Method of manufacturing a display apparatus having pixels areas with different thicknesses
A method of manufacturing a display apparatus having a base with a plurality of pixel electrode and pixel definition layers, wherein the base is divided into a plurality of areas comprising a first area and a second area; the method comprising measuring reflectivities of the first and second areas, wherein a measured reflectivity of the first area is different from that of the second area; placing the base in a deposition chamber; and forming a first intermediate layer over a first one of the pixel electrodes in the first area; moving the base relative to the deposition unit; forming a second intermediate layer over a second one of the pixel electrodes in the second area, wherein the first intermediate layer has a first thickness and the second intermediate layer has a second thickness different from the first thickness.
1. A method of manufacturing a display apparatus, the method comprising:
providing a base comprising:
a substrate,
a plurality of pixel electrodes formed over the substrate, and
a pixel definition layer formed over the substrate and the plurality of pixel electrodes,
wherein the base is divided into a plurality of areas comprising a first area and a second area;
measuring reflectivities of the first and second areas wherein a measured reflectivity of the first area is different from that of the second area;
placing the base in a deposition chamber to be spaced from a deposition unit provided in the deposition chamber; and
forming a first intermediate layer over a first one of the pixel electrodes in the first area;
moving the base relative to the deposition unit;
forming a second intermediate layer over a second one of the pixel electrodes in the second area, wherein the first intermediate layer has a first thickness and the second intermediate layer has a second thickness different from the first thickness.
2. The method of claim 1 , further comprising:
cleaning the base; and
drying the cleaned base.
3. The method of claim 1 , further comprising performing plasma processing on the base.
4. The method of claim 1 , wherein the deposition unit comprises a plurality of deposition sources configured to emit the deposition material, and wherein a temperature of each of the plurality of deposition sources is controlled based on the reflectivity of each of the plurality of areas.
5. The method of claim 1 , further comprising adjusting a temperature of deposition sources such that the temperature of the deposition sources for forming the first intermediate layer is different from that of the deposition sources for forming the second intermediate layer,
wherein the first area is a center portion of the base and the second area is another portion of the first base.
6. The method of claim 1 , wherein the first area is a center portion of the base and the second area is another portion of the first base.
7. The method of claim 1 , wherein the reflectivity of the first area is greater than that of the second area, wherein the thickness of the first intermediate layer is smaller than that of the second intermediate layer.
8. The method of claim 1 , wherein the intermediate layers formed over the first area have substantially the same thickness.
9. The method of claim 1 , wherein the intermediate layer comprises a common layer and a functional layer, and at least one selected from a thickness of the common layer and a thickness of the functional layer varies according to the plurality of areas of the base.