Semiconductor device
To provide a semiconductor device that includes an oxide semiconductor and is miniaturized while keeping good electrical properties. In the semiconductor device, an oxide semiconductor layer filling a groove is surrounded by insulating layers including an aluminum oxide film containing excess oxygen. Excess oxygen contained in the aluminum oxide film is supplied to the oxide semiconductor layer, in which a channel is formed, by heat treatment in a manufacturing process of the semiconductor device. Moreover, the aluminum oxide film forms a barrier against oxygen and hydrogen, which inhibits the removal of oxygen from the oxide semiconductor layer surrounded by the insulating layers including an aluminum oxide film and the entry of impurities such as hydrogen in the oxide semiconductor layer. Thus, a highly purified intrinsic oxide semiconductor layer can be obtained. The threshold voltage is controlled effectively by gate electrode layers formed over and under the oxide semiconductor layer.
1. A semiconductor device comprising:
a first insulating layer including a groove;
a first electrode in the groove;
a second insulating layer over the first electrode;
an oxide semiconductor layer over the second insulating layer;
a second electrode and a third electrode over the oxide semiconductor layer;
a third insulating layer over the oxide semiconductor layer, the second electrode, and the third electrode;
a fourth electrode over the third insulating layer; and
a fourth insulating layer over the fourth electrode,
wherein:
the second insulating layer and the fourth insulating layer each contain an aluminum oxide film, and
the oxide semiconductor layer, the second electrode, the third electrode, the third insulating layer, and the fourth electrode are surrounded by the second insulating layer and the fourth insulating layer.
2. The semiconductor device according to claim 1 , wherein:
the first electrode and the fourth electrode function as a gate, and
the second electrode and the third electrode respectively function as a source and a drain.
3. The semiconductor device according to claim 1 , wherein the second insulating layer is in contact with side surfaces of the oxide semiconductor layer.
4. The semiconductor device according to claim 1 , wherein the second insulating layer and the oxide semiconductor layer are in the groove.
5. The semiconductor device according to claim 1 , wherein the oxide semiconductor layer is in contact with the second electrode and the third electrode.
6. The semiconductor device according to claim 1 , wherein the second insulating layer and the fourth insulating layer are in contact with each other.
7. The semiconductor device according to claim 1 , wherein the aluminum oxide film contains excess oxygen.
8. A semiconductor device comprising:
a first insulating layer including a groove;
a first electrode, a second electrode, and a third electrode in the groove;
a second insulating layer over the first electrode, the second electrode, and the third electrode;
an oxide semiconductor layer over the second insulating layer;
a third insulating layer over the oxide semiconductor layer;
a fourth electrode over the third insulating layer; and
a fourth insulating layer over the fourth electrode,
wherein:
the second insulating layer and the fourth insulating layer each contain an aluminum oxide film, and
the oxide semiconductor layer, the third insulating layer, and the fourth electrode are surrounded by the second insulating layer and the fourth insulating layer.
9. The semiconductor device according to claim 8 , wherein the first electrode, the second electrode, the third electrode, and the fourth electrode function as a gate.
10. The semiconductor device according to claim 8 , wherein the second insulating layer is in contact with side surfaces of the oxide semiconductor layer.
11. The semiconductor device according to claim 8 , wherein the second insulating layer and the oxide semiconductor layer are in the groove.
12. The semiconductor device according to claim 8 , further comprising a fifth electrode and a sixth electrode over the oxide semiconductor layer.
13. The semiconductor device according to claim 12 , wherein the fifth electrode and the sixth electrode respectively function as a source and a drain.
14. The semiconductor device according to claim 12 , wherein the oxide semiconductor layer is in contact with the fifth electrode and the sixth electrode.
15. The semiconductor device according to claim 8 , wherein the second insulating layer and the fourth insulating layer are in contact with each other.
16. The semiconductor device according to claim 8 , wherein the aluminum oxide film contains excess oxygen.