Stamps and methods of forming a pattern on a substrate
Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.
1. A stamp, comprising:
a structure having a first surface and a second surface, and comprising:
transparent regions comprising a material formulated to transmit ultraviolet radiation therethrough; and
non-transparent regions adjacent the transparent regions; and
a polymerizable material directly on surfaces of the transparent regions and the non-transparent regions defining the first surface of the structure.
2. The stamp of claim 1 , wherein the transparent regions comprise glass, calcium fluoride, diamond, a transparent plastic, or a transparent polymer material.
3. The stamp of claim 1 , wherein the non-transparent regions comprise an elastomeric polymer material.
4. The stamp of claim 1 , wherein the transparent regions and the non-transparent regions each extend from the first surface to the second surface.
5. The stamp of claim 1 , wherein the polymerizable material comprises a neutral wetting material.
6. The stamp of claim 1 , wherein the transparent regions and the non-transparent regions exhibit substantially the same widths as one another.
7. The stamp of claim 1 , wherein the polymerizable material comprises a random block copolymer.
8. The stamp of claim 1 , wherein the polymerizable material comprises PS-r-PMMA.
9. The stamp of claim 1 , wherein the polymerizable material is formulated to be cross-linked upon exposure to at least one of ultraviolet radiation and deep ultraviolet radiation.
10. The stamp of claim 1 , wherein the non-transparent regions comprise poly(dimethylsiloxane).
11. The stamp of claim 1 , wherein the transparent regions comprise SiO 2 .
12. The stamp of claim 1 , wherein the transparent regions comprise calcium fluoride.
13. The stamp of claim 1 , wherein the transparent regions comprise diamond.
14. The stamp of claim 1 , wherein:
the transparent regions of the structure comprise quartz, calcium fluoride, or diamond;
the non-transparent regions of the structure comprise poly(dimethylsiloxane); and
the polymerizable material comprises PS-r-PMMA.
15. A method of forming a pattern on a substrate, comprising:
forming a stamp comprising:
a structure comprising:
transparent regions comprising a material formulated to transmit ultraviolet radiation therethrough; and
non-transparent regions adjacent the transparent regions; and
a polymerizable material directly on surfaces of the transparent regions and the non-transparent regions of the structure;
contacting the substrate with the stamp to apply the polymerizable material to the substrate;
transmitting radiation through the transparent regions of the structure to polymerize portions of the polymerizable material and form a polymeric material comprising polymerized portions and non-polymerized portions; and
removing the structure from the polymeric material.
16. The method of claim 15 , further comprising, removing the non-polymerized portions of the polymeric material relative to the polymerized portions of the polymeric material to expose portions of the substrate.
17. The method of claim 16 , further comprising:
forming a block copolymer material over the polymerized portions of the polymeric material and the exposed portions of the substrate; and
annealing the block copolymer material to form a self-assembled block copolymer material.
18. The method of claim 17 , further comprising selectively removing one block of the self-assembled block copolymer material relative to another block of the self-assembled block copolymer material.