Sub-fin doping method
A gap fill method for sub-fin doping includes forming semiconductor fin arrays over a semiconductor substrate, forming a first dopant source layer over a first fin array and filling intra fin gaps within the first array, and forming a second dopant source layer over a second fin array and filling intra fin gaps within the second array. The first and second dopant source layers are recessed to expose a channel region of the fins. Thereafter, an annealing step is used to drive dopants from the dopant source layers locally into sub-fin regions of the fins below the channel regions.
1. A method of fabricating a semiconductor structure, comprising:
forming a plurality of semiconductor fins over a semiconductor substrate, the semiconductor fins including a first fin array over a first device region of the substrate and a second fin array over a second device region of the substrate;
forming a first dopant source layer over the first fin array, wherein the first dopant source layer entirely fills intra fin gaps within the first fin array;
forming a second dopant source layer over the second fin array, wherein the second dopant source layer entirely fills intra fin gaps within the second fin array, wherein forming the first dopant source layer over the first fin array further comprises forming the first dopant source layer over the second fin array, the first dopant source layer entirely filling the intra fin gaps within the second fin array; and
selectively removing the first dopant source layer from over the second fin array prior to forming the second dopant source layer over the second fin array.
2. The method of claim 1 , wherein the first dopant source layer is formed directly over sidewalls of the fins within the first fin array, and the second dopant source layer is formed directly over sidewalls of the fins within the second fin array.
3. The method of claim 1 , wherein the fins within the first fin array are arranged at a pitch of 20 to 100 nm, and the fins within the second fin array are independently arranged at a pitch of 20 to 100 nm.
4. The method of claim 1 , further comprising recessing the first and second dopant source layers to expose a channel region of the fins in each of the first and second device regions.
5. The method of claim 4 , further comprising driving dopants from the dopant source layers into sub-fin regions of the fins below the channel regions.
6. The method of claim 5 , further comprising removing the dopant source layers.
7. The method of claim 1 , wherein the first dopant source layer comprises borosilicate glass and the second dopant source layer comprises phosphosilicate glass.
8. The method of claim 1 , further comprising forming a block mask over the second fin array prior to forming the first dopant source layer over the first fin array.
9. A method of fabricating a semiconductor structure, comprising:
forming a first fin array over a first device region of a semiconductor substrate;
forming a second fin array over a second device region of the substrate;
forming a first dopant source layer directly over the first fin array, wherein the first dopant source layer entirely fills intra fin gaps within the first fin array;
forming a second dopant source layer directly over the second fin array, wherein the second dopant source layer entirely fills intra fin gaps within the second fin array;
driving dopants from the dopant source layers into sub-fin regions of the fins below channel regions of the fins, wherein forming the first dopant source layer over the first fin array further comprises forming the first dopant source layer over the second fin array, the first dopant source layer at least partially filling the intra fin gaps within the second fin array; and
selectively removing the first dopant source layer from over the second fin array prior to forming the second dopant source layer over the second fin array.
10. The method of claim 9 , further comprising recessing the first and second dopant source layers to expose the channel regions prior to driving the dopants.
11. The method of claim 9 , wherein the first dopant source layer is formed directly over sidewalls of the fins within the first fin array, and the second dopant source layer is formed directly over sidewalls of the fins within the second fin array.
12. The method of claim 9 , wherein the fins within the first fin array are arranged at a pitch of 20 to 100 nm, and the fins within the second fin array are independently arranged at a pitch of 20 to 100 nm.
13. The method of claim 9 , further comprising removing the dopant source layers.
14. The method of claim 9 , wherein the first dopant source layer comprises borosilicate glass and the second dopant source layer comprises phosphosilicate glass.
15. The method of claim 9 , further comprising forming a block mask over the second fin array prior to forming the first dopant source layer over the first fin array.
16. A method of fabricating a semiconductor structure, comprising:
forming a plurality of semiconductor fins over a semiconductor substrate, the semiconductor fins including a first fin array over a first device region of the substrate and a second fin array over a second device region of the substrate, wherein the fins within the first fin array are arranged at a pitch of 20 to 100 nm, and the fins within the second fin array are independently arranged at a pitch of 20 to 100 nm;
forming a first dopant source layer over the first fin array, wherein the first dopant source layer entirely fills intra fin gaps within the first fin array; and
forming a second dopant source layer over the second fin array, wherein the second dopant source layer entirely fills intra fin gaps within the second fin array.