Magnetic memory device and method of fabricating the same

1. A method of fabricating a magnetic memory device, the method comprising:

forming an interlayered insulating layer on a substrate;

forming a landing pad to pass through the interlayered insulating layer;

forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad;

forming a bottom electrode to pass through the protection insulating layer and through the interlayered insulating layer;

forming a magnetic tunnel junction layer on the protection insulating layer; and

patterning the magnetic tunnel junction layer to form a magnetic tunnel junction pattern on the bottom electrode, wherein patterning the magnetic tunnel junction layer includes partially etching the protection insulating layer.

2. The method as claimed in claim 1 , wherein patterning the magnetic tunnel junction layer is performed such that a portion of the protection insulating layer remains on the landing pad after the patterning of the magnetic tunnel junction layer.

3. The method as claimed in claim 1 , wherein patterning the magnetic tunnel junction layer is performed such that the top surface of the landing pad is exposed after the patterning of the magnetic tunnel junction layer.

4. The method as claimed in claim 1 , wherein forming the bottom electrode includes forming a top surface of the bottom electrode at a level higher than that of the top surface of the landing pad.

5. The method as claimed in claim 4 , wherein forming the landing pad includes:

forming a first penetration hole to penetrate the interlayered insulating layer;

forming a first conductive layer to fill the first penetration hole; and

planarizing the first conductive layer to expose a top surface of the interlayered insulating layer.

6. The method as claimed in claim 5 , wherein forming the bottom electrode includes:

forming a second penetration hole to penetrate the protection insulating layer and the interlayered insulating layer;

forming a second conductive layer to fill the second penetration hole; and

planarizing the second conductive layer to expose a top surface of the protection insulating layer.

7. A method of fabricating a magnetic memory device, the method comprising:

forming an interlayered insulating layer on a substrate;

forming a landing pad to pass through the interlayered insulating layer;

forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad;

forming a bottom electrode to pass through the protection insulating layer and through the interlayered insulating layer;

forming a magnetic tunnel junction layer on the protection insulating layer;

patterning the magnetic tunnel junction layer to form a magnetic tunnel junction pattern on the bottom electrode;

forming a connection contact electrically connected to the landing pad; and

forming a connection pattern electrically connecting the connection contact to a top surface of the magnetic tunnel junction pattern.

8. A method of fabricating a magnetic memory device, the method comprising:

forming an interlayered insulating layer on a substrate;

forming a landing pad to pass through the interlayered insulating layer;

forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad;

forming first and second bottom electrodes to pass through the protection insulating layer and through the interlayered insulating layer;

forming a magnetic tunnel junction layer on the protection insulating layer; and

patterning the magnetic tunnel junction layer to form first and second magnetic tunnel junction patterns on the first and second bottom electrodes, respectively,

wherein a bottom surface of the first magnetic tunnel junction pattern is electrically connected to the first bottom electrode, and a bottom surface of the second magnetic tunnel junction pattern is electrically connected to the second bottom electrode, and

wherein patterning the magnetic tunnel junction layer includes partially etching the protection insulating layer.

9. The method as claimed in claim 8 , wherein patterning the magnetic tunnel junction layer is performed such that a portion of the protection insulating layer remains on the landing pad after the patterning of the magnetic tunnel junction layer.

10. The method as claimed in claim 8 , wherein patterning the magnetic tunnel junction layer is performed such that the top surface of the landing pad is exposed after the patterning of the magnetic tunnel junction layer.

11. The method as claimed in claim 8 , wherein:

forming the first bottom electrode includes forming a top surface of the first bottom electrode at a level higher than that of the top surface of the landing pad, and

forming the second bottom electrode includes forming a top surface of the second bottom electrode at a level higher than that of the top surface of the landing pad.

12. The method as claimed in claim 8 , further comprising:

forming a connection contact electrically connected to the landing pad; and

forming a connection pattern electrically connecting the connection contact to a top surface of the second magnetic tunnel junction pattern.

13. The method as claimed in claim 12 , further comprising:

forming first and second selection elements in the substrate; and

forming first and second contact plugs electrically connected to the first and second selection elements, respectively, before forming the interlayered insulating layer,

wherein the first bottom electrode is electrically connected to the first contact plug, and the landing pad is electrically connected to the second contact plug.

14. The method as claimed in claim 13 , further comprising:

forming a first bit line electrically connected to a top surface of the first magnetic tunnel junction pattern; and

forming a second bit line, before forming the interlayered insulating layer, such that the second bit line is electrically connected to the second bottom electrode.

15. The method as claimed in claim 8 , wherein, when viewed in a plan view, each of a distance between the first bottom electrode and the landing pad and a distance between the second bottom electrode and the landing pad is smaller than a distance between the first and second bottom electrodes.