01L23/13H01L23/3114H01L23/36H01L23/4334H01L25/0657H01L25/50H01L23/49816H01L23/49827H01L23/49894H01L2224/16225H01L2224/73204H01L2225/06513H01L2225/06517H01L2225/06541H01L2225/06589H01L2924/15311
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Quick Facts
Patent No.
US 9,978,660
App. No.
14/213,890
Granted
May 22, 2018
Kind
B2
Abstract

An integrated circuit package and a method of fabrication of the same are introduced. An opening is formed in a substrate. An embedded heat dissipation feature (eHDF) is placed in the opening in the substrate and is attached to the substrate using a high thermal conductivity adhesive. One or more bonded chips are attached to the substrate using a flip-chip method. The eHDF is thermally attached to one or more hot spots of the bonded chips. In some embodiments, the eHDF may comprise multiple physically disconnected portions. In other embodiments, the eHDF may have a perforated structure.

Claims (42)

1. An integrated circuit package comprising:

a substrate;

two or more chips over the substrate; and

an embedded heat dissipation feature (eHDF) between the substrate and at least a first one of the chips, wherein a bottommost surface of the first one of the chips is above a topmost surface of the eHDF, wherein a second one of the chips is substantially level with the eHDF, wherein the eHDF is disposed along multiple sides of the second one of the chips, wherein the second one of the chips is interposed between the first one of the chips and the substrate, wherein a portion of the eHDF is located in a trench in the substrate, and wherein the portion of the eHDF located in the trench is disposed directly over a top surface of the substrate.

2. The integrated circuit package of claim 1 , wherein the eHDF has a perforated structure.

3. The integrated circuit package of claim 1 , wherein a portion of the eHDF is thermally connected to a region of at least one of the chips, the region being an area that exhibits high temperatures during use.

4. The integrated circuit package of claim 1 , wherein the substrate comprises:

a dielectric layer;

a power/ground layer over the dielectric layer;

a patterned solder resist layer over the power/ground layer;

a high thermal conductivity adhesive in an opening in the patterned solder resist layer and over the power/ground layer; and

a portion of the eHDF over the high thermal conductivity adhesive.

5. The integrated circuit package of claim 1 , wherein the substrate comprises thermal interconnects.

6. The integrated circuit package of claim 1 , wherein the eHDF extends along sidewalls of the substrate.

7. The integrated circuit package of claim 1 , wherein the portion of the eHDF located in the trench is directly attached to the top surface of the substrate by an adhesive.

8. An integrated circuit package comprising:

a substrate;

a first chip over the substrate;

a second chip over the first chip, the second chip having a first region and a second region, the second chip being electrically coupled to the substrate through the first chip, the first region being an area that exhibits a higher temperature than the second region during use;

an embedded heat dissipation feature (eHDF) over the substrate, a first portion of the eHDF surrounding the first chip, a second portion of the eHDF extending through a hole in the substrate, the first region of the second chip being over and in thermal contact with the first portion of the eHDF;

an encapsulant extending along sidewalls of the first chip, sidewalls of the second chip, and sidewalls of the eHDF, wherein a portion of the encapsulant fills a gap between a sidewall of the hole and a sidewall of the second portion of the eHDF; and

a second substrate bonded to the substrate by first solder balls, the second substrate being disposed on an opposing side of the substrate than the first chip, and wherein the eHDF is bonded to the second substrate by second solder balls disposed on a bottom surface of the second portion of the eHDF.

9. The integrated circuit package of claim 8 , wherein the eHDF comprises one or more separate portions, at least one of the separate portions being in thermal contact with a third region of the first chip, the third region being an area that exhibits high temperatures during use.

10. The integrated circuit package of claim 8 , wherein the eHDF is connected to the substrate using thermal connectors.

11. The integrated circuit package of claim 8 , wherein the eHDF is thermally connected to an uppermost dielectric layer of the substrate using a high thermal conductivity adhesive.

12. The integrated circuit package of claim 8 , wherein the second portion of the eHDF is thermally connected to the first chip and the second chip.

13. The integrated circuit package of claim 8 , wherein the first solder balls and the second solder balls are substantially level.

14. The integrated circuit package of claim 8 , wherein the encapsulant surrounds the second portion of the eHDF.

15. A method of fabricating an integrated circuit package, the method comprising:

placing an embedded heat dissipation feature (eHDF) over and extending along a sidewall of a substrate, wherein the eHDF comprises a hole extending through the eHDF, wherein at least a portion of the substrate extends into the hole, and wherein a high thermal conductivity adhesive layer is disposed between a sidewall of the eHDF and the sidewall of the substrate; and

attaching a stack of chips on the substrate, at least a first one of the chips being placed over the eHDF and at least a second one of the chips being placed in the hole in the eHDF, wherein the first one of the chips and the second one of the chips are disposed on a same side of the substrate, wherein a plane parallel to a major surface of the substrate intersects both a sidewall of the hole in the eHDF and a sidewall of the second one of the chips, and wherein at least a portion of the eHDF is interposed between the substrate and the second one of the chips.

16. The method of claim 15 , further comprising forming thermal interconnects in the substrate.

17. The method of claim 15 , wherein the placing the eHDF comprises:

forming a trench in the substrate;

placing a portion of the eHDF in the trench; and

attaching the portion of the eHDF in the trench to the substrate using a high thermal conductive adhesive.

18. The method of claim 15 , wherein the placing the eHDF comprises:

forming a hole in the substrate;

placing a portion of the eHDF in the hole; and

attaching the portion of the eHDF to one or more thermal connectors using a solder reflow process.

19. The method of claim 15 , wherein the placing the eHDF comprises thermally attaching a portion of the eHDF to a region of at least one of the chips, the region being an area that exhibits high temperatures during use.

20. The method of claim 15 , further comprising forming the eHDF having a perforated structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 3, 2014
From: HUNG, WENSEN; HUANG, SZU-PO; LEE, HSIANG-FAN; CHEN, KIM HONG; WU, CHI-HSI; JENG, SHIN-PUU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Reel/Frame 032598/0021 →
Continuity (1)
Related Publication 20150262904A1 · Sep 17, 2015