Target supply apparatus and EUV light generating apparatus
A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.
1. A target supply device comprising:
a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body;
a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and
an inert gas supply unit configured to supply inert gas into the tank and including a gas flow path in a form of a hole penetrating the second end portion of the tank to guide the inert gas in an inclined direction toward an inner wall of the main body,
wherein the inner wall of the main body of the tank partially contacts with the target material, and
wherein the second end portion closes the axial second end of the main body except for an opening of the hole, the hole having an inclined portion extending at an angle with respect to the inner wall of the main body to guide the inert gas in the inclined direction towards the inner wall to cause the inert gas to collide against the inner wall.
2. An EUV light generation apparatus comprising:
a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body;
a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank;
an inert gas supply unit configured to supply inert gas into the tank; and
a chamber configured to receive laser beam and the target material outputted from the nozzle,
wherein the inert gas supply unit includes a gas flow path in a form of a hole penetrating the second end portion of the tank and configured to guide the inert gas in an inclined direction toward an inner wall of the main body, and the tank is fixed to the chamber with an axial direction of the main body being inclined relative to the gravity direction such that the inert gas, a travel direction of which is changed by colliding against the inner wall, obliquely collides against a liquid level of the target material, and
wherein the inner wall of the main body of the tank partially contacts with the target material, and
wherein the second end portion closes the axial second end of the main body except for an opening of the hole, the hole having an inclined portion extending at an angle with respect to the inner wall of the main body to guide the inert gas in the inclined direction towards the inner wall to cause the inert gas to collide against the inner wall.
3. The target supply device according to claim 1 , wherein the inert gas is guided onto the inner wall between the second end portion and a liquid surface of the target material.
4. The target supply device according to claim 1 , wherein an opening of the gas flow path faces a liquid surface of the target material.
5. The target supply device according to claim 1 , wherein the gas flow path is bent in the second end portion.
6. The target supply device according to claim 1 , wherein the inner wall, the first end portion and the second end portion form a containing space for containing the target material in the tank.
7. The EUV light generation apparatus according to claim 2 , wherein the inert gas is guided onto the inner wall between the second end portion and a liquid surface of the target material.
8. The EUV light generation apparatus according to claim 2 , wherein an opening of the gas flow path faces a liquid surface of the target material.
9. The EUV light generation apparatus according to claim 2 , wherein the gas flow path is bent in the second end portion.
10. The EUV light generation apparatus according to claim 2 , wherein the inner wall, the first end portion and the second end portion form a containing space for containing the target material in the tank.
11. The target supply device according to claim 1 , wherein the second end portion is fixed to the main body by a bolt.
12. The EUV light generation apparatus according to claim 2 , wherein the second end portion is fixed to the main body by a bolt.
13. The target supply device according to claim 1 , wherein the gas flow path includes a first flow path and a second flow path, and an angle formed between an axis of the first flow path and an axis of the second flow path is in a range from 30 degrees to 60 degrees.
14. The EUV light generation apparatus according to claim 2 , wherein the gas flow path includes a first flow path and a second flow path, and an angle formed between an axis of the first flow path and an axis of the second flow path is in a range from 30 degrees to 60 degrees.