Method and apparatus for wafer wet processing
A gas dispenser in a process module for wet processing of wafer-shaped articles is substantially smaller than the article to be processed and is movable laterally of the article as it dispenses inert gas above the article.
1. A method for processing wafer shaped articles, comprising:
positioning a wafer-shaped article on a holder;
positioning a gas dispenser above the wafer-shaped article at a defined operating distance;
dispensing an inert gas above the wafer-shaped article;
dispensing an etching liquid onto the wafer-shaped article simultaneously with said dispensing an inert gas above the wafer-shaped article; and
moving the gas dispenser laterally relative to the wafer-shaped article while dispensing said inert gas;
wherein the etching liquid is dispensed from a nozzle carried by the gas dispenser.
2. The method according to claim 1 , wherein the gas dispenser has a size such that it overlaps the wafer-shaped article in an area that is from 5 to 50% of an area of an upwardly facing surface of the wafer-shaped article.
3. The method according to claim 1 , wherein said dispensing of an inert gas above the wafer-shaped article comprises dispensing inert gas through an annular nozzle in a direction substantially parallel to an upwardly-facing surface of the wafer-shaped article.
4. The method according to claim 1 , wherein said dispensing of an inert gas above the wafer-shaped article comprises dispensing inert gas through a plurality of downwardly directed gas outlets configured to dispense inert gas downwardly toward the wafer-shaped article.
5. The method according to claim 1 , wherein said dispensing of an inert gas above the wafer-shaped article comprises dispensing inert gas through an annular nozzle in a direction substantially parallel to an upwardly-facing surface of the wafer-shaped article, and dispensing inert gas through a plurality of downwardly directed gas outlets configured to dispense inert gas downwardly toward the wafer-shaped article.
6. The method according to claim 5 , wherein inert gas is dispensed through the annular nozzle via outlets surrounding and directed outwardly of the plurality of downwardly directed gas outlets.