Semiconductor package and manufacturing method of the same
The present disclosure provides a semiconductor package, including a first layer, a second layer, and a conductive array. The first layer includes a packaged die having a carrier surface and a molding surface, and a first die structure in proximity to the carrier surface. An active region of the first die structure is electrically coupled to the packaged die through a solder. The second layer includes a second die structure, the second die structure being connected to the active region of the first die structure by a first redistributed layer (RDL). The conductive array is connected to an active region of the second die structure by a second RDL. The present disclosure also provides a method for manufacturing the aforesaid semiconductor package.
1. A semiconductor package, comprising:
a first layer, comprising:
a packaged die having a carrier surface and a molding surface; and
a first die structure in proximity to the carrier surface and laterally surrounded by a solder, an active region of the first die structure is electrically coupled to the packaged die through the solder;
a second layer comprising a second die structure, the second die structure being connected to the active region of the first die structure by a first redistributed layer (RDL); and
a conductive array, connected to an active region of the second die structure by a second RDL,
wherein the solder is in contact with the carrier surface of the packaged die.
2. The semiconductor package of claim 1 , wherein the first die structure comprises a plurality of dies having different thicknesses.
3. The semiconductor package of claim 1 , wherein the second die structure comprises a plurality of dies having different thicknesses.
4. The semiconductor package of claim 1 , wherein the second die structure comprises a silicon-on-chip die and an integrated passive device.
5. The semiconductor package of claim 1 , wherein the packaged die and the first die structure comprise a memory device.
6. The semiconductor package of claim 1 , wherein the second die structure is connected to the active region of the first die structure by a through insulator via.
7. The semiconductor package of claim 1 , further comprising a third die disposed at the same level of the conductive array.
8. The semiconductor package of claim 1 , wherein the conductive array comprises ball grid array coupling to input/output on the second RDL.
9. A multiple-chip stacking structure, comprising
a memory chip layer;
a silicon-on-chip (SOC) layer connected to the memory chip layer by a first redistributed layer (RDL) and a through insulator via (TIV); and
a ball grid array connected to the SOC layer through a second RDL,
wherein the memory chip layer comprises a memory chip flip-chip bonded to the first RDL and surrounded by a solder disposed at a same level of the memory chip layer, the solder being exposed to ambient.
10. The structure of claim 9 , wherein the memory chip layer further comprises a memory package electrically coupled to the SOC layer and the memory chip.
11. The structure of claim 10 , wherein the memory package is coupling to the memory chip through the solder.
12. The structure of claim 10 , wherein the memory package is coupling to the memory chip through the solder and a conductive bump, the solder being connected to the conductive bump.
13. The structure of claim 12 , wherein the solder is connected to the memory package and the conductive bump is connected to the first RDL.
14. The structure of claim 12 , wherein the conductive bump is exposed to ambient.
15. The structure of claim 9 , wherein the memory chip is connected to the first RDL through a microbump structure, the microbump structure comprising:
a microbump on the memory chip;
a microbump receiver on the first RDL corresponding to the microbump;
a conductive mesh connecting different microbumps; and
a solder connecting the microbump receiver and the microbump.
16. The structure of claim 15 , wherein the conductive mesh further comprises a necking portion at the junction of the microbump and the conductive mesh.
17. A semiconductor package, comprising:
a first layer, comprising:
a packaged die having a carrier and a molding on the carrier, the carrier comprising a carrier surface and the molding comprising a molding surface;
a first die structure under the carrier surface;
a solder disposed at the same level surrounding the first die structure; and
a first redistributed layer (RDL) under the first die structure, wherein an active region of the first die structure is electrically coupled to the solder through the first RDL; and
a second layer, comprising:
a second die structure, and
a second redistributed layer (RDL) under the second die structure, wherein an active region of the second die structure is electrically connected to the active region of the first die structure through the first RDL and the second RDL.
18. The semiconductor package of claim 17 , further comprising a packaged die over the first layer, electrically connected to the active region of the first die structure through the solder.
19. The semiconductor package of claim 17 , further comprising a conductive array connected to the active region of the second die structure by the second RDL.
20. The semiconductor package of claim 17 , wherein the active region of the second die structure is electrically connected to the active region of the first die structure through a through insulator via (TIV).