Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic appliance including the semiconductor device, the display device, or the display module
A semiconductor device including a transistor is provided. The transistor includes a gate electrode, a first insulating film over the gate electrode, a second insulating film over the first insulating film, an oxide semiconductor film over the second insulating film, a source electrode and a drain electrode electrically connected to the oxide semiconductor film, a third insulating film over the source electrode, and a fourth insulating film over the drain electrode. A fifth insulating film including oxygen is provided over the transistor. The third insulating film includes a first portion, the fourth insulating film includes a second portion, and the fifth insulating film includes a third portion. The amount of oxygen molecules released from each of the first portion and the second portion is smaller than the amount of oxygen molecules released from the third portion when the amounts are measured by thermal desorption spectroscopy.
1. A method of forming a semiconductor device comprising steps of:
forming a gate electrode over an insulator;
forming a first insulating film over the gate electrode;
forming an oxide semiconductor film over the first insulating film;
forming a source electrode and a drain electrode each on and in contact with the oxide semiconductor film;
forming a second insulating film over each of the source electrode, the drain electrode, and the oxide semiconductor film;
forming a third insulating film on and in contact with the second insulating film;
forming a fourth insulating film on and in contact with the source electrode; and
forming a fifth insulating film on and in contact with the drain electrode,
wherein the second insulating film and the third insulating film are formed in succession without exposure to air, and
wherein a first amount of oxygen molecules released from the fourth insulating film and a second amount of oxygen molecules released from the fifth insulating film are each smaller than a third amount of oxygen molecules released from the third insulating film in thermal desorption spectroscopy.
2. The method of forming the semiconductor device according to claim 1 ,
wherein the fourth insulating film is in contact with an inner side surface of the source electrode and a top surface of the oxide semiconductor film, and
wherein the fifth insulating film is in contact with an inner side surface of the drain electrode and the top surface of the oxide semiconductor film.
3. The method of forming the semiconductor device according to claim 1 , wherein the fourth insulating film and the fifth insulating film each include nitrogen and silicon, and
wherein the third insulating film includes oxygen, nitrogen, and silicon.
4. The method of forming the semiconductor device according to claim 1 ,
wherein the first amount and the second amount are each less than 1×10 19 /cm 3 , and
wherein the third amount is greater than or equal to 1×10 19 /cm 3 .
5. The method of forming the semiconductor device according to claim 1 , wherein the third amount is greater than or equal to 1×10 21 /cm 3 .
6. The method of forming the semiconductor device according to claim 1 , further comprising a step of forming a film over each of the fourth insulating film, the fifth insulating film, and the oxide semiconductor film,
wherein the film inhibits release of oxygen, and
wherein oxygen is added to the oxide semiconductor film through the film.
7. The method of forming the semiconductor device according to claim 6 , wherein thickness of the film is greater than or equal to 1 nm and less than or equal to 20 nm.
8. The method of forming the semiconductor device according to claim 1 , further comprising a step of performing a heat treatment after formation of the third insulating film,
wherein the heat treatment is performed at temperature higher than or equal to 150° C. and lower than or equal to 400° C.
9. The method of forming the semiconductor device according to claim 1 , further comprising a step of forming a sixth insulating film between the gate electrode and the first insulating film.
10. The method of forming the semiconductor device according to claim 1 , wherein the third insulating film is formed just after forming fourth insulating layer by adjusting at least one of a flow rate of a source gas, a pressure, a high-frequency power, and a substrate temperature.
11. The method of forming the semiconductor device according to claim 1 , wherein the second insulating film includes a metal and at least one of oxygen and nitrogen, and
wherein the metal includes at least one of indium, zinc, titanium, aluminum, tungsten, tantalum, and molybdenum.
12. The method of forming the semiconductor device according to claim 1 , wherein the second insulating film includes silicon and at least one of oxygen and nitrogen.
13. A method of forming a semiconductor device comprising steps of:
forming a first insulating film;
forming an oxide semiconductor film over the first insulating film;
forming a source electrode and a drain electrode each on and in contact with the oxide semiconductor film;
forming a second insulating film over each of the source electrode, the drain electrode, and the oxide semiconductor film;
forming a third insulating film on and in contact with the second insulating film;
forming a fourth insulating film on and in contact with the source electrode; and
forming a fifth insulating film on and in contact with the drain electrode,
wherein the second insulating film and the third insulating film are formed in succession without exposure to air, and
wherein a first amount of oxygen molecules released from the fourth insulating film and a second amount of oxygen molecules released from the fifth insulating film are each smaller than a third amount of oxygen molecules released from the third insulating film in thermal desorption spectroscopy.
14. The method of forming the semiconductor device according to claim 13 ,
wherein the fourth insulating film is in contact with an inner side surface of the source electrode and a top surface of the oxide semiconductor film, and
wherein the fifth insulating film is in contact with an inner side surface of the drain electrode and the top surface of the oxide semiconductor film.
15. The method of forming the semiconductor device according to claim 13 , wherein the fourth insulating film and the fifth insulating film each include nitrogen and silicon, and
wherein the third insulating film includes oxygen, nitrogen, and silicon.
16. The method of forming the semiconductor device according to claim 13 ,
wherein the first amount and the second amount are each less than 1×10 19 /cm 3 , and
wherein the third amount is greater than or equal to 1×10 19 /cm 3 .
17. The method of forming the semiconductor device according to claim 13 , wherein the third amount is greater than or equal to 1×10 21 /cm 3 .
18. The method of forming the semiconductor device according to claim 13 , further comprising a step of forming a film over each of the fourth insulating film, the fifth insulating film, and the oxide semiconductor film,
wherein the film inhibits release of oxygen, and
wherein oxygen is added to the oxide semiconductor film through the film.
19. The method of forming the semiconductor device according to claim 18 , wherein thickness of the film is greater than or equal to 1 nm and less than or equal to 20 nm.
20. The method of forming the semiconductor device according to claim 13 , further comprising a step of performing a heat treatment after formation of the third insulating film,
wherein the heat treatment is performed at temperature higher than or equal to 150° C. and lower than or equal to 400° C.
21. The method of forming the semiconductor device according to claim 13 , further comprising a step of forming a sixth insulating film before forming the first insulating film.
22. The method of forming the semiconductor device according to claim 13 , wherein the third insulating film is formed just after forming fourth insulating layer by adjusting at least one of a flow rate of a source gas, a pressure, a high-frequency power, and a substrate temperature.
23. The method of forming the semiconductor device according to claim 13 , wherein the second insulating film includes a metal and at least one of oxygen and nitrogen, and
wherein the metal includes at least one of indium, zinc, titanium, aluminum, tungsten, tantalum, and molybdenum.
24. The method of forming the semiconductor device according to claim 13 , wherein the second insulating film includes silicon and at least one of oxygen and nitrogen.
25. A method of forming a semiconductor device comprising steps of:
forming a first insulating film;
forming an oxide semiconductor film over the first insulating film;
forming a source electrode and a drain electrode each on and in contact with the oxide semiconductor film;
forming a second insulating film over each of the source electrode, the drain electrode, and the oxide semiconductor film;
forming a third insulating film on and in contact with the second insulating film;
forming a fourth insulating film on and in contact with the source electrode;
forming a fifth insulating film on and in contact with the drain electrode; and
forming a film over each of the fourth insulating film, the fifth insulating film, and the oxide semiconductor film,
wherein the second insulating film and the third insulating film are formed in succession without exposure to air,
wherein the film inhibits release of oxygen, and
wherein oxygen is added to the oxide semiconductor film through the film.
26. The method of forming the semiconductor device according to claim 25 ,
wherein the fourth insulating film is in contact with an inner side surface of the source electrode and a top surface of the oxide semiconductor film, and
wherein the fifth insulating film is in contact with an inner side surface of the drain electrode and the top surface of the oxide semiconductor film.
27. The method of forming the semiconductor device according to claim 25 , wherein the fourth insulating film and the fifth insulating film each include nitrogen and silicon, and
wherein the third insulating film includes oxygen, nitrogen, and silicon.
28. The method of forming the semiconductor device according to claim 25 , wherein thickness of the film is greater than or equal to 1 nm and less than or equal to 20 nm.
29. The method of forming the semiconductor device according to claim 25 , further comprising a step of performing a heat treatment after formation of the third insulating film,
wherein the heat treatment is performed at temperature higher than or equal to 150° C. and lower than or equal to 400° c.
30. The method of forming the semiconductor device according to claim 25 , further comprising a step of forming a sixth insulating film before forming the first insulating film.
31. The method of forming the semiconductor device according to claim 25 , wherein the third insulating film is formed just after forming fourth insulating layer by adjusting at least one of a flow rate of a source gas, a pressure, a high-frequency power, and a substrate temperature.
32. The semiconductor device according to claim 25 , wherein the second insulating film includes a metal and at least one of oxygen and nitrogen, and
wherein the metal includes at least one of indium, zinc, titanium, aluminum, tungsten, tantalum, and molybdenum.
33. The semiconductor device according to claim 25 , wherein the second insulating film includes silicon and at least one of oxygen and nitrogen.